Roger F. Sinta

Person

Arlington, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electronic device manufacture using low-k dielectric materials
- Patent number 8,945,677
- Issue date Feb 3, 2015
- Aspen Aerogels, Inc.
- Nicholas A. Zafiropoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dyed photoresists and methods and articles of manufacture comprisin...
- Patent number 7,632,630
- Issue date Dec 15, 2009
- Rohm and Haas Electronic Materials LLC
- James Michael Mori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition
- Patent number 7,482,107
- Issue date Jan 27, 2009
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dyed photoresists and methods and articles of manufacture comprisin...
- Patent number 7,147,983
- Issue date Dec 12, 2006
- Shipley Company, L.L.C.
- James Michael Mori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist compositions
- Patent number 7,026,093
- Issue date Apr 11, 2006
- Shipley Company, L.L.C.
- James W. Thackeray
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Photoresist compositions
- Patent number RE38980
- Issue date Feb 14, 2006
- Shipley Company, L.L.C.
- James W. Thackeray
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Low abosorbing resists for 157 nm lithography
- Patent number 6,794,109
- Issue date Sep 21, 2004
- Massachusetts Institute of Technology
- Theodore H. Fedynyshyn
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Hydroxyphenyl copolymers and photoresists comprising same
- Patent number 6,770,413
- Issue date Aug 3, 2004
- Shipley Company, L.L.C.
- Hiroshi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dyed photoresists and methods and articles of manufacture comprisin...
- Patent number 6,706,461
- Issue date Mar 16, 2004
- Shipley Company, L.L.C.
- Roger F. Sinta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist compositions
- Patent number 6,645,698
- Issue date Nov 11, 2003
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions and exposure methods under 200 nm
- Patent number 6,602,652
- Issue date Aug 5, 2003
- Shipley Company, L.L.C.
- Timothy G. Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods utilizing antireflective coating compositions with exposure...
- Patent number 6,410,209
- Issue date Jun 25, 2002
- Shipley Company, L.L.C.
- Timothy G. Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Narrow molecular weight distribution polymers and use of same as re...
- Patent number 6,107,425
- Issue date Aug 22, 2000
- Shipley Company, L.L.C.
- Roger F. Sinta
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers and photoresist compositions
- Patent number 6,077,643
- Issue date Jun 20, 2000
- Shipley Company, L.L.C.
- Uday Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods and articles of manufacture co...
- Patent number 6,048,672
- Issue date Apr 11, 2000
- Shipley Company, L.L.C.
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions
- Patent number 6,037,107
- Issue date Mar 14, 2000
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions
- Patent number 6,033,830
- Issue date Mar 7, 2000
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dyed photoresists and methods and articles of manufacture comprisin...
- Patent number 5,976,770
- Issue date Nov 2, 1999
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for preparing photoresist compositions
- Patent number 5,919,597
- Issue date Jul 6, 1999
- IBM Corporation of Armonk
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid labile photoactive composition
- Patent number 5,917,024
- Issue date Jun 29, 1999
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions comprising photoactivator, acid, generator and chain e...
- Patent number 5,900,346
- Issue date May 4, 1999
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions
- Patent number 5,886,102
- Issue date Mar 23, 1999
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid labile photoactive composition
- Patent number 5,858,605
- Issue date Jan 12, 1999
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive acid catalyzed resists
- Patent number 5,827,634
- Issue date Oct 27, 1998
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer for positive acid catalyzed resists
- Patent number 5,763,536
- Issue date Jun 9, 1998
- Shipley Company, L.L.C.
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoimageable compositions comprising multiple arylsulfonium photo...
- Patent number 5,731,364
- Issue date Mar 24, 1998
- Shipley Company, L.L.C.
- Roger F. Sinta
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer for positive acid catalyzed resists
- Patent number 5,731,386
- Issue date Mar 24, 1998
- Shipley Company, L.L.C.
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for increasing the differential solubility of an imaged phot...
- Patent number 5,719,003
- Issue date Feb 17, 1998
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive acid catalyzed resists having an alkali soluble resin with...
- Patent number 5,700,624
- Issue date Dec 23, 1997
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition with improved differential solubility throu...
- Patent number 5,641,604
- Issue date Jun 24, 1997
- Shipley Company, L.L.C.
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS
- Publication number 20150145106
- Publication date May 28, 2015
- Aspen Aerogels, Inc.
- Nicholas Anthony Zafiropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS
- Publication number 20120189782
- Publication date Jul 26, 2012
- Aspen Aerogels, Inc.
- Nicholas A Zafiropoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dyed photoresists and methods and articles of manufacture comprisin...
- Publication number 20090220888
- Publication date Sep 3, 2009
- Shipley Company, L.L.C.
- James Michael Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLDER ALLOYS
- Publication number 20090014746
- Publication date Jan 15, 2009
- Ainissa Gweneth Ramirez
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SOLDER ALLOYS
- Publication number 20070292072
- Publication date Dec 20, 2007
- Ainissa Gweneth Ramirez
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photoresist composition
- Publication number 20060228647
- Publication date Oct 12, 2006
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dyed photoresists and methods and articles of manufacture comprisin...
- Publication number 20060204892
- Publication date Sep 14, 2006
- Shipley
- James Michael Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical fluids, and systems and methods of making and using the same
- Publication number 20050164522
- Publication date Jul 28, 2005
- Roderick R. Kunz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Protecting groups for lithographic resist compositions
- Publication number 20040009424
- Publication date Jan 15, 2004
- MASS INSTITUTE OF TECHNOLOGY (MIT)
- Theodore H. Fedynyshyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compositions
- Publication number 20030215748
- Publication date Nov 20, 2003
- Shipley Company, L.L.C.
- James W. Thackeray
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Process and materials for formation of patterned films of functiona...
- Publication number 20030073042
- Publication date Apr 17, 2003
- George J. Cernigliaro
- G02 - OPTICS
Information Patent Application
Antireflective coating compositions
- Publication number 20020172896
- Publication date Nov 21, 2002
- Shipley Company, L.L.C.
- Timothy G. Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low abosorbing resists for 157 nm lithography
- Publication number 20020160297
- Publication date Oct 31, 2002
- Theodore H. Fedynyshyn
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS
- Publication number 20020102483
- Publication date Aug 1, 2002
- TIMOTHY ADAMS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresists containing crosslinked polymers
- Publication number 20020012869
- Publication date Jan 31, 2002
- Shipley Company, L.L.C.
- Timothy G. Adams
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Roger F. Sinta

Person

Patents Grantslast 30 patents

Electronic device manufacture using low-k dielectric materials

Dyed photoresists and methods and articles of manufacture comprisin...

Photoresist composition

Dyed photoresists and methods and articles of manufacture comprisin...

Photoresist compositions

Photoresist compositions

Low abosorbing resists for 157 nm lithography

Hydroxyphenyl copolymers and photoresists comprising same

Dyed photoresists and methods and articles of manufacture comprisin...

Photoresist compositions

Antireflective coating compositions and exposure methods under 200 nm

Methods utilizing antireflective coating compositions with exposure...

Narrow molecular weight distribution polymers and use of same as re...

Polymers and photoresist compositions

Photoresist compositions and methods and articles of manufacture co...

Photoresist compositions

Antireflective coating compositions

Dyed photoresists and methods and articles of manufacture comprisin...

Methods for preparing photoresist compositions

Acid labile photoactive composition

Compositions comprising photoactivator, acid, generator and chain e...

Antireflective coating compositions

Acid labile photoactive composition

Positive acid catalyzed resists

Polymer for positive acid catalyzed resists

Photoimageable compositions comprising multiple arylsulfonium photo...

Polymer for positive acid catalyzed resists

Method for increasing the differential solubility of an imaged phot...

Positive acid catalyzed resists having an alkali soluble resin with...

Photoresist composition with improved differential solubility throu...

Patents Applicationslast 30 patents

ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS

ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS

Dyed photoresists and methods and articles of manufacture comprisin...

SOLDER ALLOYS

SOLDER ALLOYS

Photoresist composition

Dyed photoresists and methods and articles of manufacture comprisin...

Optical fluids, and systems and methods of making and using the same

Protecting groups for lithographic resist compositions

Photoresist compositions

Process and materials for formation of patterned films of functiona...

Antireflective coating compositions

Low abosorbing resists for 157 nm lithography

ANTIREFLECTIVE COATING COMPOSITIONS

Positive photoresists containing crosslinked polymers