Roger M. Johnson

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing system with platen temperature control
- Patent number 11,911,869
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Jeonghoon Oh
- B24 - GRINDING POLISHING
Information Patent Grant
Sequential application of cleaning fluids for improved maintenance...
- Patent number 11,850,700
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Jeonghoon Oh
- B24 - GRINDING POLISHING
Information Patent Grant
Pedestal lift for semiconductor processing chambers
- Patent number 11,251,067
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Brian T. West
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for exhaust cooling
- Patent number 11,114,285
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Smart chamber and smart chamber components
- Patent number 10,930,479
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Simon Nicholas Binns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cooling a composition using a hall effect enhanced capaci...
- Patent number 10,176,973
- Issue date Jan 8, 2019
- Applied Materials, Inc.
- Michael S. Cox
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Smart chamber and smart chamber components
- Patent number 10,153,143
- Issue date Dec 11, 2018
- Applied Materials, Inc.
- Simon Nicholas Binns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Encapsulated magnetron
- Patent number 9,754,771
- Issue date Sep 5, 2017
- Applied Materials, Inc.
- Brian T. West
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Abatement system having a plasma source
- Patent number 9,552,967
- Issue date Jan 24, 2017
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma source for abating compounds produced i...
- Patent number 9,543,124
- Issue date Jan 10, 2017
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hall effect enhanced capacitively coupled plasma source, an abateme...
- Patent number 9,240,308
- Issue date Jan 19, 2016
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hall effect enhanced capacitively coupled plasma source
- Patent number 9,230,780
- Issue date Jan 5, 2016
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for assembling and operating electronic devic...
- Patent number 8,455,368
- Issue date Jun 4, 2013
- Applied Materials, Inc.
- Phil Chandler
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
SEQUENTIAL APPLICATION OF CLEANING FLUIDS FOR IMPROVED MAINTENANCE...
- Publication number 20220118583
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jeonghoon OH
- B24 - GRINDING POLISHING
Information Patent Application
PEDESTAL LIFT FOR SEMICONDUCTOR PROCESSING CHAMBERS
- Publication number 20200343126
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Brian T. WEST
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL MECHANICAL POLISHING SYSTEM WITH PLATEN TEMPERATURE CONTROL
- Publication number 20200246935
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- Jeonghoon OH
- B24 - GRINDING POLISHING
Information Patent Application
SMART CHAMBER AND SMART CHAMBER COMPONENTS
- Publication number 20190096643
- Publication date Mar 28, 2019
- Applied Materials, Inc.
- Simon Nicholas BINNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR EXHAUST COOLING
- Publication number 20170301524
- Publication date Oct 19, 2017
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...
- Publication number 20170133208
- Publication date May 11, 2017
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...
- Publication number 20160133442
- Publication date May 12, 2016
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE
- Publication number 20160118226
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART CHAMBER AND SMART CHAMBER COMPONENTS
- Publication number 20150262798
- Publication date Sep 17, 2015
- Applied Materials, Inc.
- Simon Nicholas BINNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE
- Publication number 20150255251
- Publication date Sep 10, 2015
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...
- Publication number 20150255256
- Publication date Sep 10, 2015
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENCAPSULATED MAGNETRON
- Publication number 20150048735
- Publication date Feb 19, 2015
- Applied Materials, Inc.
- Brian T. WEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR ASSEMBLING AND OPERATING ELECTRONIC DEVIC...
- Publication number 20080289167
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Phil Chandler
- G05 - CONTROLLING REGULATING

Roger M. Johnson

Person

Patents Grantslast 30 patents

Chemical mechanical polishing system with platen temperature control

Sequential application of cleaning fluids for improved maintenance...

Pedestal lift for semiconductor processing chambers

Apparatus for exhaust cooling

Smart chamber and smart chamber components

Method of cooling a composition using a hall effect enhanced capaci...

Smart chamber and smart chamber components

Encapsulated magnetron

Abatement system having a plasma source

Capacitively coupled plasma source for abating compounds produced i...

Hall effect enhanced capacitively coupled plasma source, an abateme...

Hall effect enhanced capacitively coupled plasma source

Methods and apparatus for assembling and operating electronic devic...

Patents Applicationslast 30 patents

SEQUENTIAL APPLICATION OF CLEANING FLUIDS FOR IMPROVED MAINTENANCE...

PEDESTAL LIFT FOR SEMICONDUCTOR PROCESSING CHAMBERS

CHEMICAL MECHANICAL POLISHING SYSTEM WITH PLATEN TEMPERATURE CONTROL

SMART CHAMBER AND SMART CHAMBER COMPONENTS

APPARATUS FOR EXHAUST COOLING

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE

SMART CHAMBER AND SMART CHAMBER COMPONENTS

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...

ENCAPSULATED MAGNETRON

METHODS AND APPARATUS FOR ASSEMBLING AND OPERATING ELECTRONIC DEVIC...