Roger N. ANDERSON

Person

San Martin, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer processing hardware for epitaxial deposition with reduced aut...
- Patent number 8,852,349
- Issue date Oct 7, 2014
- Applied Materials, Inc.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus temperature control and pattern compensation
- Patent number 8,372,203
- Issue date Feb 12, 2013
- Applied Materials, Inc.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polymeric coating of substrate processing system components for con...
- Patent number 8,337,619
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- David K. Carlson
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Film formation apparatus and methods including temperature and emis...
- Patent number 7,691,204
- Issue date Apr 6, 2010
- Applied Materials, Inc.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halogen lamp assembly with integrated heat sink
- Patent number 7,522,822
- Issue date Apr 21, 2009
- Robert Trujillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for depositing an oxide film
- Patent number 6,833,322
- Issue date Dec 21, 2004
- Applied Materials, Inc.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas inlets for wafer processing chamber
- Patent number 6,500,734
- Issue date Dec 31, 2002
- Applied Materials, Inc.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lamp array for thermal processing chamber
- Patent number 6,476,362
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Thomas E. Deacon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Backside heating chamber for emissivity independent thermal processes
- Patent number 6,455,814
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Arkadii V. Samoilov
- C30 - CRYSTAL GROWTH
Information Patent Grant
Domed wafer reactor vessel window with reduced stress at atmospheri...
- Patent number 6,436,837
- Issue date Aug 20, 2002
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Infra-red transparent thermal reactor cover member
- Patent number 6,406,543
- Issue date Jun 18, 2002
- Applied Materials, Inc.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bi-directional processing chamber and method for bi-directional pro...
- Patent number 6,399,510
- Issue date Jun 4, 2002
- Applied Materials, Inc.
- Norma B. Riley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon carbide sleeve for substrate support assembly
- Patent number 6,315,833
- Issue date Nov 13, 2001
- Applied Materials, Inc.
- Lori A. Callaghan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quartz pin lift for single wafer chemical vapor deposition/etch pro...
- Patent number 6,190,113
- Issue date Feb 20, 2001
- Applied Materials, Inc.
- Binh Bui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor for deposition apparatus
- Patent number 6,146,464
- Issue date Nov 14, 2000
- Applied Materials, Inc.
- Israel Beinglass
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing the upper and lower faces of a...
- Patent number 6,113,703
- Issue date Sep 5, 2000
- Applied Materials, Inc.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual surface reflector
- Patent number 6,108,491
- Issue date Aug 22, 2000
- Applied Materials, Inc.
- Roger N. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Domed wafer reactor vessel window with reduced stress at atmospheri...
- Patent number 6,099,648
- Issue date Aug 8, 2000
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for controlling the temperature of the walls of a reaction c...
- Patent number 6,083,323
- Issue date Jul 4, 2000
- Applied Materials, Inc.
- David K. Carlson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling the radial temperature gradien...
- Patent number 6,064,799
- Issue date May 16, 2000
- Applied Materials, Inc.
- Roger N. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas inlets for wafer processing chamber
- Patent number 5,916,369
- Issue date Jun 29, 1999
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for controlling the temperature of reaction ch...
- Patent number 5,855,677
- Issue date Jan 5, 1999
- Applied Materials, Inc.
- David K. Carlson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process of depositing a layer of material on a wafer with susceptor...
- Patent number 5,834,059
- Issue date Nov 10, 1998
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Ramping susceptor-wafer temperature using a single temperature input
- Patent number 5,809,211
- Issue date Sep 15, 1998
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Profiled substrate heating utilizing a support temperature and a su...
- Patent number 5,790,750
- Issue date Aug 4, 1998
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Semiconductor wafer process chamber with susceptor back coating
- Patent number 5,725,673
- Issue date Mar 10, 1998
- Applied Materials Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Profiled substrate heating
- Patent number 5,650,082
- Issue date Jul 22, 1997
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Susceptor for deposition apparatus
- Patent number 5,645,646
- Issue date Jul 8, 1997
- Applied Materials, Inc.
- Israel Beinglass
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer process chamber with suspector back coating
- Patent number 5,599,397
- Issue date Feb 4, 1997
- Applied Materials Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for the turbulent mixing of gases
- Patent number 5,573,334
- Issue date Nov 12, 1996
- Applied Materials, Inc.
- Roger N. Anderson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
PARALLEL PLATE INLINE SUBSTRATE PROCESSING TOOL
- Publication number 20170244006
- Publication date Aug 24, 2017
- Applied Materials, Inc.
- BRIAN H. BURROWS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH SPEED EPI SYSTEM AND CHAMBER CONCEPTS
- Publication number 20160348240
- Publication date Dec 1, 2016
- Brian H. BURROWS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLYMERIC COATING OF SUBSTRATE PROCESSING SYSTEM COMPONENTS FOR CON...
- Publication number 20100071622
- Publication date Mar 25, 2010
- Applied Materials, Inc.
- DAVID K. CARLSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEM FOR FABRICATING COMPOUND NITRIDE SEMICONDUCTOR DE...
- Publication number 20090194026
- Publication date Aug 6, 2009
- BRIAN H. BURROWS
- C30 - CRYSTAL GROWTH
Information Patent Application
MODULAR CVD EPI 300MM REACTOR
- Publication number 20080072820
- Publication date Mar 27, 2008
- APPLIED MATERIALS, INC.
- Brian H. Burrows
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing hardware for epitaxial deposition with reduced aut...
- Publication number 20080069951
- Publication date Mar 20, 2008
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation apparatus and methods including temperature and emis...
- Publication number 20070077355
- Publication date Apr 5, 2007
- APPLIED MATERIALS, INC.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus temperature control and pattern compensation
- Publication number 20070074665
- Publication date Apr 5, 2007
- APPLIED MATERIALS, INC.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Halogen lamp assembly with integrated heat sink
- Publication number 20050146257
- Publication date Jul 7, 2005
- APPLIED MATERIALS, INC.
- Robert Trujillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatuses and methods for depositing an oxide film
- Publication number 20040077184
- Publication date Apr 22, 2004
- APPLIED MATERIALS, INC.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Closed hole edge lift pin and susceptor for wafer process chambers
- Publication number 20030178145
- Publication date Sep 25, 2003
- APPLIED MATERIALS, INC.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas inlets for wafer processing chamber
- Publication number 20030092266
- Publication date May 15, 2003
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOMED WAFER REACTOR VESSEL WINDOW WITH REDUCED STRESS AT ATMOSPHERI...
- Publication number 20020066408
- Publication date Jun 6, 2002
- ROGER N. ANDERSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INFRA-RED TRANSPARENT THERMAL REACTOR COVER MEMBER
- Publication number 20020046704
- Publication date Apr 25, 2002
- ROGER N. ANDERSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PROCESSING IN A CHAMBER WITH NOVEL GAS INLETS
- Publication number 20020025657
- Publication date Feb 28, 2002
- ROGER N. ANDERSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Roger N. ANDERSON

Person

Patents Grantslast 30 patents

Wafer processing hardware for epitaxial deposition with reduced aut...

Apparatus temperature control and pattern compensation

Polymeric coating of substrate processing system components for con...

Film formation apparatus and methods including temperature and emis...

Halogen lamp assembly with integrated heat sink

Apparatuses and methods for depositing an oxide film

Gas inlets for wafer processing chamber

Lamp array for thermal processing chamber

Backside heating chamber for emissivity independent thermal processes

Domed wafer reactor vessel window with reduced stress at atmospheri...

Infra-red transparent thermal reactor cover member

Bi-directional processing chamber and method for bi-directional pro...

Silicon carbide sleeve for substrate support assembly

Quartz pin lift for single wafer chemical vapor deposition/etch pro...

Susceptor for deposition apparatus

Method and apparatus for processing the upper and lower faces of a...

Dual surface reflector

Domed wafer reactor vessel window with reduced stress at atmospheri...

Method for controlling the temperature of the walls of a reaction c...

Method and apparatus for controlling the radial temperature gradien...

Gas inlets for wafer processing chamber

Method and apparatus for controlling the temperature of reaction ch...

Process of depositing a layer of material on a wafer with susceptor...

Ramping susceptor-wafer temperature using a single temperature input

Profiled substrate heating utilizing a support temperature and a su...

Semiconductor wafer process chamber with susceptor back coating

Profiled substrate heating

Susceptor for deposition apparatus

Semiconductor wafer process chamber with suspector back coating

Method for the turbulent mixing of gases

Patents Applicationslast 30 patents

PARALLEL PLATE INLINE SUBSTRATE PROCESSING TOOL

HIGH SPEED EPI SYSTEM AND CHAMBER CONCEPTS

POLYMERIC COATING OF SUBSTRATE PROCESSING SYSTEM COMPONENTS FOR CON...

PROCESSING SYSTEM FOR FABRICATING COMPOUND NITRIDE SEMICONDUCTOR DE...

MODULAR CVD EPI 300MM REACTOR

Wafer processing hardware for epitaxial deposition with reduced aut...

Film formation apparatus and methods including temperature and emis...

Apparatus temperature control and pattern compensation

Halogen lamp assembly with integrated heat sink

Apparatuses and methods for depositing an oxide film

Closed hole edge lift pin and susceptor for wafer process chambers

Gas inlets for wafer processing chamber

DOMED WAFER REACTOR VESSEL WINDOW WITH REDUCED STRESS AT ATMOSPHERI...

INFRA-RED TRANSPARENT THERMAL REACTOR COVER MEMBER

WAFER PROCESSING IN A CHAMBER WITH NOVEL GAS INLETS