Roland Pieter Stolk

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Sprang-Capelle, NL

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Patents Grantslast 30 patents

Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a radiation source and lithographic apparatus...
- Patent number 9,645,510
- Issue date May 9, 2017
- ASML Netherlands B.V.
- Wilhelmus Patrick Elisabeth Maria Op 'T Root
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,982,319
- Issue date Mar 17, 2015
- ASML Netherlands B.V.
- Roland Pieter Stolk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable attenuator for a lithographic apparatus
- Patent number 7,433,139
- Issue date Oct 7, 2008
- ASML Netherlands B.V.
- Roland Pieter Stolk
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, method of manufacturing a device, and devic...
- Patent number 7,283,208
- Issue date Oct 16, 2007
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200264522
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Laurentius Cornelius DE WINTER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS...
- Publication number 20160070179
- Publication date Mar 10, 2016
- ASML NETHERLANDS B.V.
- Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20110222029
- Publication date Sep 15, 2011
- ASML NETHERLANDS B.V.
- Roland Pieter STOLK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable attenuator for a lithographic apparatus
- Publication number 20060044653
- Publication date Mar 2, 2006
- ASML NETHERLANDS B.V.
- Roland Pieter Stolk
- G02 - OPTICS
Information Patent Application
Lithographic apparatus, method of manufacturing a device, and devic...
- Publication number 20040189972
- Publication date Sep 30, 2004
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY