Rolf FREIMANN

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Measuring apparatus for interferometrically determining a surface s...
- Patent number 11,892,283
- Issue date Feb 6, 2024
- Carl Zeiss SMT GmbH
- Stefan Schulte
- G01 - MEASURING TESTING
Information Patent Grant
Method and assembly for analysing the wavefront effect of an optica...
- Patent number 11,426,067
- Issue date Aug 30, 2022
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G01 - MEASURING TESTING
Information Patent Grant
Wafer holding device and projection microlithography system
- Patent number 10,948,833
- Issue date Mar 16, 2021
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical system for microlithography
- Patent number 10,754,132
- Issue date Aug 25, 2020
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G02 - OPTICS
Information Patent Grant
Optical system
- Patent number 10,386,733
- Issue date Aug 20, 2019
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for aligning a mirror of a microlithographic projection expo...
- Patent number 10,359,703
- Issue date Jul 23, 2019
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a lens for a lithography apparatus, and measur...
- Patent number 10,345,547
- Issue date Jul 9, 2019
- Carl Zeiss SMT GmbH
- Steffen Fritzsche
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for aligning a mirror of a microlithographic projection expo...
- Patent number 10,101,667
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 10,042,271
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device with image defect determination
- Patent number 9,996,014
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 9,720,329
- Issue date Aug 1, 2017
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,696,639
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, projection objective with such mirror, and projection expos...
- Patent number 9,575,224
- Issue date Feb 21, 2017
- Carl Zeiss SMT GmbH
- Rolf Freimann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical device
- Patent number 9,568,394
- Issue date Feb 14, 2017
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring system
- Patent number 9,482,968
- Issue date Nov 1, 2016
- Carl Zeiss SMT GmbH
- Markus Goeppert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection arrangement
- Patent number 9,377,694
- Issue date Jun 28, 2016
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device with image defect determination
- Patent number 9,235,131
- Issue date Jan 12, 2016
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,001,304
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system and use thereof
- Patent number 8,908,149
- Issue date Dec 9, 2014
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography with a radiation dete...
- Patent number 8,822,942
- Issue date Sep 2, 2014
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G01 - MEASURING TESTING
Information Patent Grant
Optical system, in particular in a microlithographic projection exp...
- Patent number 8,654,345
- Issue date Feb 18, 2014
- Carl Zeiss SMT GmbH
- Albrecht Hof
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a shape of an optical surface based on computat...
- Patent number 8,593,642
- Issue date Nov 26, 2013
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for the locally resolved measurement of a radi...
- Patent number 8,541,752
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure tool for microlithography with a measuring appa...
- Patent number 8,537,332
- Issue date Sep 17, 2013
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G01 - MEASURING TESTING
Information Patent Grant
Optical imaging device with image defect determination
- Patent number 8,537,333
- Issue date Sep 17, 2013
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining a deviation of an actual shape...
- Patent number 8,345,262
- Issue date Jan 1, 2013
- Carl Zeiss SMT GmbH
- Frank Schillke
- G01 - MEASURING TESTING
Information Patent Grant
Projection illumination system
- Patent number 8,228,485
- Issue date Jul 24, 2012
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a deviation of an actual shape...
- Patent number 8,104,905
- Issue date Jan 31, 2012
- Carl Zeiss SMT GmbH
- Frank Schillke
- G01 - MEASURING TESTING
Information Patent Grant
Optical element and method of calibrating a measuring apparatus com...
- Patent number 8,089,634
- Issue date Jan 3, 2012
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Method of aligning an optical system
- Patent number 7,643,149
- Issue date Jan 5, 2010
- Carl Zeiss SMT AG
- Rolf Freimann
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING A TEMPERATURE-CONTROLLING HOLLOW STRUCTURE IN...
- Publication number 20240416461
- Publication date Dec 19, 2024
- Carl Zeiss SMT GMBH
- Sebastian Faas
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL SYSTEM
- Publication number 20220236652
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G02 - OPTICS
Information Patent Application
MEASURING APPARATUS FOR INTERFEROMETRICALLY DETERMINING A SURFACE S...
- Publication number 20220221269
- Publication date Jul 14, 2022
- Carl Zeiss SMT GMBH
- Stefan SCHULTE
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS
- Publication number 20220043358
- Publication date Feb 10, 2022
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND ASSEMBLY FOR ANALYSING THE WAVEFRONT EFFECT OF AN OPTICA...
- Publication number 20210022602
- Publication date Jan 28, 2021
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
WAFER HOLDING DEVICE AND PROJECTION MICROLITHOGRAPHY SYSTEM
- Publication number 20200218163
- Publication date Jul 9, 2020
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM
- Publication number 20190354025
- Publication date Nov 21, 2019
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20190129318
- Publication date May 2, 2019
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...
- Publication number 20190049853
- Publication date Feb 14, 2019
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM
- Publication number 20180101105
- Publication date Apr 12, 2018
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A LENS FOR A LITHOGRAPHY APPARATUS, AND MEASUR...
- Publication number 20180074278
- Publication date Mar 15, 2018
- Steffen Fritzsche
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20180024445
- Publication date Jan 25, 2018
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICE
- Publication number 20170284893
- Publication date Oct 5, 2017
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...
- Publication number 20170023865
- Publication date Jan 26, 2017
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE WITH IMAGE DEFECT DETERMINATION
- Publication number 20160246182
- Publication date Aug 25, 2016
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20160195817
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20150212431
- Publication date Jul 30, 2015
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING SYSTEM
- Publication number 20140118712
- Publication date May 1, 2014
- Carl Zeiss SMT GMBH
- Markus GOEPPERT
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION ARRANGEMENT
- Publication number 20140104587
- Publication date Apr 17, 2014
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTAT...
- Publication number 20140078513
- Publication date Mar 20, 2014
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICE
- Publication number 20140023835
- Publication date Jan 23, 2014
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL IMAGING DEVICE WITH IMAGE DEFECT DETERMINATION
- Publication number 20140016108
- Publication date Jan 16, 2014
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR THE LOCALLY RESOLVED MEASUREMENT OF A RADI...
- Publication number 20130334426
- Publication date Dec 19, 2013
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
MIRROR, PROJECTION OBJECTIVE WITH SUCH MIRROR, AND PROJECTION EXPOS...
- Publication number 20130286471
- Publication date Oct 31, 2013
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- B82 - NANO-TECHNOLOGY
Information Patent Application
Projection objective of a microlithographic projection exposure app...
- Publication number 20130242278
- Publication date Sep 19, 2013
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
Imaging Optical System for Microlithography
- Publication number 20130188246
- Publication date Jul 25, 2013
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR THE LOCALLY RESOLVED MEASUREMENT OF A RADI...
- Publication number 20130105698
- Publication date May 2, 2013
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT OF AN IMAGING OPTICAL SYSTEM BY SUPERPOSITION OF PATTERNS
- Publication number 20120249985
- Publication date Oct 4, 2012
- Carl Zeiss SMT GMBH
- Lars WISCHMEIER
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE AND INTERFEROMETR...
- Publication number 20120229814
- Publication date Sep 13, 2012
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20120140241
- Publication date Jun 7, 2012
- Carl Zeiss SMT GMBH
- Albrecht Hof
- G01 - MEASURING TESTING

Rolf FREIMANN

Person

Patents Grantslast 30 patents

Measuring apparatus for interferometrically determining a surface s...

Method and assembly for analysing the wavefront effect of an optica...

Wafer holding device and projection microlithography system

Imaging optical system for microlithography

Optical system

Method for aligning a mirror of a microlithographic projection expo...

Method for producing a lens for a lithography apparatus, and measur...

Method for aligning a mirror of a microlithographic projection expo...

Projection exposure system for microlithography with a measurement...

Optical imaging device with image defect determination

Projection objective of a microlithographic projection exposure app...

Projection exposure system for microlithography with a measurement...

Mirror, projection objective with such mirror, and projection expos...

Optical device

Measuring system

Projection arrangement

Optical imaging device with image defect determination

Projection exposure system for microlithography with a measurement...

Projection exposure system and use thereof

Projection exposure tool for microlithography with a radiation dete...

Optical system, in particular in a microlithographic projection exp...

Method of measuring a shape of an optical surface based on computat...

Apparatus and method for the locally resolved measurement of a radi...

Projection exposure tool for microlithography with a measuring appa...

Optical imaging device with image defect determination

Method and apparatus for determining a deviation of an actual shape...

Projection illumination system

Method and apparatus for determining a deviation of an actual shape...

Optical element and method of calibrating a measuring apparatus com...

Method of aligning an optical system

Patents Applicationslast 30 patents

METHOD FOR PRODUCING A TEMPERATURE-CONTROLLING HOLLOW STRUCTURE IN...

OPTICAL SYSTEM

MEASURING APPARATUS FOR INTERFEROMETRICALLY DETERMINING A SURFACE S...

METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS

METHOD AND ASSEMBLY FOR ANALYSING THE WAVEFRONT EFFECT OF AN OPTICA...

WAFER HOLDING DEVICE AND PROJECTION MICROLITHOGRAPHY SYSTEM

OPTICAL SYSTEM

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...

OPTICAL SYSTEM

METHOD FOR PRODUCING A LENS FOR A LITHOGRAPHY APPARATUS, AND MEASUR...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

OPTICAL DEVICE

METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...

OPTICAL IMAGING DEVICE WITH IMAGE DEFECT DETERMINATION

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

MEASURING SYSTEM

PROJECTION ARRANGEMENT

METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTAT...

OPTICAL DEVICE

OPTICAL IMAGING DEVICE WITH IMAGE DEFECT DETERMINATION

APPARATUS AND METHOD FOR THE LOCALLY RESOLVED MEASUREMENT OF A RADI...

MIRROR, PROJECTION OBJECTIVE WITH SUCH MIRROR, AND PROJECTION EXPOS...

Projection objective of a microlithographic projection exposure app...

Imaging Optical System for Microlithography

APPARATUS AND METHOD FOR THE LOCALLY RESOLVED MEASUREMENT OF A RADI...

MEASUREMENT OF AN IMAGING OPTICAL SYSTEM BY SUPERPOSITION OF PATTERNS

METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE AND INTERFEROMETR...

OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXP...