Rolf Seltmann

Person

Am Stockteich, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Advanced process control methods for process-aware dimension targeting
- Patent number 9,966,315
- Issue date May 8, 2018
- GLOBALFOUNDRIES Inc.
- Philipp Jaschinsky
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for detecting particle contamination in an immers...
- Patent number 8,605,250
- Issue date Dec 10, 2013
- GLOBALFOUNDRIES Inc.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control of critical dimensions in optical imaging processes for sem...
- Patent number 8,332,783
- Issue date Dec 11, 2012
- GLOBALFOUNDRIES Inc.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for dispatching workpieces to tools based on p...
- Patent number 8,155,770
- Issue date Apr 10, 2012
- GLOBALFOUNDRIES Inc.
- Robert Barlovic
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for reducing overlay errors in semiconductor volu...
- Patent number 8,039,181
- Issue date Oct 18, 2011
- Advanced Micro Devices, Inc.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for reducing overlay errors within exposure field...
- Patent number 7,842,442
- Issue date Nov 30, 2010
- Advanced Micro Devices, Inc.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for automatically detecting exposed substrates ha...
- Patent number 7,618,755
- Issue date Nov 17, 2009
- Advanced Micro Devices, Inc.
- Uwe Schulze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for increasing product yield by controlling litho...
- Patent number 7,325,224
- Issue date Jan 29, 2008
- Advanced Micro Devices, Inc.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for improving exposure uniformity in a step and r...
- Patent number 7,006,195
- Issue date Feb 28, 2006
- Advanced Micro Devices, Inc.
- Jan Raebiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for improving the efficiency of a mechanical alig...
- Patent number 6,946,411
- Issue date Sep 20, 2005
- Advanced Micro Devices, Inc.
- Uwe Knappe
- G05 - CONTROLLING REGULATING
Information Patent Grant
Critical dimension control improvement method for step and scan pho...
- Patent number 6,493,063
- Issue date Dec 10, 2002
- Advanced Micro Devices, Inc.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for producing features on a photolithographic layer
- Patent number 5,936,713
- Issue date Aug 10, 1999
- Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
- Jorg Paufler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for detecting a latent image using an alignment apparatus
- Patent number 5,496,669
- Issue date Mar 5, 1996
- Interuniversitair Micro-Elektronica Centrum vzw
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ADVANCED PROCESS CONTROL METHODS FOR PROCESS-AWARE DIMENSION TARGETING
- Publication number 20180012813
- Publication date Jan 11, 2018
- GLOBALFOUNDRIES INC.
- Philipp Jaschinsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Control of Critical Dimensions in Optical Imaging Processes for Sem...
- Publication number 20120005634
- Publication date Jan 5, 2012
- GLOBALFOUNDRIES INC.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DISPATCHING WORKPIECES TO TOOLS BASED ON P...
- Publication number 20100249967
- Publication date Sep 30, 2010
- Robert Barlovic
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETECTING PARTICLE CONTAMINATION IN AN IMMERS...
- Publication number 20100245790
- Publication date Sep 30, 2010
- Rolf SELTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS CORRECTION IN LITHOGRAPHY TOOLS VIA LENS ABERRATION CONTROL
- Publication number 20100110402
- Publication date May 6, 2010
- Rene WIRTZ
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS IN SEMICONDUCTOR VOLU...
- Publication number 20100028790
- Publication date Feb 4, 2010
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS WITHIN EXPOSURE FIELD...
- Publication number 20080057418
- Publication date Mar 6, 2008
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR AUTOMATICALLY DETECTING EXPOSED SUBSTRATES HA...
- Publication number 20070048635
- Publication date Mar 1, 2007
- UWE SCHULZE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for increasing product yield by controlling litho...
- Publication number 20050120328
- Publication date Jun 2, 2005
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for improving exposure uniformity in a step and r...
- Publication number 20040165164
- Publication date Aug 26, 2004
- Jan Raebiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for improving the efficiency of a mechanical alig...
- Publication number 20040167640
- Publication date Aug 26, 2004
- Uwe Knappe
- G05 - CONTROLLING REGULATING

Rolf Seltmann

Person

Patents Grantslast 30 patents

Advanced process control methods for process-aware dimension targeting

Method and system for detecting particle contamination in an immers...

Control of critical dimensions in optical imaging processes for sem...

Method and apparatus for dispatching workpieces to tools based on p...

Method and system for reducing overlay errors in semiconductor volu...

Method and system for reducing overlay errors within exposure field...

Method and system for automatically detecting exposed substrates ha...

Method and system for increasing product yield by controlling litho...

Method and system for improving exposure uniformity in a step and r...

Method and system for improving the efficiency of a mechanical alig...

Critical dimension control improvement method for step and scan pho...

Method and device for producing features on a photolithographic layer

System for detecting a latent image using an alignment apparatus

Patents Applicationslast 30 patents

ADVANCED PROCESS CONTROL METHODS FOR PROCESS-AWARE DIMENSION TARGETING

Control of Critical Dimensions in Optical Imaging Processes for Sem...

METHOD AND APPARATUS FOR DISPATCHING WORKPIECES TO TOOLS BASED ON P...

METHOD AND SYSTEM FOR DETECTING PARTICLE CONTAMINATION IN AN IMMERS...

FOCUS CORRECTION IN LITHOGRAPHY TOOLS VIA LENS ABERRATION CONTROL

METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS IN SEMICONDUCTOR VOLU...

METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS WITHIN EXPOSURE FIELD...

METHOD AND SYSTEM FOR AUTOMATICALLY DETECTING EXPOSED SUBSTRATES HA...

Method and system for increasing product yield by controlling litho...

Method and system for improving exposure uniformity in a step and r...

Method and system for improving the efficiency of a mechanical alig...