Roman CHALYKH

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Phase-shift mask for extreme ultraviolet lithography
- Patent number 11,372,323
- Issue date Jun 28, 2022
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask for extreme ultraviolet lithography
- Patent number 10,719,008
- Issue date Jul 21, 2020
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for preventing thermal accumulation and extreme ultra-viol...
- Patent number 10,274,820
- Issue date Apr 30, 2019
- Samsung Electronics Co., Ltd.
- Hwanchul Jeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for preventing thermal accumulation and extreme ultra-viol...
- Patent number 9,952,502
- Issue date Apr 24, 2018
- Samsung Electronics Co., Ltd.
- Hwanchul Jeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam shapers, annealing systems employing the same, methods of heat...
- Patent number 9,466,490
- Issue date Oct 11, 2016
- Samsung Electronics Co., Ltd.
- Sanghyun Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods of reducing a registration error of a photomask, and relate...
- Patent number 9,176,375
- Issue date Nov 3, 2015
- Samsung Electronics Co., Ltd.
- Sang-hyun Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Beam shapers, annealing systems employing the same, methods of heat...
- Patent number 9,087,698
- Issue date Jul 21, 2015
- Samsung Electronics Co., Ltd.
- Sanghyun Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
PHASE-SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20200209732
- Publication date Jul 2, 2020
- Samsung Electronics Co., Ltd.
- Hwanseok SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...
- Publication number 20180203346
- Publication date Jul 19, 2018
- Samsung Electronics Co., Ltd.
- Hwanchul JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20180143527
- Publication date May 24, 2018
- Samsung Electronics Co., Ltd.
- Hwanseok SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...
- Publication number 20160334698
- Publication date Nov 17, 2016
- Hwanchul JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20160172207
- Publication date Jun 16, 2016
- Samsung Electronics Co., Ltd.
- Sungwon KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...
- Publication number 20150311078
- Publication date Oct 29, 2015
- Sanghyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF REDUCING A REGISTRATION ERROR OF A PHOTOMASK, AND RELATE...
- Publication number 20140363633
- Publication date Dec 11, 2014
- Sang-hyun Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...
- Publication number 20140076867
- Publication date Mar 20, 2014
- Sanghyun Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Roman CHALYKH

Person

Patents Grantslast 30 patents

Phase-shift mask for extreme ultraviolet lithography

Phase-shift mask for extreme ultraviolet lithography

Pellicle for preventing thermal accumulation and extreme ultra-viol...

Pellicle for preventing thermal accumulation and extreme ultra-viol...

Beam shapers, annealing systems employing the same, methods of heat...

Methods of reducing a registration error of a photomask, and relate...

Beam shapers, annealing systems employing the same, methods of heat...

Patents Applicationslast 30 patents

PHASE-SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...

PHASE-SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...

PELLICLE MEMBRANE AND METHOD OF MANUFACTURING THE SAME

BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...

METHODS OF REDUCING A REGISTRATION ERROR OF A PHOTOMASK, AND RELATE...

BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...