Roman IVANOV

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Derivatized polyamino acids
- Patent number 11,492,514
- Issue date Nov 8, 2022
- CMC Materials, Inc.
- Na Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Composition and method for copper barrier CMP
- Patent number 10,988,635
- Issue date Apr 27, 2021
- CMC Materials, Inc.
- Steven Kraft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for metal CMP
- Patent number 10,968,366
- Issue date Apr 6, 2021
- CMC Materials, Inc.
- Steven Kraft
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for tungsten CMP
- Patent number 10,676,647
- Issue date Jun 9, 2020
- Cabot Microelectronics Corporation
- Na Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for polishing silicon carbide
- Patent number 10,294,399
- Issue date May 21, 2019
- Cabot Microelectronics Corporation
- Roman Ivanov
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cleaning composition following CMP and methods related thereto
- Patent number 10,100,272
- Issue date Oct 16, 2018
- Cabot Microelectronics Corporation
- Roman Ivanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning composition and method for cleaning semiconductor wafers a...
- Patent number 9,828,574
- Issue date Nov 28, 2017
- Cabot Microelectronics Corporation
- Roman Ivanov
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION AND METHOD FOR COBALT CMP
- Publication number 20230059396
- Publication date Feb 23, 2023
- CMC Materials, Inc.
- Fernando HUNG LOW
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD
- Publication number 20220243094
- Publication date Aug 4, 2022
- CMC Materials, Inc.
- Lung-Tai LU
- B82 - NANO-TECHNOLOGY
Information Patent Application
COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON
- Publication number 20220235247
- Publication date Jul 28, 2022
- CMC Materials, Inc.
- Brittany JOHNSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP COMPOSITION INCLUDING A NOVEL ABRASIVE
- Publication number 20210301178
- Publication date Sep 30, 2021
- Cabot Microelectronics Corporation, n/k/a CMC Materials, Inc.
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DERIVATIZED POLYAMINO ACIDS
- Publication number 20210206920
- Publication date Jul 8, 2021
- CMC Materials, Inc.
- Na ZHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR TUNGSTEN CMP
- Publication number 20200208014
- Publication date Jul 2, 2020
- Cabot Microelectronics Corporation
- Na ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD FOR COPPER BARRIER CMP
- Publication number 20200172762
- Publication date Jun 4, 2020
- Cabot Microelectronics Corporation
- Steven KRAFT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR METAL CMP
- Publication number 20200172760
- Publication date Jun 4, 2020
- Cabot Microelectronics Corporation
- Steven KRAFT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR SILICON NITRIDE CMP
- Publication number 20200172761
- Publication date Jun 4, 2020
- Cabot Microelectronics Corporation
- Fernando HUNG LOW
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR POLISHING SILICON CARBIDE
- Publication number 20190241783
- Publication date Aug 8, 2019
- Cabot Microelectronics Corporation
- Roman IVANOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD FOR POLISHING SILICON CARBIDE
- Publication number 20180190506
- Publication date Jul 5, 2018
- Cabot Microelectronics Corporation
- Roman IVANOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABILIZATION OF TRIS(2 HYDROXYETHYL)METHYLAMMONIUM HYDROXIDE AGAIN...
- Publication number 20170158993
- Publication date Jun 8, 2017
- Cabot Microelectronics Corporation
- Roman IVANOV
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING COMPOSITION FOLLOWING CMP AND METHODS RELATED THERETO
- Publication number 20170158992
- Publication date Jun 8, 2017
- Cabot Microelectronics Corporation
- Roman IVANOV
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS A...
- Publication number 20160201016
- Publication date Jul 14, 2016
- Cabot Microelectronics Corporation
- Roman Ivanov
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Roman IVANOV

Person

Patents Grantslast 30 patents

Derivatized polyamino acids

Composition and method for copper barrier CMP

Composition and method for metal CMP

Composition for tungsten CMP

Composition and method for polishing silicon carbide

Cleaning composition following CMP and methods related thereto

Cleaning composition and method for cleaning semiconductor wafers a...

Patents Applicationslast 30 patents

COMPOSITION AND METHOD FOR COBALT CMP

SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD

COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON

CMP COMPOSITION INCLUDING A NOVEL ABRASIVE

DERIVATIZED POLYAMINO ACIDS

COMPOSITION FOR TUNGSTEN CMP

COMPOSITION AND METHOD FOR COPPER BARRIER CMP

COMPOSITION AND METHOD FOR METAL CMP

COMPOSITION AND METHOD FOR SILICON NITRIDE CMP

COMPOSITION AND METHOD FOR POLISHING SILICON CARBIDE

COMPOSITION AND METHOD FOR POLISHING SILICON CARBIDE

STABILIZATION OF TRIS(2 HYDROXYETHYL)METHYLAMMONIUM HYDROXIDE AGAIN...

CLEANING COMPOSITION FOLLOWING CMP AND METHODS RELATED THERETO

CLEANING COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS A...