Ron-Fu Chu

Person

Amica, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Attenuation of reflecting lights by surface treatment
- Patent number 6,451,706
- Issue date Sep 17, 2002
- Chartered Semiconductor Manufacturing Ltd.
- Ron-Fu Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and slurry composition for chemical-mechanical polish (CMP)...
- Patent number 5,863,307
- Issue date Jan 26, 1999
- Chartered Semiconductor Manufacturing, Ltd.
- Mei Sheng Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Langmuir-blodgett (LB) films as ARC and adhesion promoters for patt...
- Patent number 5,795,699
- Issue date Aug 18, 1998
- Chartered Semiconductor Manufacturing Ltd.
- Mei Sheng Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for enhancement of wafer alignment accuracy
- Patent number 5,734,594
- Issue date Mar 31, 1998
- Chartered Semiconductor Manufacturing Pte Ltd
- Ron-Fu Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflection mask for contact hole opening
- Patent number 5,728,493
- Issue date Mar 17, 1998
- Chartered Semiconductor Manufacturing Pte Ltd
- Chet Ping Lim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced metal etch process
- Patent number 5,582,679
- Issue date Dec 10, 1996
- Chartered Semiconductor Manufacturing Pte Ltd
- Liu Lianjun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxygen reactive ion etch (RIE) plasma method for removing oxidized...
- Patent number 5,567,271
- Issue date Oct 22, 1996
- Chartered Semiconductor Manufacturing Pte Ltd
- Ron F. Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact hole mask for semiconductor fabrication
- Patent number 5,496,666
- Issue date Mar 5, 1996
- Chartered Semiconductor Manufacturing PTE Ltd.
- Ron-Fu Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Attenuation of reflecting lights by surface treatment

Method and slurry composition for chemical-mechanical polish (CMP)...

Langmuir-blodgett (LB) films as ARC and adhesion promoters for patt...

Method and system for enhancement of wafer alignment accuracy

Antireflection mask for contact hole opening

Enhanced metal etch process

Oxygen reactive ion etch (RIE) plasma method for removing oxidized...

Contact hole mask for semiconductor fabrication