Ronald DellaGuardia

Person

Poughkeepsic, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for plasma induced modification and improvement o...
- Patent number 8,049,335
- Issue date Nov 1, 2011
- International Business Machines Corporation
- Timothy J. Dalton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to remove beol sacrificial materials and chemical residues b...
- Patent number 7,598,169
- Issue date Oct 6, 2009
- International Business Machines Corporation
- Qinghuang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective thin metal cap process
- Patent number 7,514,361
- Issue date Apr 7, 2009
- International Business Machines Corporation
- Griselda Bonilla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing damage to ulk dielectric during cross-linked polymer removal
- Patent number 7,253,100
- Issue date Aug 7, 2007
- International Business Machines Corporation
- Ronald A. DellaGuardia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating interconnect structures with reduced plasma...
- Patent number 7,214,603
- Issue date May 8, 2007
- International Business Machines Corporation
- Ronald Dellaguardia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for plasma induced modification and improvement o...
- Patent number 7,196,014
- Issue date Mar 27, 2007
- International Business Machines Corporation
- Timothy J. Dalton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blends of hydroxystyrene polymers for use in chemically amplified p...
- Patent number 6,365,321
- Issue date Apr 2, 2002
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Irradiation sensitive positive-tone resists using polymers containi...
- Patent number 6,303,263
- Issue date Oct 16, 2001
- International Business Machines Machines
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approach to formulating irradiation sensitive positive resists
- Patent number 6,268,436
- Issue date Jul 31, 2001
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist formulation which minimizes blistering during etching
- Patent number 6,207,353
- Issue date Mar 27, 2001
- International Business Machines Corporation
- Michael D. Armacost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist comprising blends of photoacid generators
- Patent number 6,203,965
- Issue date Mar 20, 2001
- Shipley Company, L.L.C.
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approach to formulating irradiation sensitive positive resists
- Patent number 6,103,447
- Issue date Aug 15, 2000
- International Business Machines Corp.
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo acid generator compounds, photo resists, and method for impro...
- Patent number 6,074,800
- Issue date Jun 13, 2000
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymers and photoresist compositions comprising copolymer resin...
- Patent number 6,042,997
- Issue date Mar 28, 2000
- IBM Corporation
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymers and photoresist compositions comprising copolymer resin...
- Patent number 5,861,231
- Issue date Jan 19, 1999
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist development endpoint detection for X-ray lithography
- Patent number 5,264,328
- Issue date Nov 23, 1993
- International Business Machines Corporation
- Ronald A. DellaGuardia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE THIN METAL CAP PROCESS
- Publication number 20090053890
- Publication date Feb 26, 2009
- Griselda Bonilla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROVIDING GAPS IN CAPPING LAYER TO REDUCE TENSILE STRESS FOR BEOL F...
- Publication number 20080315347
- Publication date Dec 25, 2008
- International Business Machines Corporation
- Griselda Bonilla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REMOVE BEOL SACRIFICIAL MATERIALS AND CHEMICAL RESIDUES B...
- Publication number 20080200034
- Publication date Aug 21, 2008
- Qinghuang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED LITHOGRAPHY AND ETCH FOR DUAL DAMASCENE STRUCTURES
- Publication number 20070166648
- Publication date Jul 19, 2007
- International Business Machines Corporation
- Shom Ponoth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PLASMA INDUCED MODIFICATION AND IMPROVEMENT O...
- Publication number 20070143721
- Publication date Jun 21, 2007
- International Business Machines Corporation
- Timothy J. Dalton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING DAMAGE TO ULK DIELECTRIC DURING CROSS-LINKED POLYMER REMOVAL
- Publication number 20070111466
- Publication date May 17, 2007
- International Business Machines Corporation
- Ronald A. DellaGuardia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Fabricating Interconnect Structures with Reduced Plasma...
- Publication number 20060183314
- Publication date Aug 17, 2006
- International Business Machines Corporation
- Ronald Anthony Dellaguardia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for plasma induced modification and improvement o...
- Publication number 20060099816
- Publication date May 11, 2006
- International Business Machines Corporation
- Timothy J. Dalton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material and process for etched structure filling and planarizing
- Publication number 20060089000
- Publication date Apr 27, 2006
- International Business Machines Corporation
- Ronald A. Della Guardia
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Ronald DellaGuardia

Person

Patents Grantslast 30 patents

System and method for plasma induced modification and improvement o...

Method to remove beol sacrificial materials and chemical residues b...

Selective thin metal cap process

Reducing damage to ulk dielectric during cross-linked polymer removal

Method for fabricating interconnect structures with reduced plasma...

System and method for plasma induced modification and improvement o...

Blends of hydroxystyrene polymers for use in chemically amplified p...

Irradiation sensitive positive-tone resists using polymers containi...

Approach to formulating irradiation sensitive positive resists

Resist formulation which minimizes blistering during etching

Photoresist comprising blends of photoacid generators

Approach to formulating irradiation sensitive positive resists

Photo acid generator compounds, photo resists, and method for impro...

Copolymers and photoresist compositions comprising copolymer resin...

Copolymers and photoresist compositions comprising copolymer resin...

Resist development endpoint detection for X-ray lithography

Patents Applicationslast 30 patents

SELECTIVE THIN METAL CAP PROCESS

PROVIDING GAPS IN CAPPING LAYER TO REDUCE TENSILE STRESS FOR BEOL F...

METHOD TO REMOVE BEOL SACRIFICIAL MATERIALS AND CHEMICAL RESIDUES B...

INTEGRATED LITHOGRAPHY AND ETCH FOR DUAL DAMASCENE STRUCTURES

SYSTEM AND METHOD FOR PLASMA INDUCED MODIFICATION AND IMPROVEMENT O...

REDUCING DAMAGE TO ULK DIELECTRIC DURING CROSS-LINKED POLYMER REMOVAL

Method for Fabricating Interconnect Structures with Reduced Plasma...

System and method for plasma induced modification and improvement o...

Material and process for etched structure filling and planarizing