Ronald Johannes Hultermans

Person

Utrecht, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Debris mitigation system, radiation source and lithographic apparatus
- Patent number 10,990,015
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Michel Riepen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Droplet generator for lithographic apparatus, EUV source and lithog...
- Patent number 10,750,604
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Johan Frederik Dijksman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Source collector apparatus, lithographic apparatus and method
- Patent number 9,964,852
- Issue date May 8, 2018
- ASML Netherlands B.V.
- Niek Antonius Jacobus Maria Kleemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source collector apparatus, lithographic apparatus and method
- Patent number 9,841,680
- Issue date Dec 12, 2017
- ASML Netherlands B.V.
- Niek Antonius Jacobus Maria Kleemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Droplet generator, EUV radiation source, lithographic apparatus, me...
- Patent number 9,715,174
- Issue date Jul 25, 2017
- ASML Netherlands B.V.
- Johan Frederik Dijksman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 9,462,667
- Issue date Oct 4, 2016
- ASML Netherlands B.V.
- Johan Frederik Dijksman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source and method for lithographic apparatus for device m...
- Patent number 8,890,099
- Issue date Nov 18, 2014
- ASML Netherlands B.V.
- Ronald Johannes Hultermans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,764,356
- Issue date Jul 27, 2010
- ASML Netherlands B.V.
- Ronald Johannes Hultermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,446,850
- Issue date Nov 4, 2008
- ASML Netherlands B.V.
- Ronald Johannes Hultermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having a gas flushing device
- Patent number 7,136,142
- Issue date Nov 14, 2006
- ASML Netherlands B.V.
- Marcel Beckers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus comprising a gas flushing system
- Patent number 7,106,412
- Issue date Sep 12, 2006
- ASML Netherlands B.V.
- Pieter Klaas De Bokx
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Debris Mitigation System, Radiation Source and Lithographic Apparatus
- Publication number 20190265594
- Publication date Aug 29, 2019
- ASML NETHERLANDS B.V.
- Michel RIEPEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOG...
- Publication number 20180368241
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Johan Frederik DIJKSMAN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180120711
- Publication date May 3, 2018
- ASML NETHERLANDS B.V.
- Niek Antonius Jacobus Maria KLEEMANS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20160054663
- Publication date Feb 25, 2016
- ASML NETHERLANDS B.V.
- Niek Antonius Jacobus Maria KLEEMANS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DROPLET GENERATOR, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS, ME...
- Publication number 20150293456
- Publication date Oct 15, 2015
- ASML NETHERLANDS B.V.
- Johan Frederik Dijksman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Radiation Source and Method for Lithographic Apparatus for Device M...
- Publication number 20140209817
- Publication date Jul 31, 2014
- ASML NETHERLANDS B.V.
- Ronald Johannes Hultermans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100315610
- Publication date Dec 16, 2010
- ASML NETHERLANDS B.V.
- Ronald Johannes Hultermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20090033891
- Publication date Feb 5, 2009
- ASML NETHERLANDS B.V.
- Ronald Johannes Hultermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060119813
- Publication date Jun 8, 2006
- ASML NETHERLANDS B.V.
- Ronald Johannes Hultermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus having a gas flushing device
- Publication number 20050264773
- Publication date Dec 1, 2005
- ASML NETHERLANDS B.V.
- Marcel Beckers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus comprising a gas flushing system
- Publication number 20040212791
- Publication date Oct 28, 2004
- ASML NETHERLANDS B.V.
- Pieter Klaas De Bokx
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ronald Johannes Hultermans

Person

Patents Grantslast 30 patents

Debris mitigation system, radiation source and lithographic apparatus

Droplet generator for lithographic apparatus, EUV source and lithog...

Source collector apparatus, lithographic apparatus and method

Source collector apparatus, lithographic apparatus and method

Droplet generator, EUV radiation source, lithographic apparatus, me...

Radiation source and lithographic apparatus

Radiation source and method for lithographic apparatus for device m...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus having a gas flushing device

Lithographic apparatus comprising a gas flushing system

Patents Applicationslast 30 patents

Debris Mitigation System, Radiation Source and Lithographic Apparatus

DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOG...

SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD

SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD

DROPLET GENERATOR, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS, ME...

Radiation Source and Method for Lithographic Apparatus for Device M...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus having a gas flushing device

Lithographic apparatus comprising a gas flushing system