Ronald Nasman

Person

Averill Park, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and single wafer processing system for processing of semicon...
- Patent number 12,103,052
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Shan Hu
- B08 - CLEANING
Information Patent Grant
Streamlined vaporizer cores
- Patent number 11,920,782
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Ronald Nasman
- F22 - STEAM GENERATION
Information Patent Grant
System for backside deposition of a substrate
- Patent number 11,908,728
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Point-of-use dynamic concentration delivery system with high flow a...
- Patent number 11,383,211
- Issue date Jul 12, 2022
- Tokyo Electron Limited
- Ronald W. Nasman
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Critical dimension correction via calibrated trim dosing
- Patent number 11,360,388
- Issue date Jun 14, 2022
- Tokyo Electron Limited
- Anton deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dispense nozzle with a dynamic liquid plug
- Patent number 10,807,117
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Ronald Nasman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
High-purity dispense unit
- Patent number 10,712,663
- Issue date Jul 14, 2020
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dispense nozzle with a shielding device
- Patent number 10,685,857
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Ronald Nasman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Processing system for electromagnetic wave treatment of a substrate...
- Patent number 10,426,001
- Issue date Sep 24, 2019
- Tokyo Electron Limited
- Ronald Nasman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-purity dispense system
- Patent number 10,403,501
- Issue date Sep 3, 2019
- Tokyo Electron Limited
- Anton J. deVilliers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
High-precision dispense system with meniscus control
- Patent number 10,354,872
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Anton J. deVilliers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Heated stage with variable thermal emissivity method and apparatus
- Patent number 10,256,121
- Issue date Apr 9, 2019
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for a spiral mixer
- Patent number 10,035,113
- Issue date Jul 31, 2018
- Tokyo Electron Limited
- Ronald Nasman
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Inline dispense capacitor system
- Patent number 9,987,655
- Issue date Jun 5, 2018
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inline dispense capacitor
- Patent number 9,718,082
- Issue date Aug 1, 2017
- Tokyo Electron Limited
- Anton deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vaporizer unit with open cell core and method of operating
- Patent number 9,523,151
- Issue date Dec 20, 2016
- Tokyo Electron Limited
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mounting table structure and plasma film forming apparatus
- Patent number 8,592,712
- Issue date Nov 26, 2013
- Tokyo Electron Limited
- Toshiaki Fujisato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device to reduce shadowing during radiative heating of a substrate
- Patent number 8,344,300
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Ronald Nasman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Gas heating device for a vapor deposition system
- Patent number 8,291,856
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature gas heating device for a vapor deposition system
- Patent number 8,272,347
- Issue date Sep 25, 2012
- Tokyo Electron Limited
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature electrostatic chuck and method of using
- Patent number 8,194,384
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Ronald Nasman
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Thermal stress-failure-resistant dielectric windows in vacuum proce...
- Patent number 7,959,775
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...
- Publication number 20240399422
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- B08 - CLEANING
Information Patent Application
SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE
- Publication number 20240194516
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...
- Publication number 20230405642
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Shan Hu
- B08 - CLEANING
Information Patent Application
STREAMLINED VAPORIZER CORES
- Publication number 20210148564
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- F22 - STEAM GENERATION
Information Patent Application
POINT-OF-USE DYNAMIC CONCENTRATION DELIVERY SYSTEM WITH HIGH FLOW A...
- Publication number 20200338510
- Publication date Oct 29, 2020
- TOKYO ELECTRON LIMITED
- Ronald W. NASMAN
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Critical Dimension Correction Via Calibrated Trim Dosing
- Publication number 20190287795
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Anton deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE
- Publication number 20190035646
- Publication date Jan 31, 2019
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISPENSE NOZZLE WITH A SHIELDING DEVICE
- Publication number 20180254202
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VORTICAL ATOMIZING NOZZLE ASSEMBLY, VAPORIZER, AND RELATED METHODS...
- Publication number 20180066363
- Publication date Mar 8, 2018
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High-Purity Dispense Unit
- Publication number 20180046082
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Precision Dispense System With Meniscus Control
- Publication number 20180047563
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Purity Dispense System
- Publication number 20180047562
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPENSE NOZZLE WITH A SHIELDING DEVICE
- Publication number 20170110345
- Publication date Apr 20, 2017
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DISPENSE NOZZLE WITH A DYNAMIC LIQUID PLUG
- Publication number 20170096326
- Publication date Apr 6, 2017
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- B67 - OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS LIQUID...
Information Patent Application
HEATED STAGE WITH VARIABLE THERMAL EMISSIVITY METHOD AND APPARATUS
- Publication number 20170011975
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inline Dispense Capacitor System
- Publication number 20160375459
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD AND SYSTEM FOR A SPIRAL MIXER
- Publication number 20160250606
- Publication date Sep 1, 2016
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
VAPORIZER UNIT WITH OPEN CELL CORE AND METHOD OF OPERATING
- Publication number 20150240355
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inline Dispense Capacitor
- Publication number 20150209818
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Anton deVilliers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PROCESSING SYSTEM FOR ELECTROMAGNETIC WAVE TREATMENT OF A SUBSTRATE...
- Publication number 20140273532
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS DIFFUSER ASSEMBLY FOR VAPOR DEPOSITION SYSTEM
- Publication number 20140116339
- Publication date May 1, 2014
- Ronald Nasman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PROCESS GAS DIFFUSER ASSEMBLY FOR VAPOR DEPOSITION SYSTEM
- Publication number 20120312234
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Ronald NASMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Device to reduce shadowing during radiative heating of a substrate
- Publication number 20110303654
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Ronald NASMAN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
High temperature gas heating device for a vapor deposition system
- Publication number 20110061595
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Ronald NASMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High temperature susceptor having improved processing uniformity
- Publication number 20100248397
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Danny NEWMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOUNTING TABLE STRUCTURE AND PLASMA FILM FORMING APPARATUS
- Publication number 20100244350
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Toshiaki Fujisato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE ELECTROSTATIC CHUCK AND METHOD OF USING
- Publication number 20100020463
- Publication date Jan 28, 2010
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
ADJUSTABLE MAGNET PACK FOR SEMICONDUCTOR WAFER PROCESSING
- Publication number 20090242396
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS HEATING DEVICE FOR A VAPOR DEPOSITION SYSTEM
- Publication number 20090223452
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POROUS GAS HEATING DEVICE FOR A VAPOR DEPOSITION SYSTEM
- Publication number 20090226614
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Ronald Nasman

Person

Patents Grantslast 30 patents

Method and single wafer processing system for processing of semicon...

Streamlined vaporizer cores

System for backside deposition of a substrate

Point-of-use dynamic concentration delivery system with high flow a...

Critical dimension correction via calibrated trim dosing

Dispense nozzle with a dynamic liquid plug

High-purity dispense unit

Dispense nozzle with a shielding device

Processing system for electromagnetic wave treatment of a substrate...

High-purity dispense system

High-precision dispense system with meniscus control

Heated stage with variable thermal emissivity method and apparatus

Method and system for a spiral mixer

Inline dispense capacitor system

Inline dispense capacitor

Vaporizer unit with open cell core and method of operating

Mounting table structure and plasma film forming apparatus

Device to reduce shadowing during radiative heating of a substrate

Gas heating device for a vapor deposition system

High temperature gas heating device for a vapor deposition system

High temperature electrostatic chuck and method of using

Thermal stress-failure-resistant dielectric windows in vacuum proce...

Patents Applicationslast 30 patents

METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...

SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE

METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...

STREAMLINED VAPORIZER CORES

POINT-OF-USE DYNAMIC CONCENTRATION DELIVERY SYSTEM WITH HIGH FLOW A...

Critical Dimension Correction Via Calibrated Trim Dosing

SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE

DISPENSE NOZZLE WITH A SHIELDING DEVICE

VORTICAL ATOMIZING NOZZLE ASSEMBLY, VAPORIZER, AND RELATED METHODS...

High-Purity Dispense Unit

High-Precision Dispense System With Meniscus Control

High-Purity Dispense System

DISPENSE NOZZLE WITH A SHIELDING DEVICE

DISPENSE NOZZLE WITH A DYNAMIC LIQUID PLUG

HEATED STAGE WITH VARIABLE THERMAL EMISSIVITY METHOD AND APPARATUS

Inline Dispense Capacitor System

METHOD AND SYSTEM FOR A SPIRAL MIXER

VAPORIZER UNIT WITH OPEN CELL CORE AND METHOD OF OPERATING

Inline Dispense Capacitor

PROCESSING SYSTEM FOR ELECTROMAGNETIC WAVE TREATMENT OF A SUBSTRATE...

PROCESS GAS DIFFUSER ASSEMBLY FOR VAPOR DEPOSITION SYSTEM

PROCESS GAS DIFFUSER ASSEMBLY FOR VAPOR DEPOSITION SYSTEM

Device to reduce shadowing during radiative heating of a substrate

High temperature gas heating device for a vapor deposition system

High temperature susceptor having improved processing uniformity

MOUNTING TABLE STRUCTURE AND PLASMA FILM FORMING APPARATUS

HIGH TEMPERATURE ELECTROSTATIC CHUCK AND METHOD OF USING

ADJUSTABLE MAGNET PACK FOR SEMICONDUCTOR WAFER PROCESSING

GAS HEATING DEVICE FOR A VAPOR DEPOSITION SYSTEM

POROUS GAS HEATING DEVICE FOR A VAPOR DEPOSITION SYSTEM