Ronaldus Johannes Gijsbertus Goossens

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for inspecting a wafer
- Patent number 11,561,480
- Issue date Jan 24, 2023
- ASML Netherlands B.V.
- Ivo Liebregts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based scanner tuning systems and methods
- Patent number 10,569,469
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Model-based process simulation systems and methods
- Patent number 10,137,643
- Issue date Nov 27, 2018
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern selection for lithographic model calibration
- Patent number 9,672,301
- Issue date Jun 6, 2017
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based scanner tuning systems and methods
- Patent number 8,874,423
- Issue date Oct 28, 2014
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model-based process simulation systems and methods
- Patent number 8,806,387
- Issue date Aug 12, 2014
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern selection for lithographic model calibration
- Patent number 8,694,928
- Issue date Apr 8, 2014
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model-based scanner tuning systems and methods
- Patent number 8,571,845
- Issue date Oct 29, 2013
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR INSPECTING A WAFER
- Publication number 20200209761
- Publication date Jul 2, 2020
- ASML NETHERLANDS B.V.
- Ivo LIEBREGTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS
- Publication number 20200189192
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS
- Publication number 20150045935
- Publication date Feb 12, 2015
- ASML NETHERLANDS B.V.
- Yu CAO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS
- Publication number 20140351773
- Publication date Nov 27, 2014
- ASML NETHERLANDS B.V.
- Yu CAO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PATTERN SELECTION FOR LITHOGRAPHIC MODEL CALIBRATION
- Publication number 20140208278
- Publication date Jul 24, 2014
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS
- Publication number 20140046646
- Publication date Feb 13, 2014
- ASML NETHERLANDS B.V.
- Yu CAO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Ronaldus Johannes Gijsbertus Goossens

Person

Patents Grantslast 30 patents

System and method for inspecting a wafer

Model-based scanner tuning systems and methods

Model-based process simulation systems and methods

Pattern selection for lithographic model calibration

Model-based scanner tuning systems and methods

Model-based process simulation systems and methods

Pattern selection for lithographic model calibration

Model-based scanner tuning systems and methods

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR INSPECTING A WAFER

MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS

MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS

MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS

PATTERN SELECTION FOR LITHOGRAPHIC MODEL CALIBRATION

MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS