RONGJUN WANG

Person

Dublin, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Top magnets for decreased non-uniformity in PVD
- Patent number 12,112,890
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Borui Xia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 12,094,699
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 11,810,770
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon-containing layer for bit line resistance reduction
- Patent number 11,637,107
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing layer for bit line resistance reduction
- Patent number 11,626,410
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and e...
- Patent number 11,575,071
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic tunnel junction structures and methods of manufacture thereof
- Patent number 11,552,244
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Lin Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistance-area (RA) control in layers deposited in physical vapor...
- Patent number 11,542,589
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Rongjun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for treating magnesium oxide film
- Patent number 11,489,110
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Paste method to reduce defects in dielectric sputtering
- Patent number 11,459,651
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition (PVD) chamber with reduced arcing
- Patent number 11,393,665
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Chao Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing amorphous silicon layers or silicon oxycarbi...
- Patent number 11,313,034
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Weimin Zeng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic tunnel junctions suitable for high temperature thermal pro...
- Patent number 11,251,364
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Lin Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming structures with desired crystallinity for MRAM...
- Patent number 11,245,069
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Lin Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber target for reducing defects in workpiece during diel...
- Patent number 11,227,751
- Issue date Jan 18, 2022
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming structures with desired crystallinity for MRAM...
- Patent number 11,133,460
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Lin Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and e...
- Patent number 11,081,623
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...
- Patent number 11,075,276
- Issue date Jul 27, 2021
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for multi-cathode processing chamber
- Patent number 11,043,364
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Hanbing Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 11,037,768
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PVD buffer layers for LED fabrication
- Patent number 11,011,676
- Issue date May 18, 2021
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for multi-cathode substrate processing
- Patent number 11,011,357
- Issue date May 18, 2021
- Applied Materials, Inc.
- Hanbing Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic tunnel junctions with tunable high perpendicular magnetic...
- Patent number 10,998,496
- Issue date May 4, 2021
- Applied Materials, Inc.
- Lin Xue
- G11 - INFORMATION STORAGE
Information Patent Grant
Magnetic tunnel junctions with coupling-pinning layer lattice matching
- Patent number 10,957,849
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Lin Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic tunnel junction structures and methods of manufacture thereof
- Patent number 10,944,050
- Issue date Mar 9, 2021
- Applied Materials, Inc.
- Lin Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods of fabricating a magneto-resistive random acc...
- Patent number 10,910,557
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Chi Ching
- G11 - INFORMATION STORAGE
Information Patent Grant
High pressure RF-DC sputtering and methods to improve film uniformi...
- Patent number 10,763,090
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Adolph Miller Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit shield for improved particle reduction
- Patent number 10,718,049
- Issue date Jul 21, 2020
- Applied Materials, Inc.
- Muhammad Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma chamber target for reducing defects in workpiece during diel...
- Patent number 10,704,139
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SILICON NITRIDE DAMAGE-FREE DRY ETCH METHOD FOR TUNGSTEN REMOVAL IN...
- Publication number 20240371654
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Qihao ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERRUPTION LAYER FILL FOR LOW RESISTANCE CONTACTS
- Publication number 20240371771
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Sahil Jaykumar PATEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-ENERGY UNDERLAYER FOR ROOM TEMPERATURE PHYSICAL VAPOR DEPOSITIO...
- Publication number 20240363407
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Jie ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID MOLYBDENUM FILL SCHEME FOR LOW RESISTIVITY SEMICONDUCTOR APP...
- Publication number 20240355673
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Wei LEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES
- Publication number 20240304495
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Tsung-Han Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATION SOLUTION FOR NAND DEEP CONTACT GAP FILL
- Publication number 20240282631
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Xi CEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTIVITY GAPFILL FOR LOGIC DEVICES
- Publication number 20240240314
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- Zhen Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW RESISTIVITY GAPFILL
- Publication number 20240175120
- Publication date May 30, 2024
- Applied Materials, Inc.
- Tsung-Han Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Gapfill
- Publication number 20240178062
- Publication date May 30, 2024
- Yi XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF REMOVING METAL OXIDE USING CLEANING PLASMA
- Publication number 20240167148
- Publication date May 23, 2024
- Applied Materials, Inc.
- Tsung-Han Yang
- B08 - CLEANING
Information Patent Application
Methods for Forming Low Resistivity Contacts
- Publication number 20240105444
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Jiang LU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED PVD TUNGSTEN LINER AND SEAMLESS CVD TUNGSTEN FILL
- Publication number 20240087955
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Yi XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING METAL GAPFILL WITH LOW RESISTIVITY
- Publication number 20240088071
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Yi XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN GAP FILL WITH HYDROGEN PLASMA TREATMENT
- Publication number 20240047267
- Publication date Feb 8, 2024
- Tsung-Han YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NITROGEN PLASMA TREATMENT FOR BOTTOM-UP GROWTH
- Publication number 20240014072
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Tsung-Han YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED TUNGSTEN NUCLEATION FOR LOW RESISTIVITY
- Publication number 20240006236
- Publication date Jan 4, 2024
- Applied Materials, Inc.
- Tsung-Han YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT OF TUNGSTEN SURFACE FOR TUNGSTEN GAP-FILL
- Publication number 20230420295
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Tsung-Han YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20230402271
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE METAL REMOVAL WITH FLOWABLE POLYMER
- Publication number 20230386833
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Liqi Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230377892
- Publication date Nov 23, 2023
- Yiyang WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF IN-SITU SELECTIVE METAL REMOVAL VIA GRADIENT OXIDATION FO...
- Publication number 20230343644
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Chih-Hsun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADIENT OXIDATION AND ETCH FOR PVD METAL AS BOTTOM LINER IN BOTTOM...
- Publication number 20230343643
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Chih-Hsun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR FABRICATING PVD PEROVSKITE FILMS
- Publication number 20230257868
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Zihao YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten Fluoride Soak And Treatment For Tungsten Oxide Removal
- Publication number 20230187204
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Xiaodong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230122956
- Publication date Apr 20, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TOP MAGNETS FOR DECREASED NON-UNIFORMITY IN PVD
- Publication number 20230088552
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Borui Xia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER
- Publication number 20230073011
- Publication date Mar 9, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon-Containing Layer for Bit Line Resistance Reduction
- Publication number 20220406788
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon-Containing Layer for Bit Line Resistance Reduction
- Publication number 20220406790
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Tom Ho Wing Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220310364
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Halbert CHONG
- B08 - CLEANING

RONGJUN WANG

Person

Patents Grantslast 30 patents

Top magnets for decreased non-uniformity in PVD

Methods and apparatus for controlling ion fraction in physical vapo...

Methods and apparatus for processing a substrate

Methods and apparatus for controlling ion fraction in physical vapo...

Silicon-containing layer for bit line resistance reduction

Silicon-containing layer for bit line resistance reduction

Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and e...

Magnetic tunnel junction structures and methods of manufacture thereof

Resistance-area (RA) control in layers deposited in physical vapor...

Methods for treating magnesium oxide film

Paste method to reduce defects in dielectric sputtering

Physical vapor deposition (PVD) chamber with reduced arcing

Methods for depositing amorphous silicon layers or silicon oxycarbi...

Magnetic tunnel junctions suitable for high temperature thermal pro...

Methods for forming structures with desired crystallinity for MRAM...

Plasma chamber target for reducing defects in workpiece during diel...

Methods for forming structures with desired crystallinity for MRAM...

Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and e...

Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...

Process kit for multi-cathode processing chamber

Methods and apparatus for controlling ion fraction in physical vapo...

PVD buffer layers for LED fabrication

Methods and apparatus for multi-cathode substrate processing

Magnetic tunnel junctions with tunable high perpendicular magnetic...

Magnetic tunnel junctions with coupling-pinning layer lattice matching

Magnetic tunnel junction structures and methods of manufacture thereof

Apparatus and methods of fabricating a magneto-resistive random acc...

High pressure RF-DC sputtering and methods to improve film uniformi...

Process kit shield for improved particle reduction

Plasma chamber target for reducing defects in workpiece during diel...

Patents Applicationslast 30 patents

SILICON NITRIDE DAMAGE-FREE DRY ETCH METHOD FOR TUNGSTEN REMOVAL IN...

INTERRUPTION LAYER FILL FOR LOW RESISTANCE CONTACTS

LOW-ENERGY UNDERLAYER FOR ROOM TEMPERATURE PHYSICAL VAPOR DEPOSITIO...

HYBRID MOLYBDENUM FILL SCHEME FOR LOW RESISTIVITY SEMICONDUCTOR APP...

HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES

INTEGRATION SOLUTION FOR NAND DEEP CONTACT GAP FILL

LOW RESISTIVITY GAPFILL FOR LOGIC DEVICES

LOW RESISTIVITY GAPFILL

Method for Gapfill

METHODS OF REMOVING METAL OXIDE USING CLEANING PLASMA

Methods for Forming Low Resistivity Contacts

INTEGRATED PVD TUNGSTEN LINER AND SEAMLESS CVD TUNGSTEN FILL

METHODS FOR FORMING METAL GAPFILL WITH LOW RESISTIVITY

TUNGSTEN GAP FILL WITH HYDROGEN PLASMA TREATMENT

NITROGEN PLASMA TREATMENT FOR BOTTOM-UP GROWTH

PLASMA ENHANCED TUNGSTEN NUCLEATION FOR LOW RESISTIVITY

TREATMENT OF TUNGSTEN SURFACE FOR TUNGSTEN GAP-FILL

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

SELECTIVE METAL REMOVAL WITH FLOWABLE POLYMER

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHOD OF IN-SITU SELECTIVE METAL REMOVAL VIA GRADIENT OXIDATION FO...

GRADIENT OXIDATION AND ETCH FOR PVD METAL AS BOTTOM LINER IN BOTTOM...

APPARATUS AND METHOD FOR FABRICATING PVD PEROVSKITE FILMS

Tungsten Fluoride Soak And Treatment For Tungsten Oxide Removal

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

TOP MAGNETS FOR DECREASED NON-UNIFORMITY IN PVD

SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER

Silicon-Containing Layer for Bit Line Resistance Reduction

Silicon-Containing Layer for Bit Line Resistance Reduction

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE