Roy Werkman

Person

Waalre, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of wafer alignment using at resolution metrology on product...
- Patent number 12,124,179
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining a correction to a process
- Patent number 11,994,845
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining corrections for lithographic apparatus
- Patent number 11,754,931
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a manufacturing apparatus and associated app...
- Patent number 11,669,017
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing a sequence of processes for manufacturing of product units
- Patent number 11,442,367
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Jochem Sebastiaan Wildenberg
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of determining a set of metrology points on a substrate, ass...
- Patent number 11,435,673
- Issue date Sep 6, 2022
- ASML Netherlands B.V.
- Kevin Van De Ruit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 11,378,891
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for evaluating control strategies in a semiconductor manufac...
- Patent number 11,372,338
- Issue date Jun 28, 2022
- ASML Netherlands B.V.
- Ivo Matteo Leonardus Weijden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Estimating a parameter of a substrate
- Patent number 11,327,406
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Svetla Petrova Matova
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to change an etch parameter
- Patent number 11,300,887
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing a sequence of processes for manufacturing of product units
- Patent number 11,106,141
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Jochem Sebastiaan Wildenberg
- G05 - CONTROLLING REGULATING
Information Patent Grant
Determining a correction to a process
- Patent number 11,086,305
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for characterizing distortions in a lithographic process, li...
- Patent number 10,928,737
- Issue date Feb 23, 2021
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration method for a lithographic apparatus
- Patent number 10,884,345
- Issue date Jan 5, 2021
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 10,816,904
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for reticle optimization
- Patent number 10,725,372
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calibration method for a lithographic apparatus
- Patent number 10,627,729
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus, an apparatus for projecting an image and a me...
- Patent number 7,969,577
- Issue date Jun 28, 2011
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of selecting a grid model for correcting a process recipe fo...
- Patent number 7,468,795
- Issue date Dec 23, 2008
- ASML Netherlands B.V.
- Hubertus Johannes Gertrudus Simons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment of substrates for bonding
- Patent number 7,433,038
- Issue date Oct 7, 2008
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,415,319
- Issue date Aug 19, 2008
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment strategy optimization method
- Patent number 7,042,552
- Issue date May 9, 2006
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20240345569
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CAUSAL CONVOLUTION NETWORK FOR PROCESS CONTROL
- Publication number 20240184254
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METRO...
- Publication number 20240036479
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND COMPUTER PROGRAMS FOR CONFIGURATION OF A SAMPLING SCHEM...
- Publication number 20230400778
- Publication date Dec 14, 2023
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS
- Publication number 20230333485
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...
- Publication number 20230168594
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING CONTROL DATA FOR A LITHOGRAPHI...
- Publication number 20220413391
- Publication date Dec 29, 2022
- ASML NETHERLANDS B.V.
- Michel Alphons Theodorus VAN HINSBERG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20220342319
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR LITHOGRAPHIC PROCESS PERFORMANCE DETERMINA...
- Publication number 20220291593
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A SAMPLING SCHEME, A SEMICONDUCTOR SUBSTRATE...
- Publication number 20220260920
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Pieter Gerardus Jacobus SMORENBERG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CORRECTIONS FOR LITHOGRAPHIC APPARATUS
- Publication number 20220252988
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A SEMICONDUCTOR MANUFACTURING PROCESS
- Publication number 20220236647
- Publication date Jul 28, 2022
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A SET OF METROLOGY POINTS ON A SUBSTRATE, ASS...
- Publication number 20220155698
- Publication date May 19, 2022
- ASML NETHERLANDS B.V.
- Kevin VAN DE RUIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS
- Publication number 20220091514
- Publication date Mar 24, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR OBTAINING TRAINING DATA FOR TRAINING A MODEL OF A SEMICO...
- Publication number 20210405544
- Publication date Dec 30, 2021
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS
- Publication number 20210389684
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Jochem Sebastiaan Wildenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20210333785
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ESTIMATING A PARAMETER OF A SUBSTRATE
- Publication number 20210271171
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Svetla Petrova MATOVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20210165399
- Publication date Jun 3, 2021
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20210003927
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EVALUATING CONTROL STRATEGIES IN A SEMICONDUCTOR MANUFAC...
- Publication number 20200401052
- Publication date Dec 24, 2020
- ASML NETHERLANDS B.V.
- Ivo Matteo Leonardus WEIJDEN
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APP...
- Publication number 20200278614
- Publication date Sep 3, 2020
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration Method for a Lithographic Apparatus
- Publication number 20200218170
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS
- Publication number 20200026200
- Publication date Jan 23, 2020
- ASML NETHERLANDS B.V.
- Jochem Sebastiaan WILDENBERG
- G05 - CONTROLLING REGULATING
Information Patent Application
A METHOD TO CHANGE AN ETCH PARAMETER
- Publication number 20190285992
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20190271919
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Davit HARUTYUNYAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CHARACTERIZING DISTORTIONS IN A LITHOGRAPHIC PROCESS, LI...
- Publication number 20190011842
- Publication date Jan 10, 2019
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration Method for a Lithographic Apparatus
- Publication number 20180173118
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS FOR RETICLE OPTIMIZATION
- Publication number 20180011398
- Publication date Jan 11, 2018
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING

Roy Werkman

Person

Patents Grantslast 30 patents

Method of wafer alignment using at resolution metrology on product...

Determining a correction to a process

Method for determining corrections for lithographic apparatus

Method for controlling a manufacturing apparatus and associated app...

Optimizing a sequence of processes for manufacturing of product units

Method of determining a set of metrology points on a substrate, ass...

Method for determining contribution to a fingerprint

Method for evaluating control strategies in a semiconductor manufac...

Estimating a parameter of a substrate

Method to change an etch parameter

Optimizing a sequence of processes for manufacturing of product units

Determining a correction to a process

Method for characterizing distortions in a lithographic process, li...

Calibration method for a lithographic apparatus

Method for determining contribution to a fingerprint

Method and apparatus for reticle optimization

Calibration method for a lithographic apparatus

Inspection apparatus, an apparatus for projecting an image and a me...

Method of selecting a grid model for correcting a process recipe fo...

Alignment of substrates for bonding

Lithographic apparatus and device manufacturing method

Alignment strategy optimization method

Patents Applicationslast 30 patents

DETERMINING A CORRECTION TO A PROCESS

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

CAUSAL CONVOLUTION NETWORK FOR PROCESS CONTROL

METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METRO...

METHODS AND COMPUTER PROGRAMS FOR CONFIGURATION OF A SAMPLING SCHEM...

TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS

METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...

METHOD AND APPARATUS FOR DETERMINING CONTROL DATA FOR A LITHOGRAPHI...

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD AND APPARATUS FOR LITHOGRAPHIC PROCESS PERFORMANCE DETERMINA...

METHOD FOR DETERMINING A SAMPLING SCHEME, A SEMICONDUCTOR SUBSTRATE...

METHOD FOR DETERMINING CORRECTIONS FOR LITHOGRAPHIC APPARATUS

METHOD FOR CONTROLLING A SEMICONDUCTOR MANUFACTURING PROCESS

METHOD OF DETERMINING A SET OF METROLOGY POINTS ON A SUBSTRATE, ASS...

METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS

METHOD FOR OBTAINING TRAINING DATA FOR TRAINING A MODEL OF A SEMICO...

OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS

DETERMINING A CORRECTION TO A PROCESS

ESTIMATING A PARAMETER OF A SUBSTRATE

DETERMINING A CORRECTION TO A PROCESS

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR EVALUATING CONTROL STRATEGIES IN A SEMICONDUCTOR MANUFAC...

METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APP...

Calibration Method for a Lithographic Apparatus

OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS

A METHOD TO CHANGE AN ETCH PARAMETER

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR CHARACTERIZING DISTORTIONS IN A LITHOGRAPHIC PROCESS, LI...

Calibration Method for a Lithographic Apparatus

METHOD AND APPARATUS FOR RETICLE OPTIMIZATION