Rudolf Brunner

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma cell for providing VUV filtering in a laser-sustained plasma...
- Patent number 10,976,025
- Issue date Apr 13, 2021
- KLA Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligning systems and methods for lithography systems
- Patent number 10,599,055
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for electrodeless plasma ignition in laser-sustai...
- Patent number 10,244,613
- Issue date Mar 26, 2019
- KLA-Tencor Corporation
- Anant Chimmalgi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma cell for providing VUV filtering in a laser-sustained plasma...
- Patent number 9,927,094
- Issue date Mar 27, 2018
- KLA-Tencor Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flexible optical aperture mechanisms
- Patent number 9,645,287
- Issue date May 9, 2017
- KLA-Tencor Corporation
- Rudolf Brunner
- G02 - OPTICS
Information Patent Grant
Method and apparatus to reduce thermal stress by regulation and con...
- Patent number 9,534,848
- Issue date Jan 3, 2017
- KLA-Tencor Corporation
- Jincheng Wang
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Wafer and reticle inspection systems and methods for selecting illu...
- Patent number 9,523,646
- Issue date Dec 20, 2016
- KLA-Tencor Corporation
- Grace H. Chen
- G01 - MEASURING TESTING
Information Patent Grant
Wafer and reticle inspection systems and methods for selecting illu...
- Patent number 9,347,891
- Issue date May 24, 2016
- KLA-Tencor Corporation
- Grace H. Chen
- G01 - MEASURING TESTING
Information Patent Grant
2D programmable aperture mechanism
- Patent number 9,255,887
- Issue date Feb 9, 2016
- KLA-Tencor Corporation
- Rudolf Brunner
- G01 - MEASURING TESTING
Information Patent Grant
Diode laser based broad band light sources for wafer inspection tools
- Patent number 9,110,037
- Issue date Aug 18, 2015
- KLA-Tencor Corporation
- Anant Chimmalgi
- G01 - MEASURING TESTING
Information Patent Grant
Diode laser based broad band light sources for wafer inspection tools
- Patent number 8,896,827
- Issue date Nov 25, 2014
- KLA-Tencor Corporation
- Anant Chimmalgi
- G01 - MEASURING TESTING
Information Patent Grant
Recirculation high purity system for protecting optical modules or...
- Patent number 8,414,688
- Issue date Apr 9, 2013
- KLA-Tencor Corporation
- Gildardo Delgado
- B08 - CLEANING
Information Patent Grant
Fourier filtering mechanism for inspecting wafers
- Patent number 5,970,168
- Issue date Oct 19, 1999
- KLA-Tencor Corporation
- Steve Montesanto
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PNEUMATIC CONTROLLED FLEXURE SYSTEM FOR STABILIZING A PROJECTION DE...
- Publication number 20240069452
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Assaf KIDRON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma...
- Publication number 20210231292
- Publication date Jul 29, 2021
- KLA Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma...
- Publication number 20180172240
- Publication date Jun 21, 2018
- KLA-Tencor Corporation
- Ilya Bezel
- F21 - LIGHTING
Information Patent Application
System and Method for Electrodeless Plasma Ignition in Laser-Sustai...
- Publication number 20170150590
- Publication date May 25, 2017
- KLA-Tencor Corporation
- Anant Chimmalgi
- G02 - OPTICS
Information Patent Application
WAFER AND RETICLE INSPECTION SYSTEMS AND METHODS FOR SELECTING ILLU...
- Publication number 20160266047
- Publication date Sep 15, 2016
- KLA-Tencor Corporation
- Grace H. Chen
- G01 - MEASURING TESTING
Information Patent Application
DIODE LASER BASED BROAD BAND LIGHT SOURCES FOR WAFER INSPECTION TOOLS
- Publication number 20150042979
- Publication date Feb 12, 2015
- KLA-Tencor Corporation
- Anant Chimmalgi
- G01 - MEASURING TESTING
Information Patent Application
WAFER AND RETICLE INSPECTION SYSTEMS AND METHODS FOR SELECTING ILLU...
- Publication number 20150015874
- Publication date Jan 15, 2015
- KLA-Tencor Corporation
- Grace H. Chen
- G01 - MEASURING TESTING
Information Patent Application
2D PROGRAMMABLE APERTURE MECHANISM
- Publication number 20140375987
- Publication date Dec 25, 2014
- Rudolf Brunner
- G02 - OPTICS
Information Patent Application
FLEXIBLE OPTICAL APERTURE MECHANISMS
- Publication number 20140168740
- Publication date Jun 19, 2014
- Rudolf Brunner
- G02 - OPTICS
Information Patent Application
Method and Apparatus to Reduce Thermal Stress by Regulation and Con...
- Publication number 20140060792
- Publication date Mar 6, 2014
- KLA-Tencor Corporation
- Jincheng Wang
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
DIODE LASER BASED BROAD BAND LIGHT SOURCES FOR WAFER INSPECTION TOOLS
- Publication number 20130342825
- Publication date Dec 26, 2013
- Anant Chimmalgi
- G01 - MEASURING TESTING
Information Patent Application
Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma...
- Publication number 20130181595
- Publication date Jul 18, 2013
- KLA-Tencor Corporation
- Ilya Bezel
- F21 - LIGHTING

Rudolf Brunner

Person

Patents Grantslast 30 patents

Plasma cell for providing VUV filtering in a laser-sustained plasma...

Self aligning systems and methods for lithography systems

System and method for electrodeless plasma ignition in laser-sustai...

Plasma cell for providing VUV filtering in a laser-sustained plasma...

Flexible optical aperture mechanisms

Method and apparatus to reduce thermal stress by regulation and con...

Wafer and reticle inspection systems and methods for selecting illu...

Wafer and reticle inspection systems and methods for selecting illu...

2D programmable aperture mechanism

Diode laser based broad band light sources for wafer inspection tools

Diode laser based broad band light sources for wafer inspection tools

Recirculation high purity system for protecting optical modules or...

Fourier filtering mechanism for inspecting wafers

Patents Applicationslast 30 patents

PNEUMATIC CONTROLLED FLEXURE SYSTEM FOR STABILIZING A PROJECTION DE...

Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma...

Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma...

System and Method for Electrodeless Plasma Ignition in Laser-Sustai...

WAFER AND RETICLE INSPECTION SYSTEMS AND METHODS FOR SELECTING ILLU...

DIODE LASER BASED BROAD BAND LIGHT SOURCES FOR WAFER INSPECTION TOOLS

WAFER AND RETICLE INSPECTION SYSTEMS AND METHODS FOR SELECTING ILLU...

2D PROGRAMMABLE APERTURE MECHANISM

FLEXIBLE OPTICAL APERTURE MECHANISMS

Method and Apparatus to Reduce Thermal Stress by Regulation and Con...

DIODE LASER BASED BROAD BAND LIGHT SOURCES FOR WAFER INSPECTION TOOLS

Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma...