Rui Cheng

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods to eliminate of deposition on wafer bevel and backside
- Patent number 12,255,054
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron concentration tunability in boron-silicon films
- Patent number 12,205,818
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming and patterning a layer and/or substrate
- Patent number 12,183,578
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seam removal in high aspect ratio gap-fill
- Patent number 12,142,480
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Qinghua Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-doped boron films
- Patent number 12,077,852
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Aykut Aydin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for substrate support temperature control
- Patent number 12,062,567
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Zubin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processes for depositing sib films
- Patent number 12,033,848
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Aykut Aydin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for substrate support temperature control
- Patent number 11,981,998
- Issue date May 14, 2024
- Applied Materials, Inc.
- Zubin Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron concentration tunability in boron-silicon films
- Patent number 11,961,739
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for improving thermal chemical vapor depositi...
- Patent number 11,939,675
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for Si gap fill by PECVD
- Patent number 11,848,232
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Xin Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heated pedestal design for improved heat transfer and temperature u...
- Patent number 11,830,706
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of silicon using deposition-treat-etch process
- Patent number 11,769,666
- Issue date Sep 26, 2023
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,705,335
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping semiconductor films
- Patent number 11,676,813
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Aykut Aydin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma enhanced deposition of silicon-containing films at low tempe...
- Patent number 11,640,905
- Issue date May 2, 2023
- Applied Materials, Inc.
- Aykut Aydin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD tungsten containing hardmask films and methods of making
- Patent number 11,594,415
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen management in plasma deposited films
- Patent number 11,562,902
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling concentration profiles for deposited films using machin...
- Patent number 11,532,525
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Anton V Baryshnikov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple spacer patterning schemes
- Patent number 11,527,408
- Issue date Dec 13, 2022
- Applied Materials, Inc.
- Tzu-shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D NAND etch
- Patent number 11,515,170
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gapfill in high aspect ratio structures
- Patent number 11,488,856
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal halogen doping in 3D structures using conformal dopant fi...
- Patent number 11,462,630
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for modifying photoresist profiles and tuning critical dime...
- Patent number 11,456,173
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Meenakshi Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation via pulsed RF plasma
- Patent number 11,443,919
- Issue date Sep 13, 2022
- Applied Materials, Inc.
- Krishna Nittala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for Si gap fill by PECVD
- Patent number 11,361,991
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Xin Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for conformal doping of three dimensional structures
- Patent number 11,335,555
- Issue date May 17, 2022
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,328,928
- Issue date May 10, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple spacer patterning schemes
- Patent number 11,315,787
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Tzu-shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal doped amorphous silicon as nucleation layer for metal dep...
- Patent number 11,244,824
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS
- Publication number 20250112046
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAM REMOVAL IN HIGH ASPECT RATIO GAP-FILL
- Publication number 20250037996
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Qinghua Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...
- Publication number 20240387174
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Guangyan Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES FOR DEPOSITING SIB FILMS
- Publication number 20240339316
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Aykut AYDIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING ASSISTED TUNGSTEN-CONTAINING FILM DEPOSITION
- Publication number 20240332003
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Qinghua Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT
- Publication number 20240304437
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Chuanxi YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-...
- Publication number 20240266185
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS
- Publication number 20240266171
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR SUBSTRATE SUPPORT TEMPERATURE CONTROL
- Publication number 20240229240
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zubin Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR FORMING LAYERS HAVING SINGLE CR...
- Publication number 20240035195
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Qinghua ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CARBON GAPFILL
- Publication number 20230360924
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Supriya Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF)...
- Publication number 20230340661
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRICAL IMPROVEMENTS FOR 3D NAND
- Publication number 20230309300
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Dimitrios Pavlopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION FOR REDUCED HYDROGEN INCORPORATION IN AMORPHOUS SI...
- Publication number 20230298892
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCALED LINER LAYER FOR ISOLATION STRUCTURE
- Publication number 20230178419
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Benjamin COLOMBEAU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS
- Publication number 20230146981
- Publication date May 11, 2023
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...
- Publication number 20230118964
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Anton V. Baryshnikov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE SPACER PATTERNING SCHEMES
- Publication number 20230093450
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Tzu-shun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM REMOVAL IN HIGH ASPECT RATIO GAP-FILL
- Publication number 20230050255
- Publication date Feb 16, 2023
- Applied Materials, Inc.
- Qinghua Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM-FREE GAPFILL DEPOSITION
- Publication number 20230051200
- Publication date Feb 16, 2023
- Applied Materials, Inc.
- Qinghua Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PROFILING AND TEXTURING OF CHAMBER COMPONENTS
- Publication number 20230023764
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- David W. GROECHEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES FOR DEPOSITING SIB FILMS
- Publication number 20220406594
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Aykut AYDIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-DOPED BORON FILMS
- Publication number 20220341034
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Aykut Aydin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SI GAP FILL BY PECVD
- Publication number 20220310448
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Xin LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...
- Publication number 20220285232
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Anton V. Baryshnikov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conformal High Concentration Boron Doping Of Semiconductors
- Publication number 20220246432
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAPFILL PROCESS USING PULSED HIGH-FREQUENCY RADIO-FREQUENCY (HFRF)...
- Publication number 20220238331
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Aykut Aydin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO ELIMINATE OF DEPOSITION ON WAFER BEVEL AND BACKSIDE
- Publication number 20220199373
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ENHANCED DEPOSITION OF SILICON-CONTAINING FILMS AT LOW TEMPE...
- Publication number 20220199404
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Aykut Aydin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS
- Publication number 20220108892
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Methods to eliminate of deposition on wafer bevel and backside

Boron concentration tunability in boron-silicon films

Method for forming and patterning a layer and/or substrate

Seam removal in high aspect ratio gap-fill

Metal-doped boron films

Systems and methods for substrate support temperature control

Processes for depositing sib films

Systems and methods for substrate support temperature control

Boron concentration tunability in boron-silicon films

Apparatus and methods for improving thermal chemical vapor depositi...

Method for Si gap fill by PECVD

Heated pedestal design for improved heat transfer and temperature u...

Selective deposition of silicon using deposition-treat-etch process

Conformal high concentration boron doping of semiconductors

Doping semiconductor films

Plasma enhanced deposition of silicon-containing films at low tempe...

PECVD tungsten containing hardmask films and methods of making

Hydrogen management in plasma deposited films

Controlling concentration profiles for deposited films using machin...

Multiple spacer patterning schemes

3D NAND etch

Methods for gapfill in high aspect ratio structures

Conformal halogen doping in 3D structures using conformal dopant fi...

Methods for modifying photoresist profiles and tuning critical dime...

Film formation via pulsed RF plasma

Method for Si gap fill by PECVD

Methods for conformal doping of three dimensional structures

Conformal high concentration boron doping of semiconductors

Multiple spacer patterning schemes

Conformal doped amorphous silicon as nucleation layer for metal dep...

Patents Applicationslast 30 patents

BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS

SEAM REMOVAL IN HIGH ASPECT RATIO GAP-FILL

FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...

PROCESSES FOR DEPOSITING SIB FILMS

RF PULSING ASSISTED TUNGSTEN-CONTAINING FILM DEPOSITION

PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT

SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-...

BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS

SYSTEMS AND METHODS FOR SUBSTRATE SUPPORT TEMPERATURE CONTROL

METHODS, SYSTEMS, AND APPARATUS FOR FORMING LAYERS HAVING SINGLE CR...

LOW TEMPERATURE CARBON GAPFILL

Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF)...

ELECTRICAL IMPROVEMENTS FOR 3D NAND

ION IMPLANTATION FOR REDUCED HYDROGEN INCORPORATION IN AMORPHOUS SI...

SCALED LINER LAYER FOR ISOLATION STRUCTURE

HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS

CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...

MULTIPLE SPACER PATTERNING SCHEMES

SEAM REMOVAL IN HIGH ASPECT RATIO GAP-FILL

SEAM-FREE GAPFILL DEPOSITION

SURFACE PROFILING AND TEXTURING OF CHAMBER COMPONENTS

PROCESSES FOR DEPOSITING SIB FILMS

METAL-DOPED BORON FILMS

METHOD FOR SI GAP FILL BY PECVD

CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...

Conformal High Concentration Boron Doping Of Semiconductors

GAPFILL PROCESS USING PULSED HIGH-FREQUENCY RADIO-FREQUENCY (HFRF)...

METHODS TO ELIMINATE OF DEPOSITION ON WAFER BEVEL AND BACKSIDE

PLASMA ENHANCED DEPOSITION OF SILICON-CONTAINING FILMS AT LOW TEMPE...

BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS