Rui-fang Shi

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Rotating target for extreme ultraviolet source with liquid metal
- Patent number 12,133,318
- Issue date Oct 29, 2024
- KLA Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Inspection of reticles using machine learning
- Patent number 12,094,101
- Issue date Sep 17, 2024
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Correcting aberration and apodization of an optical system using co...
- Patent number 12,092,814
- Issue date Sep 17, 2024
- KLA Corporation
- Haifeng Huang
- G02 - OPTICS
Information Patent Grant
EUV in-situ linearity calibration for TDI image sensors using test...
- Patent number 11,733,605
- Issue date Aug 22, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Fast phase-shift interferometry by laser frequency shift
- Patent number 11,469,571
- Issue date Oct 11, 2022
- KLA Corporation
- Haifeng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband light interferometry for focal-map generation in photomas...
- Patent number 11,442,021
- Issue date Sep 13, 2022
- KLA Corporation
- Rui-Fang Shi
- G01 - MEASURING TESTING
Information Patent Grant
Common path mode fiber tip diffraction interferometer for wavefront...
- Patent number 11,333,487
- Issue date May 17, 2022
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Inspection of reticles using machine learning
- Patent number 11,257,207
- Issue date Feb 22, 2022
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection system with non-circular pupil
- Patent number 11,112,691
- Issue date Sep 7, 2021
- KLA Corporation
- Damon F. Kvamme
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase contrast monitoring for extreme ultra-violet (EUV) masks defe...
- Patent number 10,634,623
- Issue date Apr 28, 2020
- KLA-Tencor Corporation
- Qiang Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block-to-block reticle inspection
- Patent number 10,539,512
- Issue date Jan 21, 2020
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Time-varying intensity map generation for reticles
- Patent number 10,401,305
- Issue date Sep 3, 2019
- KLA-Tencor Corporation
- Carl E. Hess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for predicting wafer-level defect printability
- Patent number 10,304,180
- Issue date May 28, 2019
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Critical dimension uniformity monitoring for extreme ultra-violet r...
- Patent number 10,288,415
- Issue date May 14, 2019
- KLA-Tencor Corporation
- Rui-fang Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for polarizing reticle inspection
- Patent number 10,168,273
- Issue date Jan 1, 2019
- KLA-Tencor Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Polygon-based geometry classification for semiconductor mask inspec...
- Patent number 10,140,698
- Issue date Nov 27, 2018
- KLA-Tencor Corporation
- Yin Xu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Critical dimension uniformity monitoring for extreme ultraviolet re...
- Patent number 9,863,761
- Issue date Jan 9, 2018
- KLA-Tencor Corporation
- Rui-fang Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated multi-pass inspection
- Patent number 9,778,207
- Issue date Oct 3, 2017
- KLA-Tencor Corp.
- Weston L. Sousa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block-to-block reticle inspection
- Patent number 9,766,185
- Issue date Sep 19, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for database-assisted requalification reticle...
- Patent number 9,733,640
- Issue date Aug 15, 2017
- KLA-Tencor Corporation
- Lih-Huah Yiin
- G05 - CONTROLLING REGULATING
Information Patent Grant
Qualifying patterns for microlithography
- Patent number 9,612,541
- Issue date Apr 4, 2017
- KLA-Tencor Corporation
- Rui-fang Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mesoscopic defect detection for reticle inspection
- Patent number 9,607,371
- Issue date Mar 28, 2017
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and methods for predicting wafer-level defect printability
- Patent number 9,547,892
- Issue date Jan 17, 2017
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reticle inspection using near-field recovery
- Patent number 9,478,019
- Issue date Oct 25, 2016
- KLA-Tencor Corp.
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Using reflected and transmission maps to detect reticle degradation
- Patent number 9,417,191
- Issue date Aug 16, 2016
- KLA-Tencor Corporation
- Carl E. Hess
- G01 - MEASURING TESTING
Information Patent Grant
Detection of thin lines for selective sensitivity during reticle in...
- Patent number 9,092,847
- Issue date Jul 28, 2015
- KLA-Tencor Corporation
- Zhengyu Wang
- G01 - MEASURING TESTING
Information Patent Grant
Detection of thin lines for selective sensitivity during reticle in...
- Patent number 8,855,400
- Issue date Oct 7, 2014
- KLA-Tencor Corporation
- Zhengyu Wang
- G01 - MEASURING TESTING
Information Patent Grant
Photomask inspection and verification by lithography image reconstr...
- Patent number 7,995,832
- Issue date Aug 9, 2011
- KLA-Tencor Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
Computer-implemented methods, systems, and computer-readable media...
- Patent number 7,962,863
- Issue date Jun 14, 2011
- KLA-Tencor Corp.
- Bo Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device pattern generation
- Patent number 7,546,573
- Issue date Jun 9, 2009
- KLA-Tencor Corporation
- Guarav Verma
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF IMAGING PATH POLARIZATION CONTROL FOR DEFECT DETECTION S...
- Publication number 20240353318
- Publication date Oct 24, 2024
- KLA Corporation
- Yun Xie
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR CLEANING OPTICAL ELEMENTS IN EUV OPTICAL SYSTEMS
- Publication number 20230418167
- Publication date Dec 28, 2023
- Yun Xie
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ROTATING TARGET FOR EXTREME ULTRAVIOLET SOURCE WITH LIQUID METAL
- Publication number 20230403778
- Publication date Dec 14, 2023
- KLA Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20230341760
- Publication date Oct 26, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
CORRECTING ABERRATION AND APODIZATION OF AN OPTICAL SYSTEM USING CO...
- Publication number 20220244530
- Publication date Aug 4, 2022
- Haifeng Huang
- G02 - OPTICS
Information Patent Application
Integration of an Optical Height Sensor in Mask Inspection Tools
- Publication number 20220196572
- Publication date Jun 23, 2022
- KLA Corporation
- Zefram Marks
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION OF RETICLES USING MACHINE LEARNING
- Publication number 20220084179
- Publication date Mar 17, 2022
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FAST PHASE-SHIFT INTERFEROMETRY BY LASER FREQUENCY SHIFT
- Publication number 20210159667
- Publication date May 27, 2021
- KLA Corporation
- Haifeng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMMON PATH MODE FIBER TIP DIFFRACTION INTERFEROMETER FOR WAVEFRONT...
- Publication number 20210123716
- Publication date Apr 29, 2021
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
Broadband Light Interferometry for Focal-Map Generation in Photomas...
- Publication number 20210109030
- Publication date Apr 15, 2021
- KLA Corporation
- Rui-Fang Shi
- G01 - MEASURING TESTING
Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20200401037
- Publication date Dec 24, 2020
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspect...
- Publication number 20200379336
- Publication date Dec 3, 2020
- KLA Corporation
- Dmitriy Zusin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection System with Non-Circular Pupil
- Publication number 20200225574
- Publication date Jul 16, 2020
- KLA-Tencor Corporation
- Damon F. Kvamme
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION OF RETICLES USING MACHINE LEARNING
- Publication number 20190206041
- Publication date Jul 4, 2019
- KLA-Tencor Corporation
- Hawren Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR POLARIZING RETICLE INSPECTION
- Publication number 20190003960
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
PHASE CONTRAST MONITORING FOR EXTREME ULTRA-VIOLET (EUV) MASKS DEFE...
- Publication number 20180100814
- Publication date Apr 12, 2018
- KLA-Tencor Corporation
- Qiang Zhang
- G01 - MEASURING TESTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRA-VIOLET R...
- Publication number 20180080759
- Publication date Mar 22, 2018
- KLA-Tencor Corporation
- Rui-fang Shi
- G01 - MEASURING TESTING
Information Patent Application
Block-to-Block Reticle Inspection
- Publication number 20180003647
- Publication date Jan 4, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY
- Publication number 20170309008
- Publication date Oct 26, 2017
- KLA-Tencor Corporation
- Rui-fang Shi
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED MULTI-PASS INSPECTION
- Publication number 20170256043
- Publication date Sep 7, 2017
- KLA-Tencor Corporation
- Weston L. Sousa
- G01 - MEASURING TESTING
Information Patent Application
POLYGON-BASED GEOMETRY CLASSIFICATION FOR SEMICONDUCTOR MASK INSPEC...
- Publication number 20170046471
- Publication date Feb 16, 2017
- KLA-Tencor Corporation
- Yin Xu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Integrated Multi-Pass Inspection
- Publication number 20160093040
- Publication date Mar 31, 2016
- KLA-Tencor Corporation
- Weston L. Sousa
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY
- Publication number 20160012579
- Publication date Jan 14, 2016
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Reticle Inspection Using Near-Field Recovery
- Publication number 20150324963
- Publication date Nov 12, 2015
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
MESOSCOPIC DEFECT DETECTION FOR RETICLE INSPECTION
- Publication number 20150279014
- Publication date Oct 1, 2015
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRAVIOLET RE...
- Publication number 20150144798
- Publication date May 28, 2015
- KLA-Tencor Corporation
- Rui-fang Shi
- G01 - MEASURING TESTING
Information Patent Application
USING REFLECTED AND TRANSMISSION MAPS TO DETECT RETICLE DEGRADATION
- Publication number 20150103351
- Publication date Apr 16, 2015
- KLA-Tencor Corporation
- Carl E. Hess
- G01 - MEASURING TESTING
Information Patent Application
Block-to-Block Reticle Inspection
- Publication number 20150078650
- Publication date Mar 19, 2015
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
QUALIFYING PATTERNS FOR MICROLITHOGRAPHY
- Publication number 20150054940
- Publication date Feb 26, 2015
- KLA-Tencor Corporation
- Rui-fang Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR DATABASE-ASSISTED REQUALIFICATION RETICLE...
- Publication number 20150005917
- Publication date Jan 1, 2015
- KLA-Tencor Corporation
- Lih-Huah Yiin
- G06 - COMPUTING CALCULATING COUNTING

Rui-fang Shi

Person

Patents Grantslast 30 patents

Rotating target for extreme ultraviolet source with liquid metal

Inspection of reticles using machine learning

Correcting aberration and apodization of an optical system using co...

EUV in-situ linearity calibration for TDI image sensors using test...

Fast phase-shift interferometry by laser frequency shift

Broadband light interferometry for focal-map generation in photomas...

Common path mode fiber tip diffraction interferometer for wavefront...

Inspection of reticles using machine learning

Inspection system with non-circular pupil

Phase contrast monitoring for extreme ultra-violet (EUV) masks defe...

Block-to-block reticle inspection

Time-varying intensity map generation for reticles

Apparatus and methods for predicting wafer-level defect printability

Critical dimension uniformity monitoring for extreme ultra-violet r...

Methods and apparatus for polarizing reticle inspection

Polygon-based geometry classification for semiconductor mask inspec...

Critical dimension uniformity monitoring for extreme ultraviolet re...

Integrated multi-pass inspection

Block-to-block reticle inspection

Method and apparatus for database-assisted requalification reticle...

Qualifying patterns for microlithography

Mesoscopic defect detection for reticle inspection

Apparatus and methods for predicting wafer-level defect printability

Reticle inspection using near-field recovery

Using reflected and transmission maps to detect reticle degradation

Detection of thin lines for selective sensitivity during reticle in...

Detection of thin lines for selective sensitivity during reticle in...

Photomask inspection and verification by lithography image reconstr...

Computer-implemented methods, systems, and computer-readable media...

Semiconductor device pattern generation

Patents Applicationslast 30 patents

METHODS OF IMAGING PATH POLARIZATION CONTROL FOR DEFECT DETECTION S...

METHOD AND SYSTEM FOR CLEANING OPTICAL ELEMENTS IN EUV OPTICAL SYSTEMS

ROTATING TARGET FOR EXTREME ULTRAVIOLET SOURCE WITH LIQUID METAL

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

CORRECTING ABERRATION AND APODIZATION OF AN OPTICAL SYSTEM USING CO...

Integration of an Optical Height Sensor in Mask Inspection Tools

INSPECTION OF RETICLES USING MACHINE LEARNING

FAST PHASE-SHIFT INTERFEROMETRY BY LASER FREQUENCY SHIFT

COMMON PATH MODE FIBER TIP DIFFRACTION INTERFEROMETER FOR WAVEFRONT...

Broadband Light Interferometry for Focal-Map Generation in Photomas...

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspect...

Inspection System with Non-Circular Pupil

INSPECTION OF RETICLES USING MACHINE LEARNING

METHODS AND APPARATUS FOR POLARIZING RETICLE INSPECTION

PHASE CONTRAST MONITORING FOR EXTREME ULTRA-VIOLET (EUV) MASKS DEFE...

CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRA-VIOLET R...

Block-to-Block Reticle Inspection

APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY

INTEGRATED MULTI-PASS INSPECTION

POLYGON-BASED GEOMETRY CLASSIFICATION FOR SEMICONDUCTOR MASK INSPEC...

Integrated Multi-Pass Inspection

APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY

Reticle Inspection Using Near-Field Recovery

MESOSCOPIC DEFECT DETECTION FOR RETICLE INSPECTION

CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRAVIOLET RE...

USING REFLECTED AND TRANSMISSION MAPS TO DETECT RETICLE DEGRADATION

Block-to-Block Reticle Inspection

QUALIFYING PATTERNS FOR MICROLITHOGRAPHY

METHOD AND APPARATUS FOR DATABASE-ASSISTED REQUALIFICATION RETICLE...