Rui KANEMURA

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exhaust device, processing system, and processing method
- Patent number 11,807,938
- Issue date Nov 7, 2023
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,658,028
- Issue date May 23, 2023
- Tokyo Electron Limited
- Rui Kanemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and substrate processing apparatus
- Patent number 11,251,034
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Hiroyuki Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming semiconductor film and film forming device
- Patent number 11,114,297
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Rui Kanemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,101,131
- Issue date Aug 24, 2021
- Tokyo Electron Limited
- Rui Kanemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240234162
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240136198
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200312677
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Forming Method and Film Forming Apparatus
- Publication number 20200308696
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE, PROCESSING SYSTEM, AND PROCESSING METHOD
- Publication number 20200248305
- Publication date Aug 6, 2020
- TOKYO ELECTRON LIMITED
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Forming Semiconductor Film and Film Forming Device
- Publication number 20200168455
- Publication date May 28, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200058504
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200058499
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190259599
- Publication date Aug 22, 2019
- TOKYO ELECTRON LIMITED
- Hiroyuki HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS

Rui KANEMURA

Person

Patents Grantslast 30 patents

Exhaust device, processing system, and processing method

Film forming method and film forming apparatus

Film forming method and substrate processing apparatus

Method for forming semiconductor film and film forming device

Film forming method and film forming apparatus

Patents Applicationslast 30 patents

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

Film Forming Method and Film Forming Apparatus

EXHAUST DEVICE, PROCESSING SYSTEM, AND PROCESSING METHOD

Method for Forming Semiconductor Film and Film Forming Device

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS