Rui Ma

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Naperville, IL, US

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Patents Grantslast 30 patents

Information Patent Grant
Polishing pad employing polyamine and cyclohexanedimethanol curatives
- Patent number 11,845,156
- Issue date Dec 19, 2023
- CMC Materials, Inc.
- Rui Ma
- B24 - GRINDING POLISHING
Information Patent Grant
Polyurethane CMP pads having a high modulus ratio
- Patent number 10,562,149
- Issue date Feb 18, 2020
- Cabot Microelectronics Corporation
- Lin Fu
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
TEXTURED CMP PAD COMPRISING POLYMER PARTICLES
- Publication number 20230076804
- Publication date Mar 9, 2023
- CMC Materials, Inc.
- Rui MA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD EMPLOYING POLYAMINE AND CYCLOHEXANEDIMETHANOL CURATIVES
- Publication number 20210008687
- Publication date Jan 14, 2021
- Cabot Microelectronics Corporation
- Rui MA
- B24 - GRINDING POLISHING