Rumen Iliew

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Oberkochen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Mirror arrangement for an EUV projection exposure apparatus, method...
- Patent number 9,709,770
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element
- Patent number 9,470,872
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G01 - MEASURING TESTING
Information Patent Grant
Microlithographic apparatus
- Patent number 9,348,234
- Issue date May 24, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC APPARATUS
- Publication number 20160011521
- Publication date Jan 14, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...
- Publication number 20150168674
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Reflective Optical Element
- Publication number 20150116703
- Publication date Apr 30, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20140347721
- Publication date Nov 27, 2014
- Boris Bittner
- B82 - NANO-TECHNOLOGY