Rumiko Horiguchi

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polysilanes, polysiloxanes and silicone resist materials containing...
- Patent number 5,198,520
- Issue date Mar 30, 1993
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition
- Patent number 5,063,134
- Issue date Nov 5, 1991
- Kabushiki Kaisha Toshiba
- Rumiko Horiguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
A silicone resist materials containing a polysiloxane and a photo-s...
- Patent number 5,017,453
- Issue date May 21, 1991
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition with o-quinone diazide and novolac...
- Patent number 4,988,601
- Issue date Jan 29, 1991
- Kabushiki Kaisha Toshiba
- Toru Ushirogouchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysilane compound and photosensitive composition
- Patent number 4,871,646
- Issue date Oct 3, 1989
- Kabushiki Kaisha Toshiba
- Shizu Hayase
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition and method of forming a resist pattern w...
- Patent number 4,828,958
- Issue date May 9, 1989
- Kabushiki Kaisha Toshiba
- Shuzi Hayase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysilanes, Polysiloxanes and silicone resist materials containing...
- Patent number 4,822,716
- Issue date Apr 18, 1989
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Rumiko Horiguchi

Person

Patents Grantslast 30 patents

Polysilanes, polysiloxanes and silicone resist materials containing...

Photosensitive composition

A silicone resist materials containing a polysiloxane and a photo-s...

Photosensitive resin composition with o-quinone diazide and novolac...

Polysilane compound and photosensitive composition

Photosensitive composition and method of forming a resist pattern w...

Polysilanes, Polysiloxanes and silicone resist materials containing...