Ryan C. Boas

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Methods for variable etch depths
- Patent number 11,456,205
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advances in spike anneal processes for ultra shallow junctions
- Patent number 6,897,131
- Issue date May 24, 2005
- Applied Materials, Inc.
- Balasubramanian Ramachandran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally processing a substrate
- Patent number 6,803,546
- Issue date Oct 12, 2004
- Applied Materials, Inc.
- Ryan C Boas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power distribution printed circuit board for a semiconductor proces...
- Patent number 6,350,964
- Issue date Feb 26, 2002
- Applied Materials, Inc.
- Ryan C. Boas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally processing a substrate
- Patent number 6,215,106
- Issue date Apr 10, 2001
- Applied Materials, Inc.
- Ryan C. Boas
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR VARIABLE ETCH DEPTHS
- Publication number 20210351069
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advances in spike anneal processes for ultra shallow junctions
- Publication number 20040126999
- Publication date Jul 1, 2004
- APPLIED MATERIALS, INC.
- Balasubramanian Ramachandran
- H01 - BASIC ELECTRIC ELEMENTS