Ryan Pakulski

Person

Discovery Bay, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for generating etchants for remote plasma processes
- Patent number 12,002,659
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End effectors for moving workpieces and replaceable parts within a...
- Patent number 11,515,127
- Issue date Nov 29, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring adjustment assembly of a system for processing workpiece...
- Patent number 11,508,560
- Issue date Nov 22, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Plasma processing apparatus having a focus ring adjustment assembly
- Patent number 11,348,767
- Issue date May 31, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Plasma strip tool with uniformity control
- Patent number 11,201,036
- Issue date Dec 14, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with post plasma gas injection
- Patent number 10,790,119
- Issue date Sep 29, 2020
- Mattson Technology, Inc.
- Shawming Ma
- B08 - CLEANING
Information Patent Grant
Systems and methods for workpiece processing
- Patent number 10,580,672
- Issue date Mar 3, 2020
- Mattson Technology, Inc.
- Michael Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced multi-workpiece processing chamber
- Patent number 9,184,072
- Issue date Nov 10, 2015
- Mattson Technology, Inc.
- Daniel J. Devine
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Low cost high throughput processing platform
- Patent number 8,668,422
- Issue date Mar 11, 2014
- Mattson Technology, Inc.
- Leszek Niewmierzycki
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Advanced low cost high throughput processing platform
- Patent number 7,658,586
- Issue date Feb 9, 2010
- Mattson Technology, Inc.
- Leszek Niewmierzycki
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Low cost high throughput processing platform
- Patent number 7,563,068
- Issue date Jul 21, 2009
- Mattson Technology, Inc.
- Leszek Niewmierzycki
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
- Publication number 20240304423
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES
- Publication number 20230402262
- Publication date Dec 14, 2023
- Tae Seung CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ISOLATING THE CHAMBER VOLUME TO PROCESS VOLUME WITH INTER...
- Publication number 20230095095
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Saravanakumar Natarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transfer Position for Workpieces and Replaceable Parts in a Vacuum...
- Publication number 20230091035
- Publication date Mar 23, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER ADAPTER
- Publication number 20230005765
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Son T. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Strip Tool with Multiple Gas Injection
- Publication number 20210398775
- Publication date Dec 23, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...
- Publication number 20210343506
- Publication date Nov 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus and Methods
- Publication number 20210257196
- Publication date Aug 19, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus With Post Plasma Gas Injection
- Publication number 20210005431
- Publication date Jan 7, 2021
- Mattson Technology, Inc.
- Shawming Ma
- B08 - CLEANING
Information Patent Application
END EFFECTORS FOR MOVING WORKPIECES AND REPLACEABLE PARTS WITHIN A...
- Publication number 20200361094
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS HAVING A FOCUS RING ADJUSTMENT ASSEMBLY
- Publication number 20200365377
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ADJUSTMENT ASSEMBLY OF A SYSTEM FOR PROCESSING WORKPIECE...
- Publication number 20200365405
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Transportation Of Replaceable Parts In a Va...
- Publication number 20200365381
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Supply With Angled Injectors In Plasma Processing Apparatus
- Publication number 20200258718
- Publication date Aug 13, 2020
- Mattson Technology, Inc.
- Tinghao F. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post Plasma Gas Injection In A Separation Grid
- Publication number 20200243305
- Publication date Jul 30, 2020
- Mattson Technology, Inc.
- Weimin Zeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Workpiece Processing
- Publication number 20200176288
- Publication date Jun 4, 2020
- Mattson Technology, Inc.
- Michael Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR WORKPIECE PROCESSING
- Publication number 20200161162
- Publication date May 21, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Methods
- Publication number 20190198301
- Publication date Jun 27, 2019
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Wafer Bevel Strip Apparatus
- Publication number 20190131112
- Publication date May 2, 2019
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Strip Tool With Multiple Gas Injection Zones
- Publication number 20180358204
- Publication date Dec 13, 2018
- Mattson Technology, Inc.
- Shawming Ma
- B08 - CLEANING
Information Patent Application
Plasma Processing Apparatus
- Publication number 20180358206
- Publication date Dec 13, 2018
- Mattson Technology, Inc.
- Shawming Ma
- B08 - CLEANING
Information Patent Application
Plasma Processing Apparatus With Post Plasma Gas Injection
- Publication number 20180358208
- Publication date Dec 13, 2018
- Mattson Technology, Inc.
- Shawming Ma
- B08 - CLEANING
Information Patent Application
Plasma Strip Tool With Uniformity Control
- Publication number 20180358210
- Publication date Dec 13, 2018
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Workpiece Processing
- Publication number 20180108548
- Publication date Apr 19, 2018
- Mattson Technology, Inc.
- Michael Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Separation Grid for Plasma Chamber
- Publication number 20180053628
- Publication date Feb 22, 2018
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Pattern Separation Grid for Plasma Chamber
- Publication number 20170207077
- Publication date Jul 20, 2017
- Mattson Technology, Inc.
- Vladimir Nagorny
- B08 - CLEANING
Information Patent Application
ADVANCED MULTI-WORKPIECE PROCESSING CHAMBER
- Publication number 20090028761
- Publication date Jan 29, 2009
- Daniel J. Devine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Cost High Throughput Processing Platform
- Publication number 20070175864
- Publication date Aug 2, 2007
- Leszek Niewmierzycki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low cost high throughput processing platform
- Publication number 20060045664
- Publication date Mar 2, 2006
- Leszek Niewmierzycki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced low cost high throughput processing platform
- Publication number 20060039781
- Publication date Feb 23, 2006
- Leszek Niewmierzycki
- H01 - BASIC ELECTRIC ELEMENTS

Ryan Pakulski

Person

Patents Grantslast 30 patents

Apparatus for generating etchants for remote plasma processes

End effectors for moving workpieces and replaceable parts within a...

Focus ring adjustment assembly of a system for processing workpiece...

Plasma processing apparatus having a focus ring adjustment assembly

Plasma strip tool with uniformity control

Plasma processing apparatus with post plasma gas injection

Systems and methods for workpiece processing

Advanced multi-workpiece processing chamber

Low cost high throughput processing platform

Advanced low cost high throughput processing platform

Low cost high throughput processing platform

Patents Applicationslast 30 patents

SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES

APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES

METHOD OF ISOLATING THE CHAMBER VOLUME TO PROCESS VOLUME WITH INTER...

Transfer Position for Workpieces and Replaceable Parts in a Vacuum...

SEMICONDUCTOR PROCESSING CHAMBER ADAPTER

Plasma Strip Tool with Multiple Gas Injection

Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...

Plasma Processing Apparatus and Methods

Plasma Processing Apparatus With Post Plasma Gas Injection

END EFFECTORS FOR MOVING WORKPIECES AND REPLACEABLE PARTS WITHIN A...

PLASMA PROCESSING APPARATUS HAVING A FOCUS RING ADJUSTMENT ASSEMBLY

FOCUS RING ADJUSTMENT ASSEMBLY OF A SYSTEM FOR PROCESSING WORKPIECE...

Systems And Methods For Transportation Of Replaceable Parts In a Va...

Gas Supply With Angled Injectors In Plasma Processing Apparatus

Post Plasma Gas Injection In A Separation Grid

Systems and Methods for Workpiece Processing

SYSTEMS AND METHODS FOR WORKPIECE PROCESSING

Plasma Processing Apparatus and Methods

Inductively Coupled Plasma Wafer Bevel Strip Apparatus

Plasma Strip Tool With Multiple Gas Injection Zones

Plasma Processing Apparatus

Plasma Processing Apparatus With Post Plasma Gas Injection

Plasma Strip Tool With Uniformity Control

Systems and Methods for Workpiece Processing

Separation Grid for Plasma Chamber

Variable Pattern Separation Grid for Plasma Chamber

ADVANCED MULTI-WORKPIECE PROCESSING CHAMBER

Low Cost High Throughput Processing Platform

Low cost high throughput processing platform

Advanced low cost high throughput processing platform