Ryan Pearman

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,886,166
- Issue date Jan 30, 2024
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,604,451
- Issue date Mar 14, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,592,802
- Issue date Feb 28, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 10,884,395
- Issue date Jan 5, 2021
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped beam lithography including temperature effects
- Patent number 10,460,071
- Issue date Oct 29, 2019
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for improving critical dimension uniformity using...
- Patent number 9,104,109
- Issue date Aug 11, 2015
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography mask having sub-resolution phased assist features
- Patent number 9,046,761
- Issue date Jun 2, 2015
- Intel Corporation
- Shem O. Ogadhoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for critical dimension uniformity using charged p...
- Patent number 9,038,003
- Issue date May 19, 2015
- D2S, Inc.
- Ryan Pearman
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20230205177
- Publication date Jun 29, 2023
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210208569
- Publication date Jul 8, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210116884
- Publication date Apr 22, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20200201286
- Publication date Jun 25, 2020
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING SHAPED BEAM LITHOGRAPH...
- Publication number 20170124247
- Publication date May 4, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR IMPROVING CRITICAL DIMENSION UNIFORMITY USING...
- Publication number 20140127628
- Publication date May 8, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR CRITICAL DIMENSION UNIFORMITY USING CHARGED P...
- Publication number 20130283216
- Publication date Oct 24, 2013
- D2S, INC.
- Ryan Pearman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY MASK HAVING SUB-RESOLUTION PHASED ASSIST FEATURES
- Publication number 20130216941
- Publication date Aug 22, 2013
- Shem O. Ogadhoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryan Pearman

Person

Patents Grantslast 30 patents

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Shaped beam lithography including temperature effects

Method and system for improving critical dimension uniformity using...

Lithography mask having sub-resolution phased assist features

Method and system for critical dimension uniformity using charged p...

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR FORMING PATTERNS USING SHAPED BEAM LITHOGRAPH...

METHOD AND SYSTEM FOR IMPROVING CRITICAL DIMENSION UNIFORMITY USING...

METHOD AND SYSTEM FOR CRITICAL DIMENSION UNIFORMITY USING CHARGED P...

LITHOGRAPHY MASK HAVING SUB-RESOLUTION PHASED ASSIST FEATURES