Ryo Edo

Person

Tochigi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure apparatus having a processing chamber, a vacuum chamber an...
- Patent number 7,670,754
- Issue date Mar 2, 2010
- Canon Kabushiki Kaisha
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing unit, exposure apparatus having the processing unit, and...
- Patent number 7,656,507
- Issue date Feb 2, 2010
- Canon Kabushiki Kaisha
- Ryo Edo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for removing contaminant on original, method o...
- Patent number 7,319,507
- Issue date Jan 15, 2008
- Canon Kabushiki Kaisha
- Masami Yonekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Load-lock system, exposure processing system, and device manufactur...
- Patent number 7,276,097
- Issue date Oct 2, 2007
- Canon Kabushiki Kaisha
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Load lock chamber, processing system
- Patent number 7,236,229
- Issue date Jun 26, 2007
- Canon Kabushiki Kaisha
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of controlling substrate, an...
- Patent number 7,024,266
- Issue date Apr 4, 2006
- Canon Kabushiki Kaisha
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system with load-lock chamber
- Patent number 6,805,748
- Issue date Oct 19, 2004
- Canon Kabushiki Kaisha
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, method of producing a device using the mask and aligner with...
- Patent number 5,800,949
- Issue date Sep 1, 1998
- Canon Kabushiki Kaisha
- Ryo Edo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positioning method and positioning mechanism for use in exposure ap...
- Patent number 5,225,686
- Issue date Jul 6, 1993
- Canon Kabushiki Kaisha
- Ryo Edo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Processing unit, exposure apparatus having the processing unit, and...
- Publication number 20060197935
- Publication date Sep 7, 2006
- Canon Kabushiki Kaisha
- Ryo Edo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus, method of controlling substrate, an...
- Publication number 20060142890
- Publication date Jun 29, 2006
- Canon Kabushiki Kaisha
- Ryo Edo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for removing contaminant on original, method o...
- Publication number 20060082743
- Publication date Apr 20, 2006
- Canon Kabushiki Kaisha
- Masami Yonekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Processing system and exposure apparatus using the same
- Publication number 20050121144
- Publication date Jun 9, 2005
- Canon Kabushiki Kaisha
- Ryo Edo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Load-lock system, exposure processing system, and device manufactur...
- Publication number 20040187452
- Publication date Sep 30, 2004
- Ryo Edo
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Load lock chamber, processing system
- Publication number 20040175906
- Publication date Sep 9, 2004
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus, method of controlling substrate, an...
- Publication number 20030021671
- Publication date Jan 30, 2003
- Canon Kabushiki Kaisha
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus, substrate processing method, and ex...
- Publication number 20030015290
- Publication date Jan 23, 2003
- Canon Kabushiki Kaisha
- Ryo Edo
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Exposure apparatus having a processing chamber, a vacuum chamber an...

Processing unit, exposure apparatus having the processing unit, and...

Apparatus and method for removing contaminant on original, method o...

Load-lock system, exposure processing system, and device manufactur...

Load lock chamber, processing system

Substrate processing apparatus, method of controlling substrate, an...

Substrate processing system with load-lock chamber

Mask, method of producing a device using the mask and aligner with...

Positioning method and positioning mechanism for use in exposure ap...

Patents Applicationslast 30 patents

Processing unit, exposure apparatus having the processing unit, and...

Substrate processing apparatus, method of controlling substrate, an...

Apparatus and method for removing contaminant on original, method o...

Processing system and exposure apparatus using the same

Load-lock system, exposure processing system, and device manufactur...

Load lock chamber, processing system

Substrate processing apparatus, method of controlling substrate, an...

Substrate processing apparatus, substrate processing method, and ex...