TREA

Ryo ISHIMARU

Follow

Person

  • Tokyo, JP
People

Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma etching method
    • Patent number 10,229,838
    • Issue date Mar 12, 2019
    • Hitach High-Technologies Corporation
    • Ryo Ishimaru
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20180122651
    • Publication date May 3, 2018
    • Hitachi High-Technologies Corporation
    • Ryo ISHIMARU
    • H01 - BASIC ELECTRIC ELEMENTS