Ryo Karasawa

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film-forming composition that contains triaryldia...
- Patent number 12,025,916
- Issue date Jul 2, 2024
- NISSAN CHEMICAL CORPORATION
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adhesive composition for peeling off by irradiation with light, lay...
- Patent number 11,926,765
- Issue date Mar 12, 2024
- NISSAN CHEMICAL CORPORATION
- Takahisa Okuno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cleaning agent composition and cleaning method
- Patent number 11,866,676
- Issue date Jan 9, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroshi Ogino
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Resist underlayer film-forming composition comprising carbonyl-cont...
- Patent number 11,592,747
- Issue date Feb 28, 2023
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,479,627
- Issue date Oct 25, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Laminated body including novolac resin as peeling layer
- Patent number 11,472,168
- Issue date Oct 18, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroshi Ogino
- B32 - LAYERED PRODUCTS
Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,459,414
- Issue date Oct 4, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing naphthol aral...
- Patent number 11,199,775
- Issue date Dec 14, 2021
- NISSAN CHEMICAL CORPORATION
- Ryo Karasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition for lithography containi...
- Patent number 11,194,251
- Issue date Dec 7, 2021
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming resist underlayer film
- Patent number 10,551,737
- Issue date Feb 4, 2020
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition for lithography containi...
- Patent number 10,295,907
- Issue date May 21, 2019
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming organic hard mask layer for use in lithogra...
- Patent number 9,514,949
- Issue date Dec 6, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition that contains novolac re...
- Patent number 9,469,777
- Issue date Oct 18, 2016
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition which contains alicyclic...
- Patent number 9,343,324
- Issue date May 17, 2016
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming a resist underlayer film including hydroxyl...
- Patent number 9,263,285
- Issue date Feb 16, 2016
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition containing copolymer res...
- Patent number 9,261,790
- Issue date Feb 16, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing phenylindole-...
- Patent number 8,993,215
- Issue date Mar 31, 2015
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CLEANING AGENT COMPOSITION AND CLEANING METHOD
- Publication number 20240218293
- Publication date Jul 4, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroshi OGINO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING AGENT COMPOSITION AND CLEANING METHOD
- Publication number 20220154104
- Publication date May 19, 2022
- NISSAN CHEMICAL CORPORATION
- Takahisa OKUNO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING AGENT COMPOSITION AND CLEANING METHOD
- Publication number 20220145218
- Publication date May 12, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroshi OGINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING AGENT COMPOSITION AND CLEANING METHOD
- Publication number 20220135913
- Publication date May 5, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroshi OGINO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING AGENT COMPOSITION AND CLEANING METHOD
- Publication number 20220135914
- Publication date May 5, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroshi OGINO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
ADHESIVE COMPOSITION FOR OPTICAL IRRADIATION PEELING, LAMINATE BODY...
- Publication number 20220073801
- Publication date Mar 10, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroshi OGINO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ADHESIVE COMPOSITION FOR PEELING OFF BY IRRADIATION WITH LIGHT, LAY...
- Publication number 20220010178
- Publication date Jan 13, 2022
- NISSAN CHEMICAL CORPORATION
- Takahisa OKUNO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CLEANING AGENT COMPOSITION AND CLEANING METHOD
- Publication number 20220010242
- Publication date Jan 13, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroshi OGINO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT
- Publication number 20210102088
- Publication date Apr 8, 2021
- Nissan Chemical Industries, Ltd.
- Makiko UMEZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION THAT CONTAINS TRIARYLDIA...
- Publication number 20200387072
- Publication date Dec 10, 2020
- NISSAN CHEMICAL CORPORATION
- Hirokazu NISHIMAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LAMINATED BODY INCLUDING NOVOLAC RESIN AS PEELING LAYER
- Publication number 20200353735
- Publication date Nov 12, 2020
- NISSAN CHEMICAL CORPORATION
- Hiroshi OGINO
- B32 - LAYERED PRODUCTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARAL...
- Publication number 20190302616
- Publication date Oct 3, 2019
- NISSAN CHEMICAL CORPORATION
- Ryo KARASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG CHAIN AL...
- Publication number 20180314154
- Publication date Nov 1, 2018
- Nissan Chemical Industries, Ltd.
- Daigo SAITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING EPOXY ADDUCT...
- Publication number 20180181001
- Publication date Jun 28, 2018
- Nissan Chemical Industries, Ltd.
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20180046078
- Publication date Feb 15, 2018
- Nissan Chemical Industries, Ltd.
- Ryo KARASAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20170045818
- Publication date Feb 16, 2017
- Nissan Chemical Industries, Ltd.
- Ryo KARASAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20170045819
- Publication date Feb 16, 2017
- Nissan Chemical Industries, Ltd.
- Ryo KARASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT
- Publication number 20160347965
- Publication date Dec 1, 2016
- Nissan Chemical Industries, Ltd.
- Makiko UMEZAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLA...
- Publication number 20160147151
- Publication date May 26, 2016
- Nissan Chemical Industries, Ltd.
- Tetsuya SHINJO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING CARBONYL-CONT...
- Publication number 20150316850
- Publication date Nov 5, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu SOMEYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION THAT CONTAINS NOVOLAC RE...
- Publication number 20150184018
- Publication date Jul 2, 2015
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING PHENYLINDOLE-...
- Publication number 20150044876
- Publication date Feb 12, 2015
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER RES...
- Publication number 20150011092
- Publication date Jan 8, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC...
- Publication number 20140235060
- Publication date Aug 21, 2014
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC HARD MASK LAYER FOR USE IN LITHOGRA...
- Publication number 20140106570
- Publication date Apr 17, 2014
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL...
- Publication number 20130280913
- Publication date Oct 24, 2013
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Ryo Karasawa

Person

Patents Grantslast 30 patents

Resist underlayer film-forming composition that contains triaryldia...

Adhesive composition for peeling off by irradiation with light, lay...

Cleaning agent composition and cleaning method

Resist underlayer film-forming composition comprising carbonyl-cont...

Film forming composition containing fluorine-containing surfactant

Laminated body including novolac resin as peeling layer

Film forming composition containing fluorine-containing surfactant

Resist underlayer film-forming composition containing naphthol aral...

Resist underlayer film-forming composition for lithography containi...

Method for forming resist underlayer film

Resist underlayer film-forming composition for lithography containi...

Composition for forming organic hard mask layer for use in lithogra...

Resist underlayer film forming composition that contains novolac re...

Resist underlayer film-forming composition which contains alicyclic...

Composition for forming a resist underlayer film including hydroxyl...

Resist underlayer film-forming composition containing copolymer res...

Resist underlayer film forming composition containing phenylindole-...

Patents Applicationslast 30 patents

CLEANING AGENT COMPOSITION AND CLEANING METHOD

CLEANING AGENT COMPOSITION AND CLEANING METHOD

CLEANING AGENT COMPOSITION AND CLEANING METHOD

CLEANING AGENT COMPOSITION AND CLEANING METHOD

CLEANING AGENT COMPOSITION AND CLEANING METHOD

ADHESIVE COMPOSITION FOR OPTICAL IRRADIATION PEELING, LAMINATE BODY...

ADHESIVE COMPOSITION FOR PEELING OFF BY IRRADIATION WITH LIGHT, LAY...

CLEANING AGENT COMPOSITION AND CLEANING METHOD

FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT

RESIST UNDERLAYER FILM-FORMING COMPOSITION THAT CONTAINS TRIARYLDIA...

LAMINATED BODY INCLUDING NOVOLAC RESIN AS PEELING LAYER

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARAL...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG CHAIN AL...

RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING EPOXY ADDUCT...

METHOD FOR FORMING RESIST UNDERLAYER FILM

RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLA...

RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING CARBONYL-CONT...

RESIST UNDERLAYER FILM FORMING COMPOSITION THAT CONTAINS NOVOLAC RE...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING PHENYLINDOLE-...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER RES...

RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC...

COMPOSITION FOR FORMING ORGANIC HARD MASK LAYER FOR USE IN LITHOGRA...

COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL...