Ryo Mitsui

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermosetting silicon-containing compound, composition for forming...
- Patent number 11,485,824
- Issue date Nov 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu Yano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sulfonium compound, resist composition, and patterning process
- Patent number 11,215,926
- Issue date Jan 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 10,754,248
- Issue date Aug 25, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing compound, urethane resin, stretchable film, and...
- Patent number 10,717,804
- Issue date Jul 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Silicon-containing compound, urethane resin, stretchable film, and...
- Patent number 10,696,779
- Issue date Jun 30, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, resist composition, and patterning process
- Patent number 10,025,180
- Issue date Jul 17, 2018
- Shin-Etsu Chemical Co., Ltd.
- Ryo Mitsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20230333472
- Publication date Oct 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATT...
- Publication number 20230305405
- Publication date Sep 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20200216670
- Publication date Jul 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu YANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20200159120
- Publication date May 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND
- Publication number 20200115400
- Publication date Apr 16, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryo MITSUI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS
- Publication number 20200090935
- Publication date Mar 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...
- Publication number 20190112413
- Publication date Apr 18, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...
- Publication number 20190106528
- Publication date Apr 11, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20190064665
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20180275516
- Publication date Sep 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takayuki FUJIWARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20180059543
- Publication date Mar 1, 2018
- Shin-Etsu Chemical Co., Ltd.
- Ryo Mitsui
- C07 - ORGANIC CHEMISTRY

Person

Patents Grantslast 30 patents

Thermosetting iodine- and silicon-containing material, composition...

Thermosetting silicon-containing compound, composition for forming...

Sulfonium compound, resist composition, and patterning process

Sulfonium salt, resist composition, and patterning process

Silicon-containing compound, urethane resin, stretchable film, and...

Silicon-containing compound, urethane resin, stretchable film, and...

Sulfonium compound, resist composition, and patterning process

Patents Applicationslast 30 patents

Composition For Forming Silicon-Containing Resist Underlayer Film A...

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATT...

THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND

PATTERNING PROCESS

SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...

SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...

SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS