Ryo Nonaka

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mounting table temperature control device and substrate processing...
- Patent number 10,418,258
- Issue date Sep 17, 2019
- Tokyo Electron Limited
- Ryo Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,330,891
- Issue date May 3, 2016
- Tokyo Electron Limited
- Ryo Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control system and temperature control method for subst...
- Patent number 8,950,469
- Issue date Feb 10, 2015
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate cleaning apparatus includ...
- Patent number 8,132,580
- Issue date Mar 13, 2012
- Tokyo Electron Limited
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrode unit, feeder member and radi...
- Patent number 7,230,202
- Issue date Jun 12, 2007
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 7,005,660
- Issue date Feb 28, 2006
- Tokyo Electron Limited
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma apparatus and lower electrode thereof
- Patent number 6,492,612
- Issue date Dec 10, 2002
- Tokyo Electron Limited
- Chihiro Taguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,074,518
- Issue date Jun 13, 2000
- Tokyo Electron Limited
- Kosuke Imafuku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process utilizing an electrostatic chuck
- Patent number 5,997,962
- Issue date Dec 7, 1999
- Tokyo Electron Limited
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,914,568
- Issue date Jun 22, 1999
- Tokyo Electron Limited
- Ryo Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process method using an electrostatic chuck
- Patent number 5,310,453
- Issue date May 10, 1994
- Tokyo Electron Yamanashi Limited
- Kazuo Fukasawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150114930
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Ryo NONAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOUNTING TABLE TEMPERATURE CONTROL DEVICE AND SUBSTRATE PROCESSING...
- Publication number 20140311728
- Publication date Oct 23, 2014
- TOKYO ELECTRON LIMITED
- Ryo Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SUBST...
- Publication number 20110083837
- Publication date Apr 14, 2011
- TOKYO ELECTRON LIMITED
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20090188428
- Publication date Jul 30, 2009
- TOKYO ELECTRON LIMITED
- Isamu SAKURAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANISM FOR VARYING CYLINDER STOP POSITION AND SUBSTRATE PROCESSI...
- Publication number 20090049981
- Publication date Feb 26, 2009
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- F15 - FLUID-PRESSURE ACTUATORS HYDRAULICS OR PNEUMATICS IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CLEANING APPARATUS
- Publication number 20080236634
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Tsuyoshi MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20080226518
- Publication date Sep 18, 2008
- TOKYO ELECTRON LIMITED
- Ryo NONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, electrode unit, feeder member and radi...
- Publication number 20070284085
- Publication date Dec 13, 2007
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, electrode unit, feeder member and radi...
- Publication number 20050023254
- Publication date Feb 3, 2005
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface processing apparatus
- Publication number 20040222388
- Publication date Nov 11, 2004
- TOKYO ELECTRON LIMITED
- Minoru Honda
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Mounting table temperature control device and substrate processing...

Plasma processing method and plasma processing apparatus

Temperature control system and temperature control method for subst...

Substrate processing system and substrate cleaning apparatus includ...

Plasma processing apparatus, electrode unit, feeder member and radi...

Surface processing apparatus

Plasma apparatus and lower electrode thereof

Plasma processing apparatus

Plasma process utilizing an electrostatic chuck

Plasma processing apparatus

Plasma process method using an electrostatic chuck

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

MOUNTING TABLE TEMPERATURE CONTROL DEVICE AND SUBSTRATE PROCESSING...

TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SUBST...

SUBSTRATE PROCESSING APPARATUS

MECHANISM FOR VARYING CYLINDER STOP POSITION AND SUBSTRATE PROCESSI...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CLEANING APPARATUS

SUBSTRATE PROCESSING APPARATUS

Plasma processing apparatus, electrode unit, feeder member and radi...

Plasma processing apparatus, electrode unit, feeder member and radi...

Surface processing apparatus