Ryo OHKUBO

Person

Shinjuku-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 12,153,338
- Issue date Nov 26, 2024
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method of manufacturing imprint mold, method of manufac...
- Patent number 12,007,684
- Issue date Jun 11, 2024
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, method for manufacturing reflective mask, and method fo...
- Patent number 11,762,279
- Issue date Sep 19, 2023
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 11,630,388
- Issue date Apr 18, 2023
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 11,435,662
- Issue date Sep 6, 2022
- Hoya Corporation
- Ryo Ohkubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 11,415,875
- Issue date Aug 16, 2022
- Hoya Corporation
- Hitoshi Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 11,281,089
- Issue date Mar 22, 2022
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 11,119,400
- Issue date Sep 14, 2021
- Hoya Corporation
- Ryo Ohkubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, method for manufacturing phase shift...
- Patent number 11,054,735
- Issue date Jul 6, 2021
- Hoya Corporation
- Takenori Kajiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,022,875
- Issue date Jun 1, 2021
- Hoya Corporation
- Kazutake Taniguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 11,009,787
- Issue date May 18, 2021
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 10,915,016
- Issue date Feb 9, 2021
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, transfer mask, method for manufacturing transfer mask,...
- Patent number 10,571,797
- Issue date Feb 25, 2020
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, method for manufacturing transfer mask,...
- Patent number 10,527,931
- Issue date Jan 7, 2020
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, transfer mask, method of manufacturing transfer mask an...
- Patent number 10,481,485
- Issue date Nov 19, 2019
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask and methods of manufacturing the same
- Patent number 10,365,555
- Issue date Jul 30, 2019
- Hoya Corporation
- Hiroaki Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, transfer mask, method for manufacturing transfer mask,...
- Patent number 10,101,650
- Issue date Oct 16, 2018
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank and method of manufacturing phase shift mask
- Patent number 9,952,497
- Issue date Apr 24, 2018
- Hoya Corporation
- Yasushi Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, and method for manufacturing transfer mask
- Patent number 9,726,972
- Issue date Aug 8, 2017
- Hoya Corporation
- Hiroaki Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 9,625,805
- Issue date Apr 18, 2017
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank and method of manufacturing phase shift mask
- Patent number 9,494,852
- Issue date Nov 15, 2016
- Hoya Corporation
- Yasushi Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 9,075,315
- Issue date Jul 7, 2015
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, method of manufacturing transfer mask an...
- Patent number 9,029,048
- Issue date May 12, 2015
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank manufacturing method and photomask manufacturing me...
- Patent number 8,221,941
- Issue date Jul 17, 2012
- Hoya Corporation
- Toshiyuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and met...
- Patent number 7,632,612
- Issue date Dec 15, 2009
- Hoya Corporation
- Yuuki Shiota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Reflective mask blank having a programmed defect and method of prod...
- Patent number 7,282,305
- Issue date Oct 16, 2007
- Hoya Corporation
- Tsutomo Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and met...
- Patent number 7,115,341
- Issue date Oct 3, 2006
- Hoya Corporation
- Yuuki Shiota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Halftone-type phase-shift mask blank, and halftone-type phase-shift...
- Patent number 7,011,910
- Issue date Mar 14, 2006
- Hoya Corporation
- Yuki Shiota
- G02 - OPTICS
Information Patent Grant
Method of manufacturing X-ray mask and X-ray mask blank, and X-ray...
- Patent number 6,317,480
- Issue date Nov 13, 2001
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING IMPRINT MOLD, METHOD OF MANUFAC...
- Publication number 20230367196
- Publication date Nov 16, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20220214608
- Publication date Jul 7, 2022
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20220179300
- Publication date Jun 9, 2022
- HOYA CORPORATION
- Hiroaki SHISHIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FO...
- Publication number 20220163880
- Publication date May 26, 2022
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...
- Publication number 20220043335
- Publication date Feb 10, 2022
- HOYA CORPORATION
- Ryo OHKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...
- Publication number 20220035235
- Publication date Feb 3, 2022
- HOYA CORPORATION
- Ryo OHKUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20210364910
- Publication date Nov 25, 2021
- HOYA CORPORATION
- Ryo OHKUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20210255538
- Publication date Aug 19, 2021
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...
- Publication number 20210149294
- Publication date May 20, 2021
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR PRODUCING TRANSFER MASK, AND METHOD FOR PROD...
- Publication number 20210109436
- Publication date Apr 15, 2021
- HOYA CORPORATION
- Ryo OHKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20210088895
- Publication date Mar 25, 2021
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20200409252
- Publication date Dec 31, 2020
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...
- Publication number 20200150524
- Publication date May 14, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20200064725
- Publication date Feb 27, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT...
- Publication number 20190163047
- Publication date May 30, 2019
- HOYA CORPORATION
- Takenori KAJIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...
- Publication number 20190040516
- Publication date Feb 7, 2019
- HOYA CORPORATION
- Ryo OHKUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...
- Publication number 20190004419
- Publication date Jan 3, 2019
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...
- Publication number 20180299767
- Publication date Oct 18, 2018
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING TRANSFER MASK AN...
- Publication number 20180259841
- Publication date Sep 13, 2018
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...
- Publication number 20180052387
- Publication date Feb 22, 2018
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK
- Publication number 20170023856
- Publication date Jan 26, 2017
- HOYA CORPORATION
- Yasushi Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING TRANSFER MASK
- Publication number 20160202603
- Publication date Jul 14, 2016
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK AND METHODS OF MANUFACTURING THE SAME
- Publication number 20160202602
- Publication date Jul 14, 2016
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...
- Publication number 20160187769
- Publication date Jun 30, 2016
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20150261083
- Publication date Sep 17, 2015
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK
- Publication number 20150198873
- Publication date Jul 16, 2015
- HOYA CORPORATION
- Yasushi Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING TRANSFER MASK AN...
- Publication number 20130078553
- Publication date Mar 28, 2013
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20130078554
- Publication date Mar 28, 2013
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK MANUFACTURING METHOD AND PHOTOMASK MANUFACTURING ME...
- Publication number 20100167185
- Publication date Jul 1, 2010
- HOYA CORPORATION
- Toshiyuki SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask, and met...
- Publication number 20070082278
- Publication date Apr 12, 2007
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, method of manufacturing imprint mold, method of manufac...

Mask blank, method for manufacturing reflective mask, and method fo...

Mask blank, method for manufacturing phase shift mask, and method f...

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, phase shift mask, and method for manufacturing semicond...

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, phase shift mask, method for manufacturing phase shift...

Mask blank, phase shift mask, and method of manufacturing semicondu...

Mask blank, phase shift mask, and method for manufacturing semicond...

Mask blank, method for manufacturing phase shift mask, and method f...

Mask blank, transfer mask, method for manufacturing transfer mask,...

Mask blank, transfer mask, method for manufacturing transfer mask,...

Mask blank, transfer mask, method of manufacturing transfer mask an...

Mask blank, transfer mask and methods of manufacturing the same

Mask blank, transfer mask, method for manufacturing transfer mask,...

Mask blank and method of manufacturing phase shift mask

Mask blank, transfer mask, and method for manufacturing transfer mask

Reflective mask blank, reflective mask and method of manufacturing...

Mask blank and method of manufacturing phase shift mask

Reflective mask blank, reflective mask and method of manufacturing...

Mask blank, transfer mask, method of manufacturing transfer mask an...

Photomask blank manufacturing method and photomask manufacturing me...

Halftone phase shift mask blank, halftone phase shift mask, and met...

Reflective mask blank having a programmed defect and method of prod...

Halftone phase shift mask blank, halftone phase shift mask, and met...

Halftone-type phase-shift mask blank, and halftone-type phase-shift...

Method of manufacturing X-ray mask and X-ray mask blank, and X-ray...

Patents Applicationslast 30 patents

MASK BLANK, METHOD OF MANUFACTURING IMPRINT MOLD, METHOD OF MANUFAC...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FO...

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...

MASK BLANK, METHOD FOR PRODUCING TRANSFER MASK, AND METHOD FOR PROD...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT...

MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...

MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...

MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...

MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING TRANSFER MASK AN...

MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...

MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING TRANSFER MASK

MASK BLANK, TRANSFER MASK AND METHODS OF MANUFACTURING THE SAME

MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK

MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING TRANSFER MASK AN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

PHOTOMASK BLANK MANUFACTURING METHOD AND PHOTOMASK MANUFACTURING ME...

Halftone phase shift mask blank, halftone phase shift mask, and met...