Ryo Tajima

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam irradiation apparatus and electron beam alignment method
- Patent number 11,515,118
- Issue date Nov 29, 2022
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustment method and electron beam device
- Patent number 11,217,421
- Issue date Jan 4, 2022
- Ebara Corporation
- Takehide Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection sensitivity calculation method and deflection sensitivit...
- Patent number 10,707,048
- Issue date Jul 7, 2020
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam irradiated area adjustment method and adjustment syst...
- Patent number 10,446,404
- Issue date Oct 15, 2019
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection device
- Patent number 10,002,740
- Issue date Jun 19, 2018
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 9,852,878
- Issue date Dec 26, 2017
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Testing apparatus using charged particles and device manufacturing...
- Patent number 9,406,480
- Issue date Aug 2, 2016
- Ebara Corporation
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system, inspection image data generation method, inspect...
- Patent number 9,105,445
- Issue date Aug 11, 2015
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Testing apparatus using charged particles and device manufacturing...
- Patent number 8,946,631
- Issue date Feb 3, 2015
- Ebara Corporation
- Nobuharu Noji
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Testing apparatus using charged particles and device manufacturing...
- Patent number 8,742,341
- Issue date Jun 3, 2014
- Ebara Corporation
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus, method of adjusting astigmatism us...
- Patent number 8,013,315
- Issue date Sep 6, 2011
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Testing apparatus using charged particles and device manufacturing...
- Patent number 7,741,601
- Issue date Jun 22, 2010
- Ebara Corporation
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Grant
Testing apparatus using charged particles and device manufacturing...
- Patent number 7,365,324
- Issue date Apr 29, 2008
- Ebara Corporation
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Grant
Testing apparatus using charged particles and device manufacturing...
- Patent number 7,138,629
- Issue date Nov 21, 2006
- Ebara Corporation
- Nobuharu Noji
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF EVALUATING PRIMARY OPTICAL SYSTEM OF ELECTRON BEAM OBSERV...
- Publication number 20230393085
- Publication date Dec 7, 2023
- EBARA CORPORATION
- Kenji WATANABE
- G01 - MEASURING TESTING
Information Patent Application
ADJUSTMENT METHOD AND ELECTRON BEAM DEVICE
- Publication number 20210012997
- Publication date Jan 14, 2021
- EBARA CORPORATION
- Takehide HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS
- Publication number 20200411275
- Publication date Dec 31, 2020
- EBARA CORPORATION
- Ryo TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM ALIGNMENT METHOD
- Publication number 20200273658
- Publication date Aug 27, 2020
- EBARA CORPORATION
- Kenji WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFLECTION SENSITIVITY CALCULATION METHOD AND DEFLECTION SENSITIVIT...
- Publication number 20190237293
- Publication date Aug 1, 2019
- EBARA CORPORATION
- Ryo TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-BEAM IRRADIATED AREA ADJUSTMENT METHOD AND ADJUSTMENT SYST...
- Publication number 20180233374
- Publication date Aug 16, 2018
- EBARA CORPORATION
- Ryo TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION DEVICE
- Publication number 20180040452
- Publication date Feb 8, 2018
- EBARA CORPORATION
- Masahiro HATAKEYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PROCESSING APPARATUS
- Publication number 20150371813
- Publication date Dec 24, 2015
- EBARA CORPORATION
- Masahiro HATAKEYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TESTING APPARATUS USING CHARGED PARTICLES AND DEVICE MANUFACTURING...
- Publication number 20150122993
- Publication date May 7, 2015
- EBARA CORPORATION
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM, INSPECTION IMAGE DATA GENERATION METHOD, INSPECT...
- Publication number 20140291515
- Publication date Oct 2, 2014
- Ryo TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TESTING APPARATUS USING CHARGED PARTICLES AND DEVICE MANUFACTURING...
- Publication number 20140158885
- Publication date Jun 12, 2014
- EBARA CORPORATION
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Application
Testing apparatus using charged particles and device manufacturing...
- Publication number 20100237243
- Publication date Sep 23, 2010
- EBARA CORPORATION
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR DEVICES AND METHOD OF TESTING SAME
- Publication number 20090152595
- Publication date Jun 18, 2009
- EBARA CORPORATION
- Toru Kaga
- G01 - MEASURING TESTING
Information Patent Application
Testing apparatus using charged particles and device manufacturing...
- Publication number 20090101816
- Publication date Apr 23, 2009
- EBARA CORPORATION
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam apparatus, method of adjusting astigmatism us...
- Publication number 20080099697
- Publication date May 1, 2008
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Testing apparatus using charged particles and device manufacturing...
- Publication number 20060169900
- Publication date Aug 3, 2006
- EBARA CORPORATION
- Nobuharu Noji
- G01 - MEASURING TESTING
Information Patent Application
Testing apparatus using charged particles and device manufacturing...
- Publication number 20050045821
- Publication date Mar 3, 2005
- Nobuharu Noji
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Electron beam irradiation apparatus and electron beam alignment method

Adjustment method and electron beam device

Deflection sensitivity calculation method and deflection sensitivit...

Electron-beam irradiated area adjustment method and adjustment syst...

Inspection device

Surface processing apparatus

Testing apparatus using charged particles and device manufacturing...

Inspection system, inspection image data generation method, inspect...

Testing apparatus using charged particles and device manufacturing...

Testing apparatus using charged particles and device manufacturing...

Charged particle beam apparatus, method of adjusting astigmatism us...

Testing apparatus using charged particles and device manufacturing...

Testing apparatus using charged particles and device manufacturing...

Testing apparatus using charged particles and device manufacturing...

Patents Applicationslast 30 patents

METHOD OF EVALUATING PRIMARY OPTICAL SYSTEM OF ELECTRON BEAM OBSERV...

ADJUSTMENT METHOD AND ELECTRON BEAM DEVICE

ELECTRON BEAM IRRADIATION APPARATUS

ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM ALIGNMENT METHOD

DEFLECTION SENSITIVITY CALCULATION METHOD AND DEFLECTION SENSITIVIT...

ELECTRON-BEAM IRRADIATED AREA ADJUSTMENT METHOD AND ADJUSTMENT SYST...

INSPECTION DEVICE

SURFACE PROCESSING APPARATUS

TESTING APPARATUS USING CHARGED PARTICLES AND DEVICE MANUFACTURING...

INSPECTION SYSTEM, INSPECTION IMAGE DATA GENERATION METHOD, INSPECT...

TESTING APPARATUS USING CHARGED PARTICLES AND DEVICE MANUFACTURING...

Testing apparatus using charged particles and device manufacturing...

SEMICONDUCTOR DEVICES AND METHOD OF TESTING SAME

Testing apparatus using charged particles and device manufacturing...

Charged particle beam apparatus, method of adjusting astigmatism us...

Testing apparatus using charged particles and device manufacturing...

Testing apparatus using charged particles and device manufacturing...