Ryohei KITAO

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 9,779,992
- Issue date Oct 3, 2017
- Renesas Electronics Corporation
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, and method for producing the same
- Patent number 9,685,517
- Issue date Jun 20, 2017
- Renesas Electronics Corporation
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 9,275,935
- Issue date Mar 1, 2016
- Renesas Electronics Corporation
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device, and plating apparatus
- Patent number 8,038,864
- Issue date Oct 18, 2011
- Renesas Electronics Corporation
- Koji Arita
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for manufacturing a semiconductor device having a multi-laye...
- Patent number 7,833,901
- Issue date Nov 16, 2010
- NEC Electronics Corporation
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 7,563,705
- Issue date Jul 21, 2009
- NEC Electronics Corporation
- Takashi Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 7,229,916
- Issue date Jun 12, 2007
- NEC Electronics Corporation
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having two distinct sioch layers
- Patent number 7,132,732
- Issue date Nov 7, 2006
- NEC Electronics Corporation
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device using plasma-enhanced CVD
- Patent number 7,074,698
- Issue date Jul 11, 2006
- NEC Electronics Corporation
- Noboru Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device having damascene inter...
- Patent number 6,989,328
- Issue date Jan 24, 2006
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20160148841
- Publication date May 26, 2016
- RENESAS ELECTRONICS CORPORATION
- RYOHEI KITAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING THE SAME
- Publication number 20150357424
- Publication date Dec 10, 2015
- RENESAS ELECTRONICS CORPORATION
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20140061940
- Publication date Mar 6, 2014
- RENESAS ELECTRONICS CORPORATION
- Ryohei KITAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20110227224
- Publication date Sep 22, 2011
- RENESAS ELECTRONICS CORPORATION
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND PLATING APPARATUS
- Publication number 20080023335
- Publication date Jan 31, 2008
- NEC ELECTRONICS CORPORATION
- Koji ARITA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Semiconductor device, and production method for manufacturing such...
- Publication number 20070045861
- Publication date Mar 1, 2007
- NEC ELECTRONICS CORPORATION
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20060141778
- Publication date Jun 29, 2006
- NEC Electronics Corporation
- Takashi Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20050048769
- Publication date Mar 3, 2005
- NEC ELECTRONICS CORPORATION
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, and production method for manufacturing such...
- Publication number 20040183162
- Publication date Sep 23, 2004
- NEC ELECTRONICS CORPORATION
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating semiconductor device using Plasma-Enhanced CVD
- Publication number 20040185668
- Publication date Sep 23, 2004
- NEC Electronics Corporation
- Noboru Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing semiconductor device having damascene inter...
- Publication number 20040161928
- Publication date Aug 19, 2004
- NEC ELECTRONICS CORPORATION
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20030155657
- Publication date Aug 21, 2003
- NEC Electronics Corporation
- Takashi Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS

Ryohei KITAO

Person

Patents Grantslast 30 patents

Semiconductor device and method of manufacturing the same

Semiconductor device, and method for producing the same

Semiconductor device and method of manufacturing the same

Method of fabricating semiconductor device, and plating apparatus

Method for manufacturing a semiconductor device having a multi-laye...

Manufacturing method of semiconductor device

Method of manufacturing a semiconductor device

Semiconductor device having two distinct sioch layers

Method of fabricating semiconductor device using plasma-enhanced CVD

Method of manufacturing semiconductor device having damascene inter...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Semiconductor device and method for manufacturing the same

METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND PLATING APPARATUS

Semiconductor device, and production method for manufacturing such...

Manufacturing method of semiconductor device

Method of manufacturing a semiconductor device

Semiconductor device, and production method for manufacturing such...

Method of fabricating semiconductor device using Plasma-Enhanced CVD

Method of manufacturing semiconductor device having damascene inter...

Manufacturing method of semiconductor device