Ryoichi Kaneko

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Kanagawa-ken, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing microdevice utilizing combined alignment mark
- Patent number 6,416,912
- Issue date Jul 9, 2002
- Nikon Corporation
- Mitsuru Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method for overlaying one mask pattern on another
- Patent number 6,372,395
- Issue date Apr 16, 2002
- Nikon Corporation
- Masaharu Kawakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure methods for overlaying one mask pattern on another
- Patent number 6,331,369
- Issue date Dec 18, 2001
- Nikon Corporation
- Masaharu Kawakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure methods for overlaying one mask pattern on another
- Patent number 5,989,761
- Issue date Nov 23, 1999
- Nikon Corporation
- Masaharu Kawakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method utilizing alignment of superimposed layers
- Patent number 5,863,680
- Issue date Jan 26, 1999
- Nikon Corporation
- Masaharu Kawakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and alignment apparatus with a statistic calculati...
- Patent number 5,525,808
- Issue date Jun 11, 1996
- Nikon Corporaton
- Nobuyuki Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Exposure method for overlaying one mask pattern on another
- Publication number 20020012858
- Publication date Jan 31, 2002
- NIKON CORPORATION
- Masaharu Kawakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY