Ryoichi Takasu

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing compound, resist composition for immersion expo...
- Patent number 7,989,138
- Issue date Aug 2, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,914,968
- Issue date Mar 29, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing compound, resist composition for immersion expo...
- Patent number 7,914,967
- Issue date Mar 29, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition
- Patent number 7,541,138
- Issue date Jun 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,527,909
- Issue date May 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,501,220
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Material for forming resist protecting film for use in liquid immer...
- Patent number 7,371,510
- Issue date May 13, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, resist composition and dissolution inhibitor agen...
- Patent number 7,326,512
- Issue date Feb 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition
- Patent number 6,936,400
- Issue date Aug 30, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoichi Takasu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100304289
- Publication date Dec 2, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...
- Publication number 20090142699
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20090130605
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...
- Publication number 20090047602
- Publication date Feb 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20070190436
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070178394
- Publication date Aug 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material for forming resist protecting film for use in liquid immer...
- Publication number 20070134593
- Publication date Jun 14, 2007
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion exposure process-use resist protection film forming mater...
- Publication number 20060141400
- Publication date Jun 29, 2006
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer compound, resist composition and dissolution inhibitor agen...
- Publication number 20050130056
- Publication date Jun 16, 2005
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition
- Publication number 20050014090
- Publication date Jan 20, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20040009427
- Publication date Jan 15, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoichi Takasu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryoichi Takasu

Person

Patents Grantslast 30 patents

Resist composition

Fluorine-containing compound, resist composition for immersion expo...

Positive resist composition and method of forming resist pattern

Fluorine-containing compound, resist composition for immersion expo...

Resist composition

Resist composition

Resist composition

Material for forming resist protecting film for use in liquid immer...

Polymer compound, resist composition and dissolution inhibitor agen...

Negative resist composition

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...

RESIST COMPOSITION

FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...

RESIST COMPOSITION

RESIST COMPOSITION

Material for forming resist protecting film for use in liquid immer...

Immersion exposure process-use resist protection film forming mater...

Polymer compound, resist composition and dissolution inhibitor agen...

Resist composition

Negative resist composition