Ryoichi YOSHIDA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method for processing object
- Patent number 10,264,630
- Issue date Apr 16, 2019
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing target object and plasma processing apparatus
- Patent number 9,583,361
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Yoshihide Kihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching method
- Patent number 9,543,164
- Issue date Jan 10, 2017
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 9,349,574
- Issue date May 24, 2016
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 8,975,190
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,821,742
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,569,178
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Masanori Hosoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma etching method
- Patent number 8,138,096
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD
- Publication number 20160163563
- Publication date Jun 9, 2016
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING TARGET OBJECT AND PLASMA PROCESSING APPARATUS
- Publication number 20150243524
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR PROCESSING OBJECT
- Publication number 20150245460
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20150206715
- Publication date Jul 23, 2015
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20150162202
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20140083975
- Publication date Mar 27, 2014
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20120031875
- Publication date Feb 9, 2012
- TOKYO ELECTRON LIMITED
- Masanori HOSOYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20100133234
- Publication date Jun 3, 2010
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20080194114
- Publication date Aug 14, 2008
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM
- Publication number 20070218681
- Publication date Sep 20, 2007
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM
- Publication number 20070218699
- Publication date Sep 20, 2007
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, AND COMPUTER-READA...
- Publication number 20070218698
- Publication date Sep 20, 2007
- TOKYO ELECTRON LIMITED
- Ryoichi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20060042754
- Publication date Mar 2, 2006
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS

Ryoichi YOSHIDA

Person

Patents Grantslast 30 patents

Plasma processing apparatus and method for processing object

Method of processing target object and plasma processing apparatus

Etching method

Plasma etching method and plasma etching apparatus

Plasma processing method

Plasma etching method

Plasma processing method and plasma processing apparatus

Plasma etching method

Patents Applicationslast 30 patents

ETCHING METHOD

METHOD OF PROCESSING TARGET OBJECT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR PROCESSING OBJECT

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

ETCHING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING APPARATUS

PLASMA ETCHING METHOD

PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM

PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, AND COMPUTER-READA...

Plasma etching apparatus