Ryoji ASAKURA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing system
- Patent number 12,014,909
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 11,538,671
- Issue date Dec 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and semiconductor etching apparatus
- Patent number 11,410,836
- Issue date Aug 9, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma processing apparatus and analysis method for analyzing plasm...
- Patent number 11,404,253
- Issue date Aug 2, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing system
- Patent number 10,872,750
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and analysis method for analyzing plasm...
- Patent number 10,734,207
- Issue date Aug 4, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 10,510,519
- Issue date Dec 17, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and plasma pr...
- Patent number 10,408,762
- Issue date Sep 10, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and semiconductor etching apparatus
- Patent number 10,262,842
- Issue date Apr 16, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Setting operation control in parts mounting device by reducing a va...
- Patent number 9,897,999
- Issue date Feb 20, 2018
- Yamaha Hatsudoki Kabushiki Kaisha
- Ryoji Asakura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing apparatus and analyzing apparatus
- Patent number 9,464,936
- Issue date Oct 11, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Data analysis method for plasma processing apparatus, plasma proces...
- Patent number 9,443,704
- Issue date Sep 13, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data analysis method for plasma processing apparatus, plasma proces...
- Patent number 9,324,588
- Issue date Apr 26, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Analysis method, analysis device, and etching processing system
- Patent number 9,091,595
- Issue date Jul 28, 2015
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...
- Publication number 20250014923
- Publication date Jan 9, 2025
- Hitachi High-Tech Corporation
- Satoshi MURASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSTIC DEVICE, DIAGNOSTIC METHOD, SEMICONDUCTOR MANUFACTURING E...
- Publication number 20240395518
- Publication date Nov 28, 2024
- Hitachi High-Tech Corporation
- Shota UMEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...
- Publication number 20240321608
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Pushe ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSTIC APPARATUS AND DIAGNOSTIC METHOD, AND SEMICONDUCTOR MANUF...
- Publication number 20240310821
- Publication date Sep 19, 2024
- Hitachi High-Tech Corporation
- Masaaki YAMAMOTO
- G05 - CONTROLLING REGULATING
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20220328286
- Publication date Oct 13, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20210074528
- Publication date Mar 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...
- Publication number 20200328067
- Publication date Oct 15, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS
- Publication number 20200066500
- Publication date Feb 27, 2020
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20190189397
- Publication date Jun 20, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20190170653
- Publication date Jun 6, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20190051502
- Publication date Feb 14, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...
- Publication number 20180025894
- Publication date Jan 25, 2018
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS
- Publication number 20160379896
- Publication date Dec 29, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20160225681
- Publication date Aug 4, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...
- Publication number 20160203957
- Publication date Jul 14, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TASK-DIRECTING SYSTEM AND TASK-DIRECTING METHOD
- Publication number 20160140515
- Publication date May 19, 2016
- Hitachi, Ltd
- Daisuke KATSUMATA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...
- Publication number 20160020123
- Publication date Jan 21, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20150083328
- Publication date Mar 26, 2015
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
CALCULATION DEVICE, PARTS INSTALLATION DEVICE, AND PROGRAM
- Publication number 20150081079
- Publication date Mar 19, 2015
- HITACHI HIGH-TECH INSTRUMENTS CO., LTD.
- Ryoji Asakura
- G05 - CONTROLLING REGULATING
Information Patent Application
SEMICONDUCTOR ETCHING APPARATUS AND ANALYZING APPARATUS
- Publication number 20140262029
- Publication date Sep 18, 2014
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS METHOD, ANALYSIS DEVICE, AND ETCHING PROCESSING SYSTEM
- Publication number 20140022540
- Publication date Jan 23, 2014
- Ryoji ASAKURA
- G01 - MEASURING TESTING

Ryoji ASAKURA

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing system

Plasma processing apparatus and data analysis apparatus

Analysis method and semiconductor etching apparatus

Plasma processing apparatus and analysis method for analyzing plasm...

Plasma processing apparatus and plasma processing system

Plasma processing apparatus and analysis method for analyzing plasm...

Plasma processing apparatus and data analysis apparatus

Plasma processing apparatus, plasma processing method and plasma pr...

Analysis method and semiconductor etching apparatus

Setting operation control in parts mounting device by reducing a va...

Plasma processing apparatus and analyzing apparatus

Data analysis method for plasma processing apparatus, plasma proces...

Data analysis method for plasma processing apparatus, plasma proces...

Analysis method, analysis device, and etching processing system

Patents Applicationslast 30 patents

DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...

DIAGNOSTIC DEVICE, DIAGNOSTIC METHOD, SEMICONDUCTOR MANUFACTURING E...

DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...

DIAGNOSTIC APPARATUS AND DIAGNOSTIC METHOD, AND SEMICONDUCTOR MANUF...

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...

PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...

PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...

TASK-DIRECTING SYSTEM AND TASK-DIRECTING METHOD

DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

CALCULATION DEVICE, PARTS INSTALLATION DEVICE, AND PROGRAM

SEMICONDUCTOR ETCHING APPARATUS AND ANALYZING APPARATUS

ANALYSIS METHOD, ANALYSIS DEVICE, AND ETCHING PROCESSING SYSTEM