Ryoji Hagiwara

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating EUVL mask
- Patent number 7,927,769
- Issue date Apr 19, 2011
- SII NanoTechnology Inc.
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Focused ion beam processing method
- Patent number 7,576,340
- Issue date Aug 18, 2009
- Sii Nano Technology Inc.
- Ryoji Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam irradiation method and charged particle beam...
- Patent number 7,488,961
- Issue date Feb 10, 2009
- SII NanoTechnology Inc.
- Masashi Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam scan and irradiation method, charged particle...
- Patent number 7,485,880
- Issue date Feb 3, 2009
- SII NanoTechnology Inc.
- Tomokazu Kozakai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photomask defect correction method employing a combined device of a...
- Patent number 7,375,352
- Issue date May 20, 2008
- SII NanoTechnology Inc.
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam processing method
- Patent number 7,018,683
- Issue date Mar 28, 2006
- SII NanoTechnology Inc.
- Osamu Takaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for repairing a phase shift mask and a focused ion beam appa...
- Patent number 6,891,171
- Issue date May 10, 2005
- SII NanoTechnology Inc.
- Ryoji Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle processing for forming pattern boundaries at a uni...
- Patent number 6,780,551
- Issue date Aug 24, 2004
- SII NanoTechnology Inc.
- Ryoji Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coordinating optical type observing apparatus and laser marking method
- Patent number 6,303,930
- Issue date Oct 16, 2001
- Seiko Instruments Inc.
- Ryoji Hagiwara
- G01 - MEASURING TESTING
Information Patent Grant
X-ray image sensor
- Patent number 5,109,159
- Issue date Apr 28, 1992
- Seiko Instruments Inc.
- Ryoji Hagiwara
- G01 - MEASURING TESTING
Information Patent Grant
X-ray image sensor
- Patent number 5,079,423
- Issue date Jan 7, 1992
- Seiko Instruments Inc.
- Ryoji Hagiwara
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Method for fabricating EUVL mask
- Publication number 20090226825
- Publication date Sep 10, 2009
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Focused ion beam processing method
- Publication number 20070158590
- Publication date Jul 12, 2007
- Ryoji Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged particle beam irradiation method and charged particle beam...
- Publication number 20070114462
- Publication date May 24, 2007
- Masashi Muramatsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam processing method and charged particle beam a...
- Publication number 20070114460
- Publication date May 24, 2007
- Masashi Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam scan and irradiation method, charged particle...
- Publication number 20070114454
- Publication date May 24, 2007
- Tomokazu Kozakai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photomask defect correction method employing a combined device of a...
- Publication number 20050285033
- Publication date Dec 29, 2005
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Application
Electron beam processing method
- Publication number 20050276932
- Publication date Dec 15, 2005
- Osamu Takaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Charged particle processing for forming pattern boundaries at a uni...
- Publication number 20020177055
- Publication date Nov 28, 2002
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY

Ryoji Hagiwara

Person

Patents Grantslast 30 patents

Method for fabricating EUVL mask

Focused ion beam processing method

Charged particle beam irradiation method and charged particle beam...

Charged particle beam scan and irradiation method, charged particle...

Photomask defect correction method employing a combined device of a...

Electron beam processing method

Method for repairing a phase shift mask and a focused ion beam appa...

Charged particle processing for forming pattern boundaries at a uni...

Coordinating optical type observing apparatus and laser marking method

X-ray image sensor

X-ray image sensor

Patents Applicationslast 30 patents

Method for fabricating EUVL mask

Focused ion beam processing method

Charged particle beam irradiation method and charged particle beam...

Charged particle beam processing method and charged particle beam a...

Charged particle beam scan and irradiation method, charged particle...

Photomask defect correction method employing a combined device of a...

Electron beam processing method

Charged particle processing for forming pattern boundaries at a uni...