Ryoken OZAWA

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Joetsu-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photomask blank and photomask
- Patent number 10,782,609
- Issue date Sep 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryoken Ozawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK
- Publication number 20240345474
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro KISHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT-TYPE PHOTOMASK BLANK AND PHASE SHIFT-TYPE PHOTOMASK
- Publication number 20200096856
- Publication date Mar 26, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20190004420
- Publication date Jan 3, 2019
- Shin-Etsu Chemical Co., Ltd.
- Ryoken OZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY