Ryoki Tobe

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of depositing titanium nitride thin film and CVD deposition...
- Patent number 6,471,781
- Issue date Oct 29, 2002
- Anelva Corporation
- Ryoki Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a titanium nitride thin film
- Patent number 6,468,604
- Issue date Oct 22, 2002
- Anelva Corporation
- Ryoki Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing titanium nitride thin film and CVD deposition...
- Patent number 6,080,446
- Issue date Jun 27, 2000
- Anelva Corporation
- Ryoki Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma enhanced CVD apparatus and process, and dry etching apparatu...
- Patent number 5,891,349
- Issue date Apr 6, 1999
- Anelva Corporation
- Ryoki Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma enhanced CVD apparatus, plasma enhanced processing apparatus...
- Patent number 5,855,685
- Issue date Jan 5, 1999
- Anelva Corporation
- Ryoki Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing titanium-containing conductive thin film
- Patent number 5,721,021
- Issue date Feb 24, 1998
- Anelva Corporation
- Ryoki Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Method and manufacturing device for manufacturing a titanium nitrid...
- Publication number 20020015791
- Publication date Feb 7, 2002
- Ryoki Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Method of depositing titanium nitride thin film and CVD deposition...

Method for manufacturing a titanium nitride thin film

Method of depositing titanium nitride thin film and CVD deposition...

Plasma enhanced CVD apparatus and process, and dry etching apparatu...

Plasma enhanced CVD apparatus, plasma enhanced processing apparatus...

Method of depositing titanium-containing conductive thin film

Patents Applicationslast 30 patents

Method and manufacturing device for manufacturing a titanium nitrid...