Ryosuke NAKAMURA

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Negative type photosensitive resin composition, photosensitive resi...
- Patent number 11,415,888
- Issue date Aug 16, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Ryosuke Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Chimeric FCeRI a-Chain Gene, Chimeric FCeRI a-Chain Protein, Cells,...
- Publication number 20240309389
- Publication date Sep 19, 2024
- TEIKYO HEISEI UNIVERSITY
- Ryosuke Nakamura
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE R...
- Publication number 20230041025
- Publication date Feb 9, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Ryosuke NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE-TONE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESI...
- Publication number 20200201181
- Publication date Jun 25, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Hirofumi IMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESI...
- Publication number 20190235380
- Publication date Aug 1, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Ryosuke NAKAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY