Ryosuke TANIGUCHI

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 12,060,317
- Issue date Aug 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 11,773,059
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,688
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,579,526
- Issue date Feb 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Epoxy compound, resist composition, and pattern forming process
- Patent number 11,492,337
- Issue date Nov 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, resist composition, and patterning process
- Patent number 11,215,926
- Issue date Jan 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 10,921,710
- Issue date Feb 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, pattern forming process, polymer, and monomer
- Patent number 10,310,376
- Issue date Jun 4, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium compound, making method, resist composition, and pattern...
- Patent number 10,248,022
- Issue date Apr 2, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 10,180,626
- Issue date Jan 15, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, resist composition, and pattern forming process
- Patent number 10,173,975
- Issue date Jan 8, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, resist composition, and patterning process
- Patent number 10,025,180
- Issue date Jul 17, 2018
- Shin-Etsu Chemical Co., Ltd.
- Ryo Mitsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hemiacetal compound, polymer, resist composition, and patterning pr...
- Patent number 9,740,100
- Issue date Aug 22, 2017
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, resist composition, and patterning process
- Patent number 9,703,193
- Issue date Jul 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 9,458,144
- Issue date Oct 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 9,256,127
- Issue date Feb 9, 2016
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid generator, chemically amplified resist composition, and patter...
- Patent number 9,223,205
- Issue date Dec 29, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 9,221,742
- Issue date Dec 29, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,871,427
- Issue date Oct 28, 2014
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,795,942
- Issue date Aug 5, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process using the same
- Patent number 8,748,076
- Issue date Jun 10, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Nagasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,703,384
- Issue date Apr 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 8,628,908
- Issue date Jan 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,727,704
- Issue date Jun 1, 2010
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,691,561
- Issue date Apr 6, 2010
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20220155687
- Publication date May 19, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...
- Publication number 20220113626
- Publication date Apr 14, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...
- Publication number 20210395195
- Publication date Dec 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200301275
- Publication date Sep 24, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200301274
- Publication date Sep 24, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
EPOXY COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20200283400
- Publication date Sep 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20190064665
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20190033715
- Publication date Jan 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20180099928
- Publication date Apr 12, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G01 - MEASURING TESTING
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20180088464
- Publication date Mar 29, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20180059543
- Publication date Mar 1, 2018
- Shin-Etsu Chemical Co., Ltd.
- Ryo Mitsui
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL SULFONIUM COMPOUND, MAKING METHOD, RESIST COMPOSITION, AND PA...
- Publication number 20170329227
- Publication date Nov 16, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER
- Publication number 20170184967
- Publication date Jun 29, 2017
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20160320698
- Publication date Nov 3, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20160238930
- Publication date Aug 18, 2016
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20150323865
- Publication date Nov 12, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20150322027
- Publication date Nov 12, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...
- Publication number 20150086926
- Publication date Mar 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...
- Publication number 20130236832
- Publication date Sep 12, 2013
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130101936
- Publication date Apr 25, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130065179
- Publication date Mar 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Kazunori MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130045444
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120225386
- Publication date Sep 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME
- Publication number 20120196228
- Publication date Aug 2, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120164577
- Publication date Jun 28, 2012
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120135350
- Publication date May 31, 2012
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20120135357
- Publication date May 31, 2012
- Tomohiro KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition and patterning process
- Publication number 20080153030
- Publication date Jun 26, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20080008959
- Publication date Jan 10, 2008
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20080008960
- Publication date Jan 10, 2008
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryosuke TANIGUCHI

Person

Patents Grantslast 30 patents

Resist composition and pattern forming process

Onium salt, chemically amplified negative resist composition, and p...

Onium salt, chemically amplified negative resist composition, and p...

Resist composition and patterning process

Resist composition and patterning process

Epoxy compound, resist composition, and pattern forming process

Sulfonium compound, resist composition, and patterning process

Resist composition and pattern forming process

Resist composition, pattern forming process, polymer, and monomer

Sulfonium compound, making method, resist composition, and pattern...

Sulfonium salt, resist composition, and patterning process

Sulfonium compound, resist composition, and pattern forming process

Sulfonium compound, resist composition, and patterning process

Hemiacetal compound, polymer, resist composition, and patterning pr...

Onium salt, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Acid generator, chemically amplified resist composition, and patter...

Sulfonium salt, chemically amplified resist composition, and patter...

Positive resist composition and patterning process

Positive resist composition and patterning process

Resist composition and patterning process using the same

Positive resist composition and patterning process

Chemically amplified resist composition and patterning process

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

EPOXY COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS

NOVEL SULFONIUM COMPOUND, MAKING METHOD, RESIST COMPOSITION, AND PA...

RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER

ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...

ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS

Positive resist composition and patterning process

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS