Ryotaro Tanaka

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Coil and manufacturing method for same, and reactor
- Patent number 9,514,878
- Issue date Dec 6, 2016
- Tamura Corporation
- Ryo Nakatsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEM...
- Publication number 20240231231
- Publication date Jul 11, 2024
- JSR Corporation
- Daiki TATSUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240142876
- Publication date May 2, 2024
- JSR Corporation
- Hiroyuki MIYAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220299873
- Publication date Sep 22, 2022
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COIL AND MANUFACTURING METHOD FOR SAME, AND REACTOR
- Publication number 20150162119
- Publication date Jun 11, 2015
- TAMURA CORPORATION
- Ryo Nakatsu
- H01 - BASIC ELECTRIC ELEMENTS