Ryou Son

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 10,971,341
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Ryou Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,504,698
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measuring method and plasma processing system
- Patent number 9,412,565
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Yusuke Yoshida
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor processing apparatus and method for using same
- Patent number 8,183,158
- Issue date May 22, 2012
- Tokyo Electron Limited
- Masahiko Tomita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and method for using the same
- Patent number 8,080,109
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT PEDESTAL AND PLASMA PROCESSING APPARATUS
- Publication number 20210104385
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Ryou SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20210005477
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Ryou Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION UNIT AND METHOD OF DISCRIMINATING STATE OF PHYSIC...
- Publication number 20200294766
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Ryou SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190088454
- Publication date Mar 21, 2019
- TOKYO ELECTRON LIMITED
- Ryou SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160118224
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Masayuki KOHNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASURING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20150221482
- Publication date Aug 6, 2015
- TOKYO ELECTRON LIMITED
- Yusuke YOSHIDA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20100032095
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Yasuhiro TOBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation apparatus and method for using the same
- Publication number 20080282976
- Publication date Nov 20, 2008
- Mitsuhiro Okada
- B08 - CLEANING
Information Patent Application
Semiconductor processing apparatus and method for using same
- Publication number 20080093023
- Publication date Apr 24, 2008
- Masahiko Tomita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Temperature measuring method and plasma processing system

Semiconductor processing apparatus and method for using same

Film formation apparatus and method for using the same

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT PEDESTAL AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PLASMA GENERATION UNIT AND METHOD OF DISCRIMINATING STATE OF PHYSIC...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

TEMPERATURE MEASURING METHOD AND PLASMA PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS

Film formation apparatus and method for using the same

Semiconductor processing apparatus and method for using same