Ryouichi Uemura

Person

Kumamoto-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and apparatus
- Patent number 8,231,285
- Issue date Jul 31, 2012
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method
- Patent number 7,780,366
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method
- Patent number 7,648,292
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Kunie Ogata
Information Patent Grant
Resist pattern forming apparatus and method thereof
- Patent number 7,488,127
- Issue date Feb 10, 2009
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and information storage apparatus and method
- Patent number 7,031,792
- Issue date Apr 18, 2006
- Tokyo Electron Limited
- Yuji Yoshimoto
- G11 - INFORMATION STORAGE
Information Patent Grant
Substrate processing apparatus and information storage apparatus an...
- Patent number 6,990,380
- Issue date Jan 24, 2006
- Tokyo Electron Limited
- Yuji Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming apparatus and method thereof
- Patent number 6,984,477
- Issue date Jan 10, 2006
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspecting device, coating/developing device and substrat...
- Patent number 6,974,963
- Issue date Dec 13, 2005
- Tokyo Electron Limited
- Michio Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Managing system, managing method, host computer, and information co...
- Patent number 6,766,209
- Issue date Jul 20, 2004
- Tokyo Electron Limited
- Takashi Aiuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,457,882
- Issue date Oct 1, 2002
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN FORMING METHOD
- Publication number 20100047702
- Publication date Feb 25, 2010
- TOKYO ELECTRON LIMITED
- Kunie OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming apparatus and method thereof
- Publication number 20050271382
- Publication date Dec 8, 2005
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate inspecting device, coating/developing device and substrat...
- Publication number 20050038618
- Publication date Feb 17, 2005
- Michio Tanaka
- G01 - MEASURING TESTING
Information Patent Application
Managing system, managing method, host computer, and information co...
- Publication number 20030023454
- Publication date Jan 30, 2003
- TOKYO ELECTRON LIMITED
- Takashi Aiuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Processing apparatus and information storage apparatus and method
- Publication number 20020145922
- Publication date Oct 10, 2002
- TOKYO ELECTRON LIMITED
- Yuji Yoshimoto
- G11 - INFORMATION STORAGE
Information Patent Application
Substrate processing apparatus and information storage apparatus an...
- Publication number 20020116076
- Publication date Aug 22, 2002
- TOKYO ELECTRON LIMITED
- Yuji Yoshimoto
- G05 - CONTROLLING REGULATING
Information Patent Application
Coating film forming apparatus and coating film forming method
- Publication number 20020053321
- Publication date May 9, 2002
- TOKYO ELECTRON LIMITED
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist pattern forming apparatus and method thereof
- Publication number 20020037462
- Publication date Mar 28, 2002
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20010022897
- Publication date Sep 20, 2001
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryouichi Uemura

Person

Patents Grantslast 30 patents

Substrate processing method and apparatus

Resist pattern forming method

Resist pattern forming method

Resist pattern forming apparatus and method thereof

Processing apparatus and information storage apparatus and method

Substrate processing apparatus and information storage apparatus an...

Resist pattern forming apparatus and method thereof

Substrate inspecting device, coating/developing device and substrat...

Managing system, managing method, host computer, and information co...

Substrate processing method and substrate processing apparatus

Patents Applicationslast 30 patents

RESIST PATTERN FORMING METHOD

Resist pattern forming apparatus and method thereof

Substrate inspecting device, coating/developing device and substrat...

Managing system, managing method, host computer, and information co...

Processing apparatus and information storage apparatus and method

Substrate processing apparatus and information storage apparatus an...

Coating film forming apparatus and coating film forming method

Resist pattern forming apparatus and method thereof

Substrate processing method and substrate processing apparatus