Ryoung-Han KIM

Person

Clifton Park, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming semiconductor device with multiple level patterning
- Patent number 8,815,748
- Issue date Aug 26, 2014
- Advanced Micro Devices, Inc.
- Thomas Ingolf Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical polarizer with nanotube array
- Patent number 8,792,161
- Issue date Jul 29, 2014
- GLOBALFOUNDRIES Inc.
- Bruno M. LaFontaine
- G02 - OPTICS
Information Patent Grant
Multilayer interconnect structure and method for integrated circuits
- Patent number 8,664,113
- Issue date Mar 4, 2014
- GLOBALFOUNDRIES, INC.
- Ryoung-han Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer lithography
- Patent number 8,642,474
- Issue date Feb 4, 2014
- Advanced Micro Devices, Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a high resolution resist pattern on a semiconduc...
- Patent number 8,586,269
- Issue date Nov 19, 2013
- GLOBALFOUNDRIES Inc.
- Uzodinma Okoroanyanwu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spacer double patterning that prints multiple CD in front-end-of-line
- Patent number 8,450,833
- Issue date May 28, 2013
- GLOBALFOUNDRIES Inc.
- Ryoung-han Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double exposure technology using high etching selectivity
- Patent number 8,445,182
- Issue date May 21, 2013
- Advanced Micro Devices, Inc.
- Ryoung-Han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming an interconnect structure
- Patent number 8,435,884
- Issue date May 7, 2013
- GLOBALFOUNDRIES Inc.
- Ryoung-Han Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating semiconductor devices
- Patent number 8,303,831
- Issue date Nov 6, 2012
- GLOBALFOUNDRIES, INC.
- Ryoung-han Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor device
- Patent number 8,236,592
- Issue date Aug 7, 2012
- GLOBALFOUNDRIES Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-die focus monitoring with binary mask
- Patent number 8,009,274
- Issue date Aug 30, 2011
- Advanced Micro Devices, Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilization of deep ultraviolet photoresist
- Patent number 7,851,136
- Issue date Dec 14, 2010
- GLOBALFOUNDRIES Inc.
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure technique using OPC to correct distortion
- Patent number 7,829,266
- Issue date Nov 9, 2010
- GLOBALFOUNDRIES Inc.
- Yunfei Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV pellicle and method for fabricating semiconductor dies using same
- Patent number 7,767,985
- Issue date Aug 3, 2010
- GLOBALFOUNDRIES Inc.
- Uzodinma Okoroanyanwu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV pellicle with increased EUV light transmittance
- Patent number 7,723,704
- Issue date May 25, 2010
- GLOBALFOUNDRIES Inc.
- Obert Reeves Wood, II
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Inverse self-aligned spacer lithography
- Patent number 7,718,529
- Issue date May 18, 2010
- GLOBALFOUNDRIES Inc.
- Yunfei Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double exposure technology using high etching selectivity
- Patent number 7,704,680
- Issue date Apr 27, 2010
- Advanced Micro Devices, Inc.
- Ryoung-Han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV debris mitigation filter and method for fabricating semiconduct...
- Patent number 7,663,127
- Issue date Feb 16, 2010
- GLOBALFOUNDRIES Inc.
- Obert Reeves Wood, II
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Methods of Forming a Non-Planar Cap Layer Above Conductive Lines on...
- Publication number 20130043589
- Publication date Feb 21, 2013
- GLOBALFOUNDRIES INC.
- Ryoung-Han Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER INTERCONNECT STRUCTURE AND METHOD FOR INTEGRATED CIRCUITS
- Publication number 20120273958
- Publication date Nov 1, 2012
- GLOBALFOUNDRIES INC.
- Ryoung-Han KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING AN INTERCONNECT STRUCTURE
- Publication number 20120058640
- Publication date Mar 8, 2012
- Ryoung-Han Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER DOUBLE PATTERNING THAT PRINTS MULTIPLE CD IN FRONT-END-OF-LINE
- Publication number 20120043646
- Publication date Feb 23, 2012
- GLOBALFOUNDRIES INC.
- Ryoung-Han KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FABRICATING SEMICONDUCTOR DEVICES
- Publication number 20110014790
- Publication date Jan 20, 2011
- GLOBALFOUNDRIES INC.
- Ryoung-Han KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE EXPOSURE TECHNOLOGY USING HIGH ETCHING SELECTIVITY
- Publication number 20100270652
- Publication date Oct 28, 2010
- Advanced Micro Devices, Inc.
- Ryoung-Han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-DIE FOCUS MONITORING WITH BINARY MASK
- Publication number 20100002214
- Publication date Jan 7, 2010
- Advanced Micro Devices, Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE EXPOSURE TECHNIQUE USING OPC TO CORRECT DISTORTION
- Publication number 20090040483
- Publication date Feb 12, 2009
- Advanced Micro Devices, Inc.
- Yunfei Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVERSE SELF-ALIGNED SPACER LITHOGRAPHY
- Publication number 20090023298
- Publication date Jan 22, 2009
- Advanced Micro Devices, Inc.
- Yunfei Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER LITHOGRAPHY
- Publication number 20090017628
- Publication date Jan 15, 2009
- Advanced Micro Devices, Inc.
- Ryoung-han KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH FIDELITY MULTIPLE RESIST PATTERNING
- Publication number 20080292991
- Publication date Nov 27, 2008
- Advanced Micro Devices, Inc.
- Thomas I. Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV diffractive optical element for semiconductor wafer lithography...
- Publication number 20080259458
- Publication date Oct 23, 2008
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a high resolution resist pattern on a semiconduc...
- Publication number 20080233494
- Publication date Sep 25, 2008
- Advanced Micro Devices, Inc.
- Uzodinma Okoroanyanwu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV debris mitigation filter and method for fabricating semiconduct...
- Publication number 20080225245
- Publication date Sep 18, 2008
- Advanced Micro Devices, Inc.
- Obert Reeves Wood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical polarizer with nanotube array
- Publication number 20080198453
- Publication date Aug 21, 2008
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- G02 - OPTICS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE
- Publication number 20080171446
- Publication date Jul 17, 2008
- Advanced Micro Devices, Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE WITH MULTIPLE LEVEL PATTERNING
- Publication number 20080171447
- Publication date Jul 17, 2008
- Advanced Micro Devices, Inc.
- Thomas Ingolf Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV pellicle and method for fabricating semiconductor dies using same
- Publication number 20080152873
- Publication date Jun 26, 2008
- Advanced Micro Devices, Inc.
- Uzodinma Okoroanyanwu
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV pellicle with increased EUV light transmittance
- Publication number 20080113491
- Publication date May 15, 2008
- Advanced Micro Devices, Inc.
- Obert Reeves Wood
- B82 - NANO-TECHNOLOGY
Information Patent Application
Double exposure technology using high etching selectivity
- Publication number 20070287101
- Publication date Dec 13, 2007
- Advanced Micro Devices, Inc.
- Ryoung-Han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STABILIZATION OF DEEP ULTRAVIOLET PHOTORESIST
- Publication number 20070281248
- Publication date Dec 6, 2007
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryoung-Han KIM

Person

Patents Grantslast 30 patents

Method of forming semiconductor device with multiple level patterning

Optical polarizer with nanotube array

Multilayer interconnect structure and method for integrated circuits

Spacer lithography

Method for forming a high resolution resist pattern on a semiconduc...

Spacer double patterning that prints multiple CD in front-end-of-line

Double exposure technology using high etching selectivity

Method for forming an interconnect structure

Methods for fabricating semiconductor devices

Method of forming semiconductor device

In-die focus monitoring with binary mask

Stabilization of deep ultraviolet photoresist

Multiple exposure technique using OPC to correct distortion

EUV pellicle and method for fabricating semiconductor dies using same

EUV pellicle with increased EUV light transmittance

Inverse self-aligned spacer lithography

Double exposure technology using high etching selectivity

EUV debris mitigation filter and method for fabricating semiconduct...

Patents Applicationslast 30 patents

Methods of Forming a Non-Planar Cap Layer Above Conductive Lines on...

MULTILAYER INTERCONNECT STRUCTURE AND METHOD FOR INTEGRATED CIRCUITS

METHOD FOR FORMING AN INTERCONNECT STRUCTURE

SPACER DOUBLE PATTERNING THAT PRINTS MULTIPLE CD IN FRONT-END-OF-LINE

METHODS FOR FABRICATING SEMICONDUCTOR DEVICES

DOUBLE EXPOSURE TECHNOLOGY USING HIGH ETCHING SELECTIVITY

IN-DIE FOCUS MONITORING WITH BINARY MASK

MULTIPLE EXPOSURE TECHNIQUE USING OPC TO CORRECT DISTORTION

INVERSE SELF-ALIGNED SPACER LITHOGRAPHY

SPACER LITHOGRAPHY

HIGH FIDELITY MULTIPLE RESIST PATTERNING

EUV diffractive optical element for semiconductor wafer lithography...

Method for forming a high resolution resist pattern on a semiconduc...

EUV debris mitigation filter and method for fabricating semiconduct...

Optical polarizer with nanotube array

METHOD OF FORMING SEMICONDUCTOR DEVICE

METHOD OF FORMING SEMICONDUCTOR DEVICE WITH MULTIPLE LEVEL PATTERNING

EUV pellicle and method for fabricating semiconductor dies using same

EUV pellicle with increased EUV light transmittance

Double exposure technology using high etching selectivity

STABILIZATION OF DEEP ULTRAVIOLET PHOTORESIST