Ryu Kaiwara

Person

  • Miyagi-ken, JP

Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma method with high input power

    • Patent number 7,312,415
    • Issue date Dec 25, 2007
    • Foundation for Advancement of International Science
    • Tadahiro Ohmi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma process apparatus

    • Patent number 6,719,875
    • Issue date Apr 13, 2004
    • Kabushiki Kaisha UltraClean Technology Research Institute
    • Tadahiro Ohmi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Semiconductor arithmetic circuit

    • Patent number 6,456,992
    • Issue date Sep 24, 2002
    • Tadashi Shibata
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Grant

    Plasma device

    • Patent number 6,357,385
    • Issue date Mar 19, 2002
    • Tadahiro Ohmi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    Plasma device

    • Publication number 20050250338
    • Publication date Nov 10, 2005
    • Tadahiro OHMI
    • Tadahiro Ohmi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Plasma device

    • Publication number 20020164883
    • Publication date Nov 7, 2002
    • Tadahiro Ohmi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...