Ryu Nakano

Person

Sagamihara, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for forming patterned structures using multiple p...
- Patent number 12,074,022
- Issue date Aug 27, 2024
- ASM IP Holding B.V.
- Naoki Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing silicon oxide film having improved quality by...
- Patent number 12,033,849
- Issue date Jul 9, 2024
- ASM IP Holding B.V.
- Yuko Kengoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclical deposition methods
- Patent number 11,970,769
- Issue date Apr 30, 2024
- ASM IP Holding B.V.
- Trigagema Gama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming barrier layer and method for manufacturing semic...
- Patent number 11,830,738
- Issue date Nov 28, 2023
- ASM IP Holding B.V.
- Ryu Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing silicon oxide film having improved quality by...
- Patent number 11,527,400
- Issue date Dec 13, 2022
- ASM IP Holding B.V.
- Yuko Kengoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and apparatus
- Patent number 11,482,418
- Issue date Oct 25, 2022
- ASM IP Holding B.V.
- Akinori Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 11,302,527
- Issue date Apr 12, 2022
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,784,105
- Issue date Sep 22, 2020
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,510,530
- Issue date Dec 17, 2019
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,147,600
- Issue date Dec 4, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,875,893
- Issue date Jan 23, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus, and method of manufacturing semiconductor d...
- Patent number 9,673,092
- Issue date Jun 6, 2017
- ASM IP Holding B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for stabilizing reaction chamber pressure
- Patent number 9,663,857
- Issue date May 30, 2017
- ASM IP Holding B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,564,314
- Issue date Feb 7, 2017
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-oxidation plasma-assisted process
- Patent number 9,464,352
- Issue date Oct 11, 2016
- ASM IP Holding B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,368,352
- Issue date Jun 14, 2016
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for trimming carbon-containing film at reduced trimming rate
- Patent number 9,343,308
- Issue date May 17, 2016
- ASM IP Holding B.V.
- Yoshihiro Isii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming oxide film by plasma-assisted processing
- Patent number 9,284,642
- Issue date Mar 15, 2016
- ASM IP Holding B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,153,441
- Issue date Oct 6, 2015
- ASM International, NV.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling in-plane uniformity of substrate processed b...
- Patent number 9,123,510
- Issue date Sep 1, 2015
- ASM IP Holding, B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for stabilizing plasma ignition
- Patent number 8,742,668
- Issue date Jun 3, 2014
- ASM IP Holdings B.V.
- Ryu Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 8,679,958
- Issue date Mar 25, 2014
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Footing reduction using etch-selective layer
- Patent number 8,298,951
- Issue date Oct 30, 2012
- ASM Japan K.K.
- Ryu Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Purge step-controlled sequence of processing semiconductor wafers
- Patent number 7,972,961
- Issue date Jul 5, 2011
- ASM Japan K.K.
- Toru Sugiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming organosilicon oxide film and multilayer resist st...
- Patent number 7,829,159
- Issue date Nov 9, 2010
- ASM Japan K.K.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus with insulated gas inlet pore
- Patent number 7,712,435
- Issue date May 11, 2010
- ASM Japan K.K.
- Yu Yoshizaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming fluorine-doped low-dielectric-constant insulating...
- Patent number 7,037,855
- Issue date May 2, 2006
- ASM Japan K.K.
- Naoto Tsuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240429044
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLICAL DEPOSITION METHODS AND STRUCTURES FORMED USING THE METHODS
- Publication number 20240175124
- Publication date May 30, 2024
- ASM IP HOLDING B.V.
- Trigagema Gama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240145236
- Publication date May 2, 2024
- ASM IP HOLDING B.V.
- Hyunchul Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE P...
- Publication number 20230395372
- Publication date Dec 7, 2023
- ASM IP HOLDING B.V.
- Shinya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING SILICON OXIDE FILM HAVING IMPROVED QUALITY BY...
- Publication number 20230112490
- Publication date Apr 13, 2023
- ASM IP HOLDING B.V.
- Yuko Kengoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20230040728
- Publication date Feb 9, 2023
- ASM IP HOLDING B.V.
- Akinori Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20230031720
- Publication date Feb 2, 2023
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLICAL DEPOSITION METHODS AND STRUCTURES FORMED USING THE METHODS
- Publication number 20230017874
- Publication date Jan 19, 2023
- ASM IP HOLDING B.V.
- Trigagema Gama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF TREATING A SUBSTRATE
- Publication number 20220216059
- Publication date Jul 7, 2022
- ASM IP HOLDING B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE P...
- Publication number 20220068639
- Publication date Mar 3, 2022
- ASM IP HOLDING B.V.
- Naoki Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTOR SYSTEM COMPRISING A TUNING CIRCUIT
- Publication number 20210348273
- Publication date Nov 11, 2021
- ASM IP HOLDING B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING BARRIER LAYER AND METHOD FOR MANUFACTURING SEMIC...
- Publication number 20210313178
- Publication date Oct 7, 2021
- ASM IP HOLDING B.V.
- Ryu Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING SILICON OXIDE FILM HAVING IMPROVED QUALITY BY...
- Publication number 20210057214
- Publication date Feb 25, 2021
- ASM IP HOLDING B.V.
- Yuko Kengoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200388487
- Publication date Dec 10, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200185218
- Publication date Jun 11, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20190259611
- Publication date Aug 22, 2019
- ASM IP HOLDING B.V.
- Akinori Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20190172708
- Publication date Jun 6, 2019
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20180211834
- Publication date Jul 26, 2018
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20170338111
- Publication date Nov 23, 2017
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20160196970
- Publication date Jul 7, 2016
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-Oxidation Plasma-Assisted Process
- Publication number 20150315704
- Publication date Nov 5, 2015
- ASM IP HOLDING B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Stabilizing Reaction Chamber Pressure
- Publication number 20150284848
- Publication date Oct 8, 2015
- ASM IP HOLDING B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20150252479
- Publication date Sep 10, 2015
- ASM IP HOLDING B.V.
- Ryu NAKANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20150147875
- Publication date May 28, 2015
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Trimming Carbon-Containing Film At Reduced Trimming Rate
- Publication number 20150118846
- Publication date Apr 30, 2015
- ASM IP HOLDING B.V.
- Yoshihiro Isii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Oxide Film by Plasma-Assisted Processing
- Publication number 20150079311
- Publication date Mar 19, 2015
- ASM IP HOLDING B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20150017794
- Publication date Jan 15, 2015
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Controlling In-Plane Uniformity Of Substrate Processed B...
- Publication number 20140367359
- Publication date Dec 18, 2014
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Stabilizing Plasma Ignition
- Publication number 20140062304
- Publication date Mar 6, 2014
- ASM IP HOLDING B.V.
- Ryu Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20130115763
- Publication date May 9, 2013
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method and system for forming patterned structures using multiple p...

Method for depositing silicon oxide film having improved quality by...

Cyclical deposition methods

Method for forming barrier layer and method for manufacturing semic...

Method for depositing silicon oxide film having improved quality by...

Substrate processing method and apparatus

Methods for forming doped silicon oxide thin films

Methods for forming doped silicon oxide thin films

Methods for forming doped silicon oxide thin films

Methods for forming doped silicon oxide thin films

Methods for forming doped silicon oxide thin films

Film forming apparatus, and method of manufacturing semiconductor d...

Method for stabilizing reaction chamber pressure

Methods for forming doped silicon oxide thin films

Low-oxidation plasma-assisted process

Methods for forming doped silicon oxide thin films

Method for trimming carbon-containing film at reduced trimming rate

Method for forming oxide film by plasma-assisted processing

Methods for forming doped silicon oxide thin films

Method for controlling in-plane uniformity of substrate processed b...

Method for stabilizing plasma ignition

Methods for forming doped silicon oxide thin films

Footing reduction using etch-selective layer

Purge step-controlled sequence of processing semiconductor wafers

Method of forming organosilicon oxide film and multilayer resist st...

Plasma processing apparatus with insulated gas inlet pore

Method of forming fluorine-doped low-dielectric-constant insulating...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD

CYCLICAL DEPOSITION METHODS AND STRUCTURES FORMED USING THE METHODS

SUBSTRATE PROCESSING METHOD

METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE P...

METHOD FOR DEPOSITING SILICON OXIDE FILM HAVING IMPROVED QUALITY BY...

SUBSTRATE PROCESSING METHOD AND APPARATUS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

CYCLICAL DEPOSITION METHODS AND STRUCTURES FORMED USING THE METHODS

METHOD OF TREATING A SUBSTRATE

METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE P...

REACTOR SYSTEM COMPRISING A TUNING CIRCUIT

METHOD FOR FORMING BARRIER LAYER AND METHOD FOR MANUFACTURING SEMIC...

METHOD FOR DEPOSITING SILICON OXIDE FILM HAVING IMPROVED QUALITY BY...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

SUBSTRATE PROCESSING METHOD AND APPARATUS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Low-Oxidation Plasma-Assisted Process

Method for Stabilizing Reaction Chamber Pressure

FILM FORMING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Method For Trimming Carbon-Containing Film At Reduced Trimming Rate

Method for Forming Oxide Film by Plasma-Assisted Processing

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Method For Controlling In-Plane Uniformity Of Substrate Processed B...

Method for Stabilizing Plasma Ignition

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS