Ryuichi Asako

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and ionic liquid
- Patent number 12,011,738
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Takeo Nakano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,842,900
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 11,538,693
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Ryuichi Asako
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for substrate processing
- Patent number 11,488,836
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 11,456,184
- Issue date Sep 27, 2022
- Tokyo Electron Limited
- Ryuichi Asako
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Plasma processing method
- Patent number 10,923,332
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Ryuichi Asako
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching organic region
- Patent number 10,903,085
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 10,777,425
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning components of plasma processing apparatus
- Patent number 10,734,204
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Takao Funakubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning components of plasma processing apparatus
- Patent number 10,626,497
- Issue date Apr 21, 2020
- Tokyo Electron Limited
- Takao Funakubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing methods to protect ULK materials from damage during e...
- Patent number 10,304,725
- Issue date May 28, 2019
- Tokyo Electron Limited
- Xinghua Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating formation method and semiconductor device manufacturing met...
- Patent number 10,083,859
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Ryuichi Asako
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing halogen and method for manufacturing semiconduc...
- Patent number 9,892,934
- Issue date Feb 13, 2018
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing target object
- Patent number 9,780,037
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Kazuya Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing apparatus
- Patent number 8,614,140
- Issue date Dec 24, 2013
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,357,615
- Issue date Jan 22, 2013
- Tokyo Electron Limited
- Yuki Chiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for recovering damaged components in lower region of low die...
- Patent number 8,288,252
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and semiconductor device manufacturing method
- Patent number 8,268,721
- Issue date Sep 18, 2012
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and semiconductor device...
- Patent number 8,101,507
- Issue date Jan 24, 2012
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for manufacturing a semiconductor device
- Patent number 8,075,730
- Issue date Dec 13, 2011
- Tokyo Electron Limited
- Satoru Shimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for recovering damage of low dielectric insulating film for...
- Patent number 8,058,153
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method that recovers damage of t...
- Patent number 7,902,077
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and storage medium
- Patent number 7,799,703
- Issue date Sep 21, 2010
- Tokyo Electron Limited
- Kazuhiro Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing an organic-film
- Patent number 7,521,098
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Kazuyuki Mitsuoka
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD AND PLASMA PROCESSING METHOD
- Publication number 20240318014
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20240087916
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20230230855
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Takeo NAKANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND IONIC LIQUID
- Publication number 20230226571
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Takeo NAKANO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PURIFICATION PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND...
- Publication number 20230111710
- Publication date Apr 13, 2023
- TOKYO ELECTRON LIMITED
- Takeya INOUE
- B08 - CLEANING
Information Patent Application
PATTERN FORMATION METHOD AND PHOTOSENSITIVE HARD MASK
- Publication number 20230019943
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Hajime NAKABAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230010867
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR SUBSTRATE PROCESSING
- Publication number 20230010069
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20220403509
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210366724
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20210125837
- Publication date Apr 29, 2021
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS FOR SUBSTRATE PROCESSING
- Publication number 20200381265
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Masahiro Tabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FILM DEPOSITION AND FILM DEPOSITION APPARATUS
- Publication number 20200312672
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Tatsuya YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FILM DEPOSITION AND FILM DEPOSITION APPARATUS
- Publication number 20200277512
- Publication date Sep 3, 2020
- TOKYO ELECTRON LIMITED
- Tatsuya YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20200211857
- Publication date Jul 2, 2020
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOSITION FOR FILM DEPOSITION AND FILM DEPOSITION APPARATUS
- Publication number 20200203150
- Publication date Jun 25, 2020
- TOKYO ELECTRON LIMITED
- Tatsuya YAMAGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR ETCHING ORGANIC REGION
- Publication number 20190326106
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20190326104
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS
- Publication number 20190221406
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS
- Publication number 20190218663
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- B08 - CLEANING
Information Patent Application
METHOD OF PROCESSING SUBSTRATE
- Publication number 20190198350
- Publication date Jun 27, 2019
- TOKYO ELECTRON LIMITED
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHODS TO PROTECT ULK MATERIALS FROM DAMAGE DURING E...
- Publication number 20180061700
- Publication date Mar 1, 2018
- TOKYO ELECTRON LIMITED
- Xinghua Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, COATING FORMATION METHOD...
- Publication number 20170294344
- Publication date Oct 12, 2017
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING TARGET OBJECT
- Publication number 20170084542
- Publication date Mar 23, 2017
- TOKYO ELECTRON LIMITED
- Kazuya Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING HALOGEN AND METHOD FOR MANUFACTURING SEMICONDUC...
- Publication number 20170062237
- Publication date Mar 2, 2017
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS
- Publication number 20120132365
- Publication date May 31, 2012
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20120034779
- Publication date Feb 9, 2012
- Satoru SHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20120001304
- Publication date Jan 5, 2012
- TOKYO ELECTRON LIMITED
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RECOVERING DAMAGE OF LOW DIELECTRIC INSULATING FILM AND...
- Publication number 20110294232
- Publication date Dec 1, 2011
- TOKYO ELECTRON LIMITED
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...
- Publication number 20110120650
- Publication date May 26, 2011
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS

Ryuichi Asako

Person

Patents Grantslast 30 patents

Substrate processing method and ionic liquid

Etching method and plasma processing apparatus

Substrate processing method and substrate processing system

Apparatus for substrate processing

Substrate processing method and substrate processing system

Plasma processing method

Method for etching organic region

Method of processing substrate

Method for cleaning components of plasma processing apparatus

Method for cleaning components of plasma processing apparatus

Manufacturing methods to protect ULK materials from damage during e...

Coating formation method and semiconductor device manufacturing met...

Method for removing halogen and method for manufacturing semiconduc...

Method of processing target object

Semiconductor device manufacturing apparatus

Method of manufacturing semiconductor device

Method for recovering damaged components in lower region of low die...

Semiconductor device and semiconductor device manufacturing method

Semiconductor device manufacturing method and semiconductor device...

Apparatus for manufacturing a semiconductor device

Method for recovering damage of low dielectric insulating film for...

Semiconductor device manufacturing method that recovers damage of t...

Processing method and storage medium

Method of processing an organic-film

Patents Applicationslast 30 patents

PATTERN FORMING METHOD AND PLASMA PROCESSING METHOD

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND IONIC LIQUID

PURIFICATION PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND...

PATTERN FORMATION METHOD AND PHOTOSENSITIVE HARD MASK

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

APPARATUS FOR SUBSTRATE PROCESSING

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

APPARATUS FOR SUBSTRATE PROCESSING

COMPOSITION FOR FILM DEPOSITION AND FILM DEPOSITION APPARATUS

COMPOSITION FOR FILM DEPOSITION AND FILM DEPOSITION APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

COMPOSITION FOR FILM DEPOSITION AND FILM DEPOSITION APPARATUS

METHOD FOR ETCHING ORGANIC REGION

PLASMA PROCESSING METHOD

METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS

METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS

METHOD OF PROCESSING SUBSTRATE

MANUFACTURING METHODS TO PROTECT ULK MATERIALS FROM DAMAGE DURING E...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, COATING FORMATION METHOD...

METHOD OF PROCESSING TARGET OBJECT

METHOD FOR REMOVING HALOGEN AND METHOD FOR MANUFACTURING SEMICONDUC...

SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD FOR RECOVERING DAMAGE OF LOW DIELECTRIC INSULATING FILM AND...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...