Ryuichi NEMOTO

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 11,429,024
- Issue date Aug 30, 2022
- JSR Corporation
- Ryuichi Nemoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250085629
- Publication date Mar 13, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076760
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076762
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076761
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...
- Publication number 20250013150
- Publication date Jan 9, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-Sensitive Composition, Pattern Formation Method, and Phot...
- Publication number 20250004375
- Publication date Jan 2, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393687
- Publication date Nov 28, 2024
- JSR Corporation
- Fuyuki EGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393688
- Publication date Nov 28, 2024
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ME...
- Publication number 20240319597
- Publication date Sep 26, 2024
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
- Publication number 20230400765
- Publication date Dec 14, 2023
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20230393469
- Publication date Dec 7, 2023
- JSR Corporation
- Nozomi SAKANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20230340266
- Publication date Oct 26, 2023
- JSR Corporation
- Tomoaki SEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20230106095
- Publication date Apr 6, 2023
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20220342307
- Publication date Oct 27, 2022
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20220334479
- Publication date Oct 20, 2022
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220299873
- Publication date Sep 22, 2022
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220229367
- Publication date Jul 21, 2022
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20220177424
- Publication date Jun 9, 2022
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20220043350
- Publication date Feb 10, 2022
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20200393755
- Publication date Dec 17, 2020
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY

Ryuichi NEMOTO

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition and method for forming resist...

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition and method for forming pattern

Radiation-sensitive resin composition, resist pattern-forming metho...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...

Radiation-Sensitive Composition, Pattern Formation Method, and Phot...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ME...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICON...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...